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pgs. 34
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The present invention relates to a method for fabricating a gallium nitride crystal, and also relates to a gallium nitride wafer.BACKGROUND ART... ...
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Method for manufacturing gallium nitr..., Uemura, et al., Tomoki Uemura, Takashi Sakurada, Shinsuke Fujiwara, Takuji Okahisa, Koji Uematsu, Hideaki Nakahata, Application number 12 298-332, Single-Crystal Oriented-Crystal And E...
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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Language: English

pgs. 17
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TECHNICALFIELD The present invention relates to a Ga-containing nitride semiconductor single crystal with less crystal defects and good... ...
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Method for producing Ga-containing ni..., 0<=y<1, 0<z<=1, 0<s<=1 and 0<=t<1) on a s..., Kiyomi, et al., Kazumasa Kiyomi, Hirobumi Nagaoka, Hirotaka Oota, Isao Fujimura, Application number 11 659-420, Single-Crystal Oriented-Crystal And E...
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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pgs. 15
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1. Field of the Invention The present invention relates to a piezoelectric substrate, a piezoelectric element and a liquid discharge head to be used ...
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Piezoelectric substrate, piezoelectric element, liquid discharge head and liquid disc..., Matsuda, et al., Takanori Matsuda, Toshihiro Ifuku, Application number 12 554-238, Single-Crystal Oriented-Crystal And E..., Electrical Generator Or Motor Structure
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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pgs. 9
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The present invention relates to a manufacturing method of a GaN thin film template substrate, which is applied with a hydride vapor phase epitaxy,... ...
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Manufacturing method of GaN thin film..., GaN thin film template substrate and ..., Morioka, et al., Satoru Morioka, Misao Takakusaki, Takayuki Shimizu, Application number 12 441-483, Single-Crystal Oriented-Crystal And E..., Semiconductor Device Manufacturing: P...
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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Language: English

pgs. 21
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The present invention relates to the growth of single-crystal Aluminum Nitride (AlN), and more particularly, to relatively large, single-crystal AlN, ...
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Method and apparatus for producing large, single-crystals of aluminum nitride, Schowalter, et al., Leo J. Schowalter, Glen A. Slack, J. Carlos Rojo, Application number 12 841-350, Single-Crystal Oriented-Crystal And E...
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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pgs. 7
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The present invent ion relates to a method and apparatus for producing a group III nitride based compound semiconductor. The present invention... ...
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Method and apparatus for producing gr..., Yamazaki, et al., Shiro Yamazaki, Makoto Iwai, Takanao Shimodaira, Takatomo Sasaki, Yusuke Mori, Fumio Kawamura, Application number 12 225-550, Single-Crystal Oriented-Crystal And E..., Chemical Apparatus And Process Disinf...
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- Categories:Legal › Patents › Crystals And Epitaxy Growth Processes ›
3188617
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