Patent Inventor: Nicholas Eib

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Reflectivity optimization for multilayer stacks
Inventor: Ivanovic, et al. | Patent Number: 7634389

Process window compliant corrections of design layout
Inventor: Croffie, et al. | Patent Number: 7313508

Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate
Inventor: Aronowitz, et al. | Patent Number: 6759337

PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED RELIABILITY BY NITRIDATION OF UPPER SURFACE OF GATE OF OXIDE TO FORM BARRIER OF NITROGEN ATOMS IN UPPER SURFACE REGION OF GATE OXIDE, AND RESULTING PRODUCT
Inventor: Aronowitz, et al. | Patent Number: 6413881

Method of forming a layer and semiconductor substrate
Inventor: Aronowitz, et al. | Patent Number: 5897381

Apparatus for rapid thermal processing of a wafer
Inventor: Aronowitz, et al. | Patent Number: 5893952

Rapid thermal processing using a narrowband infrared source and feedback
Inventor: Aronowitz, et al. | Patent Number: 5756369

System and method for performing optical proximity correction on macrocell libraries
Inventor: Pasch, et al. | Patent Number: 5682323

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