Patent International Class: G03C 1/73
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Color forming compositions and associated methods
Inventor: Gore | Patent Number: 8076058
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Electrode patterning layer comprising polyamic acid or polyimide, and electronic device employing it
Inventor: Maeda, et al. | Patent Number: 8044441
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Antireflective coating composition and process thereof
Inventor: Yao, et al. | Patent Number: 8039201
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Photoinitiated reactions
Inventor: Bradley | Patent Number: 8030368
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Material and method for photolithography
Inventor: Yeh, et al. | Patent Number: 8029969
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Sulphonium salt photoinitiators
Inventor: Hayoz, et al. | Patent Number: 8012672
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Self-healing photoreceptor
Inventor: De Jong, et al. | Patent Number: 8003288
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Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate
Inventor: Watanabe | Patent Number: 7992988
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Radiation-sensitive composition, polymer and monomer
Inventor: Maruyama, et al. | Patent Number: 7977442
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Sensitizer dyes for photoacid generating systems
Inventor: Waldman, et al. | Patent Number: 7892702
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Active energy ray-curable organopolysiloxane resin composition, optical transmission component, and manufacturing method thereof
Inventor: Watanabe, et al. | Patent Number: 7844153
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Photoacid generators and lithographic resists comprising the same
Inventor: Gonsalves, et al. | Patent Number: 7833690
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Liquid crystal display
Inventor: Matsumori, et al. | Patent Number: 7742138
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Ink composition, ink jet recording method, method for producing planographic printing plate and planographic printing plate
Inventor: Nakamura | Patent Number: 7741380
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Decomposable resin composition and pattern-forming material including the same
Inventor: Taguchi | Patent Number: 7718343
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Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers
Inventor: Dubois | Patent Number: 7704676
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Oxime ester photoinitiators with heteroaromatic groups
Inventor: Tanabe, et al. | Patent Number: 7648738
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Antireflective hardmask composition and methods for using same
Inventor: Uh, et al. | Patent Number: 7632622
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Flame retardant photoimagable coverlay compositions and methods relating thereto
Inventor: Mutoh | Patent Number: 7618766
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Photoresist coating composition and method for forming fine pattern using the same
Inventor: Lee, et al. | Patent Number: 7615338
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Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same
Inventor: Kang, et al. | Patent Number: 7604921
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Photosensitive polymer and photoresist composition having the same
Inventor: Choi, et al. | Patent Number: 7604918
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Polymer, resist composition and patterning process
Inventor: Tachibana, et al. | Patent Number: 7598015
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Incorporable photoinitiator
Inventor: Wolf, et al. | Patent Number: 7588880
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Multi-photon polymerizable pre-ceramic polymeric compositions
Inventor: Arney, et al. | Patent Number: 7582685
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Laser-decomposable resin composition and pattern-forming material using the same
Inventor: Sugasaki | Patent Number: 7582410
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Resist polymer and resist composition
Inventor: Momose, et al. | Patent Number: 7575846
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Radiation-sensitive compositions and imageable elements based thereon
Inventor: Baumann, et al. | Patent Number: 7574959
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Resin composition and thermo/photosensitive composition
Inventor: Fujimaki | Patent Number: 7569328
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Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
Inventor: Ohsawa, et al. | Patent Number: 7569326
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Resist composition and patterning process
Inventor: Nakashima, et al. | Patent Number: 7550247
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Newtonian, ultrasonic-insensitive charge generating layer dispersion composition and a method for producing the composition
Inventor: Molaire, et al. | Patent Number: 7550240
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Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording
Inventor: Otaki, et al. | Patent Number: 7550234
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Photoactive compounds
Inventor: Dammel, et al. | Patent Number: 7547501
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Photoresist composition for deep UV and process thereof
Inventor: Houlihan, et al. | Patent Number: 7537879
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Photoresist polymer, and photoresist composition
Inventor: Jung | Patent Number: 7534549
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Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
Inventor: Kobayashi, et al. | Patent Number: 7531290
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Radiation-sensitive resin composition
Inventor: Nishimura, et al. | Patent Number: 7531286
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Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound
Inventor: Kim, et al. | Patent Number: 7524610
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Resist composition for electron beam, EUV or X-ray
Inventor: Mizutani, et al. | Patent Number: 7521168
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Polyester compound and resist material using the same
Inventor: Miyazawa, et al. | Patent Number: 7517635
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Positive photoresist composition
Inventor: Moon, et al. | Patent Number: 7514203
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Hard mask composition for lithography process
Inventor: Jung | Patent Number: 7514200
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Resist and method of forming resist pattern
Inventor: Ochiai, et al. | Patent Number: 7514197
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Stimulation sensitive composition and compound
Inventor: Kodama | Patent Number: 7510822
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Silicon-containing resist composition and patterning process
Inventor: Takemura, et al. | Patent Number: 7510816
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Photoresist monomer polymer thereof and photoresist composition including the same
Inventor: Lee, et al. | Patent Number: 7501222
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Photoacid generators, chemically amplified resist compositions, and patterning process
Inventor: Ohsawa, et al. | Patent Number: 7498126
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Negative photosensitive resin composition
Inventor: Takahashi, et al. | Patent Number: 7494764
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Planographic printing plate precursor
Inventor: Nagashima | Patent Number: 7485409
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Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process
Inventor: Kinsho, et al. | Patent Number: 7485408
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Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition
Inventor: Yun, et al. | Patent Number: 7485407
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Resist composition and patterning process
Inventor: Hatakeyama, et al. | Patent Number: 7476486
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Amine compound, chemically amplified resist composition and patterning process
Inventor: Watanabe, et al. | Patent Number: 7468236
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Light shielding film for display device, production process thereof, metal-particle-containing composition, photosensitive transfer material, substrate for display device, and color filter
Inventor: Hatakeyama | Patent Number: 7468228
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Materials, methods, and uses for photochemical generation of acids and/or radical species
Inventor: Marder, et al. | Patent Number: 7459106
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Photochromic monomers, photochromic polymers based on the same, photochromic recording media comprising the photochromic polymers, and 3D read/write optical memory comprising the recording media
Inventor: Dunaev, et al. | Patent Number: 7452950
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Triazine based photoactive compound containing oxime ester
Inventor: Kim, et al. | Patent Number: 7449574
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Divinylfluorenes
Inventor: Williamson, et al. | Patent Number: 7439537
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Photosensitive resin composition
Inventor: Kura, et al. | Patent Number: 7425585
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Polymerizable composition
Inventor: Fujimaki | Patent Number: 7416835
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Positive resist composition
Inventor: Kawana, et al. | Patent Number: 7416832
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Antireflective hardmask composition and methods for using same
Inventor: Oh, et al. | Patent Number: 7405029
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Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography
Inventor: Hohle | Patent Number: 7405028
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Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
Inventor: Hayashi, et al. | Patent Number: 7399574
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Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition
Inventor: Nagahara, et al. | Patent Number: 7396633
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Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material
Inventor: Kawamura | Patent Number: 7393567
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Polymers and photoresists comprising same
Inventor: Zampini, et al. | Patent Number: 7390609
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Photoresists containing Si-polymers
Inventor: Barclay, et al. | Patent Number: 7390608
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Infrared-sensitive planographic printing plate precursor
Inventor: Kawauchi | Patent Number: 7381518
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Directly photodefinable polymer compositions and methods thereof
Inventor: Elce, et al. | Patent Number: 7378456
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Photoresist resin composition
Inventor: Kim, et al. | Patent Number: 7378223
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Antireflective hardmask composition and methods for using same
Inventor: Oh, et al. | Patent Number: 7378217
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Functional polymer
Inventor: Barr, et al. | Patent Number: 7364834
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Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
Inventor: Kozawa, et al. | Patent Number: 7364829
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Photosensitive resins, resin compositions and products of curing thereof
Inventor: Koyanagi, et al. | Patent Number: 7361450
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Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
Inventor: Nozaki, et al. | Patent Number: 7361448
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Positive resist composition
Inventor: Shirakawa, et al. | Patent Number: 7361446
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Thiol compound, photopolymerization initiator composition and photosensitive composition
Inventor: Katoh, et al. | Patent Number: 7341828
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Polymerizable composition and planographic printing plate precursor
Inventor: Sugasaki, et al. | Patent Number: 7338748
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Positive resist composition and process for forming pattern using the same
Inventor: Yasunami, et al. | Patent Number: 7332258
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Organoelement resists for EUV lithography and methods of making the same
Inventor: Dai, et al. | Patent Number: 7326514
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5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process
Inventor: Ansai, et al. | Patent Number: 7316884
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Compositions, systems, and methods for imaging
Inventor: Gore | Patent Number: 7314705
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Image recording media and image layers
Inventor: Gore | Patent Number: 7314704
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Radiation-sensitive resin composition
Inventor: Yokoyama, et al. | Patent Number: 7314701
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Photoreactive composition
Inventor: Takahashi, et al. | Patent Number: 7312013
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Infrared-sensitive planographic printing plate precursor
Inventor: Kawauchi | Patent Number: 7306891
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Photoresist undercoat-forming material and patterning process
Inventor: Hatakeyama, et al. | Patent Number: 7303855
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Photobase generator and curable composition
Inventor: Okazaki, et al. | Patent Number: 7300747
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Compositions and methods for use in three dimensional model printing
Inventor: Napadensky, et al. | Patent Number: 7300619
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Radiation curable ink compositions suitable for ink-jet printing
Inventor: Vanmaele, et al. | Patent Number: 7297460
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Polymerizable composition and image-recording material using the same
Inventor: Shimada | Patent Number: 7291443
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Immersion topcoat materials with improved performance
Inventor: Allen, et al. | Patent Number: 7288362
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Radiation-sensitive resin composition
Inventor: Iwasawa, et al. | Patent Number: 7288359
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Positive resist composition and pattern formation method using the same
Inventor: Takahashi | Patent Number: 7285369
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Photosensitive composition and lithographic printing plate precursor using the same
Inventor: Yanaka, et al. | Patent Number: 7279266
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Nitrogen-containing organic compound, resist composition and patterning process
Inventor: Watanabe, et al. | Patent Number: 7276324
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Photoresists, polymers and processes for microlithography
Inventor: Feiring, et al. | Patent Number: 7276323
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Compositions, systems, and methods for imaging
Inventor: Gore | Patent Number: 7270944