Patent International Class: G03F 7/38
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Photosensitive molecular compound and photoresist composition including the same
Inventor: Lee, et al. | Patent Number: 8124311
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Resin and chemically amplified resist composition comprising the same
Inventor: Takemoto, et al. | Patent Number: 8110336
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Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Inventor: Ohashi, et al. | Patent Number: 8105748
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Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Inventor: Ohashi, et al. | Patent Number: 8105748
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Developing method for laser sensitive lithographic printing plate
Inventor: Teng | Patent Number: 8100055
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Lithographic printing plate having specific polymeric binders
Inventor: Teng | Patent Number: 8092984
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Negative photoresist composition and method of manufacturing array substrate using the same
Inventor: Kang, et al. | Patent Number: 8092981
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Method of forming visible image for on-press developable lithographic printing plate
Inventor: Teng | Patent Number: 8087354
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Pattern formation method
Inventor: Endo, et al. | Patent Number: 8080364
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Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition
Inventor: Sakayori | Patent Number: 8071273
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Positive resist composition and patterning process
Inventor: Ohsawa, et al. | Patent Number: 8062828
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Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
Inventor: Ohashi, et al. | Patent Number: 8057985
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Resist composition, resist protective coating composition, and patterning process
Inventor: Harada, et al. | Patent Number: 8057981
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Photoresists and methods for optical proximity correction
Inventor: Halle, et al. | Patent Number: 8053172
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Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Inventor: Kinsho, et al. | Patent Number: 8053165
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Hydroxyl-containing monomer, polymer, resist composition, and patterning process
Inventor: Kinsho, et al. | Patent Number: 8053165
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Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
Inventor: Takei, et al. | Patent Number: 8048615
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Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
Inventor: Itoh, et al. | Patent Number: 8048613
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Sulfonium salt-containing polymer, resist composition, and patterning process
Inventor: Ohsawa, et al. | Patent Number: 8048610
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Photosensitive compound and photoresist composition including the same
Inventor: Lee, et al. | Patent Number: 8043789
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Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
Inventor: Ebata, et al. | Patent Number: 8043786
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Photosensitive composition and pattern-forming method using the photosensitive composition
Inventor: Kodama | Patent Number: 8039200
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Fluorinated polymers for use in immersion lithography
Inventor: Farnham, et al. | Patent Number: 8034534
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Fused aromatic structures and methods for photolithographic applications
Inventor: Bucchignano, et al. | Patent Number: 8029975
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Photopatternable dielectric materials for BEOL applications and methods for use
Inventor: Allen, et al. | Patent Number: 8029971
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Material and method for photolithography
Inventor: Yeh, et al. | Patent Number: 8029969
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Positive resist compositions and patterning process
Inventor: Ohsawa, et al. | Patent Number: 7993811
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Lithographic method
Inventor: Zandbergen, et al. | Patent Number: 7989155
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Photoresist composition and method of forming a photoresist pattern using the same
Inventor: Park, et al. | Patent Number: 7989136
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Photoresist processing methods
Inventor: Torek, et al. | Patent Number: 7977037
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Method of forming a pattern using a photoresist composition for immersion lithography
Inventor: Han, et al. | Patent Number: 7968275
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Process for on-press developing overcoat-free lithographic printing plate
Inventor: Teng | Patent Number: 7966934
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Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article
Inventor: Fong, et al. | Patent Number: 7964248
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Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates
Inventor: Moreau, et al. | Patent Number: 7960095
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Self-topcoating photoresist for photolithography
Inventor: Allen, et al. | Patent Number: 7951524
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Photosensitive compound and photoresist composition including the same
Inventor: Lee, et al. | Patent Number: 7947423
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Photosensitive hardmask for microlithography
Inventor: Xu, et al. | Patent Number: 7939244
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Resin, resist composition and method of forming resist pattern
Inventor: Takeshita, et al. | Patent Number: 7939243
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(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method
Inventor: Maeda, et al. | Patent Number: 7939241
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Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes
Inventor: Iwai | Patent Number: 7935473
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Photopatternable dielectric materials for BEOL applications and methods for use
Inventor: Allen, et al. | Patent Number: 7919225
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Resist composition and method of pattern formation with the same
Inventor: Takahashi, et al. | Patent Number: 7914965
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Photoresist topcoat for a photolithographic process
Inventor: Allen, et al. | Patent Number: 7910290
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Positive-type resist composition
Inventor: Isono, et al. | Patent Number: 7906269
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Positive resist composition and patterning process using the same
Inventor: Hatakeyama, et al. | Patent Number: 7887991
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Functionalized carbosilane polymers and photoresist compositions containing the same
Inventor: Allen, et al. | Patent Number: 7883828
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Resist composition
Inventor: Echigo, et al. | Patent Number: 7871751
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Method of use for photopatternable dielectric materials for BEOL applications
Inventor: Allen, et al. | Patent Number: 7867689
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Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
Inventor: Ogihara, et al. | Patent Number: 7855043
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Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition
Inventor: Kawanishi, et al. | Patent Number: 7851130
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Method for air gap formation using UV-decomposable materials
Inventor: Liu, et al. | Patent Number: 7829268
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Functionalized carbosilane polymers and photoresist compositions containing the same
Inventor: Allen, et al. | Patent Number: 7824845
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Photosensitive composition and pattern forming method using the same
Inventor: Tsubaki | Patent Number: 7824836
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Method for manufacturing a semiconductor device
Inventor: Jung | Patent Number: 7803519
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Norbornene-type polymers, compositions thereof and lithographic process using such compositions
Inventor: Rhodes, et al. | Patent Number: 7799883
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Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film
Inventor: Kato, et al. | Patent Number: 7785766
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Method for using compositions containing fluorocarbinols in lithographic processes
Inventor: Breyta, et al. | Patent Number: 7781157
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Imide-urethane resin, photosensitive resin composition including the same and cured product
Inventor: Tanaka, et al. | Patent Number: 7781147
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Compositions and processes for immersion lithography
Inventor: Gallagher, et al. | Patent Number: 7781141
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Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
Inventor: Jung | Patent Number: 7771920
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Resist composition and patterning process
Inventor: Hatakeyama, et al. | Patent Number: 7771914
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Resist composition and patterning process using the same
Inventor: Kaneko, et al. | Patent Number: 7771913
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Method of developing laser sensitive lithographic printing plate
Inventor: Teng | Patent Number: 7752966
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Photoresist composition and method for forming pattern of a semiconductor device
Inventor: Jung, et al. | Patent Number: 7749680
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Negative resist composition
Inventor: Ando | Patent Number: 7749677
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Bottom resist layer composition and patterning process using the same
Inventor: Hatakeyama, et al. | Patent Number: 7745104
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Polymers, methods of use thereof, and methods of decomposition thereof
Inventor: Kohl, et al. | Patent Number: 7745100
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Photosensitive compound and photoresist composition including the same
Inventor: Kim, et al. | Patent Number: 7745099
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Photosensitive compound and photoresist composition including the same
Inventor: Kim, et al. | Patent Number: 7745099
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Lithographic method and device manufactured thereby
Inventor: Wong, et al. | Patent Number: 7745095
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Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
Inventor: Hada, et al. | Patent Number: 7736842
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Positive resist compositions and patterning process
Inventor: Taniguchi, et al. | Patent Number: 7727704
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Positive resist composition and method of forming resist pattern
Inventor: Hojo, et al. | Patent Number: 7727701
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Polymers, resist compositions and patterning process
Inventor: Funatsu, et al. | Patent Number: 7718342
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Method of forming stack layer and method of manufacturing electronic device having the same
Inventor: Park, et al. | Patent Number: 7700269
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Conductive lithographic polymer and method of making devices using same
Inventor: Shia, et al. | Patent Number: 7700246
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Alkali-developable photosensitive color composition
Inventor: Miura, et al. | Patent Number: 7695895
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Photo-sensitive compound and photoresist composition including the same
Inventor: Lee, et al. | Patent Number: 7695893
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Method for producing pattern-forming body
Inventor: Kobayashi | Patent Number: 7695887
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Positive resist compositions and patterning process
Inventor: Taniguchi, et al. | Patent Number: 7691561
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Polymerizable ester compounds, polymers, resist compositions and patterning process
Inventor: Watanabe, et al. | Patent Number: 7687222
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Negative lithographic printing plate having darker aluminum substrate
Inventor: Teng | Patent Number: 7682776
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Graded topcoat materials for immersion lithography
Inventor: Allen, et al. | Patent Number: 7678537
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Lactone-containing compound, polymer, resist composition, and patterning process
Inventor: Hasegawa, et al. | Patent Number: 7678530
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Negative resist composition and patterning process using the same
Inventor: Hatakeyama, et al. | Patent Number: 7655378
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Wettability variable substrate and wettability variable layer forming composition
Inventor: Yamashita, et al. | Patent Number: 7655365
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Positive resist material and pattern formation method using the same
Inventor: Hamada, et al. | Patent Number: 7651829
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Polymerizable composition and lithographic printing plate precursor
Inventor: Sugasaki | Patent Number: 7645565
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Antireflective composition for photoresists
Inventor: Wu, et al. | Patent Number: 7638262
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Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Inventor: Kinsho, et al. | Patent Number: 7638256
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Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Inventor: Kinsho, et al. | Patent Number: 7638256
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Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
Inventor: Sakamoto | Patent Number: 7632626
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Silsesquioxane resin
Inventor: Hu, et al. | Patent Number: 7625687
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Resist composition and patterning process
Inventor: Hatakeyama, et al. | Patent Number: 7622242
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Resist composition and patterning process
Inventor: Hatakeyama, et al. | Patent Number: 7622242
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Resist composition and patterning process
Inventor: Takeda, et al. | Patent Number: 7618763
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Lithographic printing plate precursors with oligomeric or polymeric sensitizers
Inventor: Strehmel, et al. | Patent Number: 7615323
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Configurable integrated circuit with a 4-to-1 multiplexer
Inventor: Schmit, et al. | Patent Number: 7609085
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Monomer, polymer and composition for photoresist
Inventor: Kim, et al. | Patent Number: 7604919
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Monomer, polymer and composition for photoresist
Inventor: Kim, et al. | Patent Number: 7604919