Patent International Class: C23C 16/46
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Apparatus for synthesizing a single-wall carbon nanotube array
Inventor: Jiang, et al. | Patent Number: 8142568
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Apparatus for inverted multi-wafer MOCVD fabrication
Inventor: Nakamura, et al. | Patent Number: 8133322
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Substrate processing method and substrate processing apparatus
Inventor: Tada, et al. | Patent Number: 8124168
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Thermal diffusion chamber
Inventor: Erickson, et al. | Patent Number: 8097085
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Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Inventor: Buchberger, Jr., et al. | Patent Number: 8092639
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Thermally zoned substrate holder assembly
Inventor: Fink, et al. | Patent Number: 8092602
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Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body
Inventor: Dhindsa, et al. | Patent Number: 8083855
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Substrate processing apparatus
Inventor: Marubayashi, et al. | Patent Number: 8070880
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Method of manufacturing apparatus for spatial and temporal control of temperature on a substrate
Inventor: Ricci, et al. | Patent Number: 8051556
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Plasma reactor with a multiple zone thermal control feed forward control apparatus
Inventor: Brillhart, et al. | Patent Number: 8012304
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Vertical heat treatment apparatus and method of transferring substrates to be processed
Inventor: Hagihara | Patent Number: 7981217
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Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
Inventor: Carlson, et al. | Patent Number: 7976634
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System and method for suppression of wafer temperature drift in cold-wall CVD systems
Inventor: De Boer | Patent Number: 7921802
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Plasma processing apparatus
Inventor: Yokogawa, et al. | Patent Number: 7771564
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Semiconductor film formation device
Inventor: Hasegawa, et al. | Patent Number: 7740703
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Substrate-supporting device
Inventor: Ikedo | Patent Number: 7691205
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Film formation apparatus and methods including temperature and emissivity/pattern compensation
Inventor: Chacin, et al. | Patent Number: 7691204
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Processing apparatus
Inventor: Honma, et al. | Patent Number: 7674336
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Susceptor system
Inventor: Maccalli, et al. | Patent Number: 7615121
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Plasma processing member
Inventor: Tomita, et al. | Patent Number: 7582184
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Tubular reaction vessel and process for producing silicon therewith
Inventor: Wakamatsu, et al. | Patent Number: 7553467
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Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines
Inventor: Mielke | Patent Number: 7413610
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Apparatus for chemical vapor deposition
Inventor: Shim | Patent Number: 7390366
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Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
Inventor: Komino, et al. | Patent Number: 7337745
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Staggered ribs on process chamber to reduce thermal effects
Inventor: Wood | Patent Number: 7108753
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Method of producing a nanotube layer on a substrate
Inventor: Mauthner, et al. | Patent Number: 7033650
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Process for controlling thin film uniformity and products produced thereby
Inventor: Won, et al. | Patent Number: 6962732
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Process for controlling thin film uniformity and products produced thereby
Inventor: Won, et al. | Patent Number: 6962732
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Process for fabricating films of uniform properties on semiconductor devices
Inventor: Mercaldi, et al. | Patent Number: 6960264
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Method and device for heat treatment
Inventor: Matsuoka | Patent Number: 6951815
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Method of manufacturing a semiconductor device and a semiconductor manufacture system
Inventor: Moriya, et al. | Patent Number: 6949474
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Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber
Inventor: Chiang, et al. | Patent Number: 6949450
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ALD reactor and method with controlled wall temperature
Inventor: Bondestam, et al. | Patent Number: 6939579
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ALD reactor and method with controlled wall temperature
Inventor: Bondestam, et al. | Patent Number: 6939579
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Thin-film deposition method
Inventor: Ueda, et al. | Patent Number: 6933009
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Control of stress in metal films by controlling the temperature during film deposition
Inventor: Chan, et al. | Patent Number: 6933004
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Control of stress in metal films by controlling the temperature during film deposition
Inventor: Chan, et al. | Patent Number: 6933004
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Single wafer processing method and system for processing semiconductor
Inventor: Sakuma, et al. | Patent Number: 6924231
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Thermally conductive chuck for vacuum processor
Inventor: Moslehi | Patent Number: 6907924
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Fabrication of B-doped silicon film by LPCVD method using BCI3 and SiH4 gases
Inventor: Noda, et al. | Patent Number: 6905963
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Systems and methods for epitaxially depositing films on a semiconductor substrate
Inventor: Johnsgard, et al. | Patent Number: 6902622
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Induction heating devices and methods for controllably heating an article
Inventor: Sumakeris, et al. | Patent Number: 6896738
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Batch furnace
Inventor: Yoo, et al. | Patent Number: 6879778
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Method and apparatus for improved temperature control in atomic layer deposition
Inventor: Chiang, et al. | Patent Number: 6878402
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Method and device for the temperature control of surface temperatures of substrates in a CVD reactor
Inventor: Kaeppeler | Patent Number: 6878395
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Thermal flux regulator
Inventor: Gorokhovsky | Patent Number: 6871700
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Method of manufacturing a semiconductor device
Inventor: Mikata | Patent Number: 6867054
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Cold wall chemical vapor deposition apparatus with a heater control unit
Inventor: Lee, et al. | Patent Number: 6857388
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Insitu post atomic layer deposition destruction of active species
Inventor: Sarigiannis, et al. | Patent Number: 6844260
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Temperature control for single substrate semiconductor processing reactor
Inventor: Kuznetsov, et al. | Patent Number: 6843201
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Method and apparatus for forming an HSG-Si layer on a wafer
Inventor: Yun | Patent Number: 6838127
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Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
Inventor: Mercaldi, et al. | Patent Number: 6837938
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Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
Inventor: Mercaldi, et al. | Patent Number: 6837938
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Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes
Inventor: Saenger, et al. | Patent Number: 6835417
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Process for fabricating films of uniform properties on semiconductor devices
Inventor: Mercaldi, et al. | Patent Number: 6833280
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Process gas supply mechanism for ALCVD systems
Inventor: Girard, et al. | Patent Number: 6810897
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Pulse precursor deposition process for forming layers in semiconductor devices
Inventor: Thakur | Patent Number: 6808758
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Batch-type heat treatment apparatus and control method for the batch-type heat treatment apparatus
Inventor: Wang, et al. | Patent Number: 6803548
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Emissivity-change-free pumping plate kit in a single wafer chamber
Inventor: Jin, et al. | Patent Number: 6802906
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Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating system
Inventor: Bernhardt, et al. | Patent Number: 6802712
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Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof
Inventor: Miller, et al. | Patent Number: 6794310
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Heating furnace and semiconductor wafer-holding jig assembly and process of manufacturing semiconductor devices
Inventor: Takagi | Patent Number: 6793734
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Method for forming thin films of semiconductor devices
Inventor: Joo, et al. | Patent Number: 6784031
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Particles with vapor deposition coating
Inventor: Klinedinst, et al. | Patent Number: 6773813
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High speed stripping for damaged photoresist
Inventor: Johnson | Patent Number: 6767698
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Semiconductor substrate-supporting apparatus
Inventor: Satoh, et al. | Patent Number: 6761771
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Heat treating device
Inventor: Kubodera, et al. | Patent Number: 6759633
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System and method of fast ambient switching for rapid thermal processing
Inventor: Liu, et al. | Patent Number: 6753506
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Apparatus for perpendicular-type ultra vacuum chemical vapor deposition
Inventor: Shim, et al. | Patent Number: 6752874
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Temperature controlling method, thermal treating apparatus, and method of manufacturing semiconductor device
Inventor: Tanaka, et al. | Patent Number: 6746908
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Multi-zone resistance heater
Inventor: Johnson, et al. | Patent Number: 6740853
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Vertical chemical vapor deposition system
Inventor: Nishibayashi | Patent Number: 6736901
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Wafer batch processing system and method
Inventor: Yoo | Patent Number: 6727194
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Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
Inventor: Boguslavskiy, et al. | Patent Number: 6726769
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Methods of fabricating capacitors including Ta2O5 layers in a chamber including changing a Ta2O5 layer to heater separation or chamber pressure
Inventor: Park, et al. | Patent Number: 6720275
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Method of reducing stress induced defects in an HDP-CVD process
Inventor: Lin, et al. | Patent Number: 6719885
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Method for substrate thermal management
Inventor: Babikian | Patent Number: 6717113
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Purified silicon production system
Inventor: Wang, et al. | Patent Number: 6712908
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Rapid cycle chuck for low-pressure processing
Inventor: Moslehi, et al. | Patent Number: 6705394
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Method of forming carbon nanotubes and apparatus therefor
Inventor: Jayatissa | Patent Number: 6699525
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Method of plasma heating and etching a substrate
Inventor: Hwang, et al. | Patent Number: 6692648
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Apparatus for supporting a substrate in a reaction chamber
Inventor: Omstead, et al. | Patent Number: 6692575
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Vacuum processing system having improved substrate heating and cooling
Inventor: Turner, et al. | Patent Number: 6688375
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Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
Inventor: Boguslavskiy, et al. | Patent Number: 6685774
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Temperature regulator for a substrate in vapor deposition processes
Inventor: Gorokhovsky | Patent Number: 6684759
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Process for producing semiconductor and apparatus for production
Inventor: Watanabe, et al. | Patent Number: 6656838
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Pedestal with a thermally controlled platen
Inventor: Cho, et al. | Patent Number: 6656286
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Method to isolate multi zone heater from atmosphere
Inventor: Ho | Patent Number: 6652655
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Process for fabricating films of uniform properties on semiconductor devices
Inventor: Mercaldi, et al. | Patent Number: 6649278
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Glass ceramic plates for holding substrates during pre-heating
Inventor: Eggert, et al. | Patent Number: 6642484
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Method and apparatus for cooling a CVI/CVD furnace
Inventor: Fiala, et al. | Patent Number: 6639196
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Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same
Inventor: Baum, et al. | Patent Number: 6623656
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Process chamber with rectangular temperature compensation ring
Inventor: Halpin, et al. | Patent Number: 6608287
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Apparatus for thin film growth
Inventor: Honma, et al. | Patent Number: 6596086
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Process for the vacuum coating of metal components
Inventor: Deus, et al. | Patent Number: 6589608
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Substrate support for use in a hot filament chemical vapor deposition chamber
Inventor: Tolt | Patent Number: 6582780
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Emissivity-change-free pumping plate kit in a single wafer chamber
Inventor: Luo, et al. | Patent Number: 6582522
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Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating
Inventor: Narwankar, et al. | Patent Number: 6579811
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Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
Inventor: Chiang, et al. | Patent Number: 6569501
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Silicon epitaxial wafer and production method therefor
Inventor: Arai, et al. | Patent Number: 6569239