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							                 Atomic-scale Reconstructions on
                Metal and Semiconductor Surfaces


                                    Andrew Wee
                           Surface Science Laboratory
                          Department of Physics, NUS




IMS Workshop, 27 Nov 04
  Surface Science Lab NUS
 VT-STM/XPS/LEED system +
  growth chamber with molecular
  beam & reactive atom sources [+
  cryogenic STM]
 Soft X-ray synchrotron end
  station on SINS beamline [+
  growth chamber + STM/AFM]
 Cameca IMS 6f Magnetic sector
  SIMS
 VG ESCA MkII/SIMSLAB
 [EXAFS endstation]
   Grand Challenge:
   Self assembly of single molecule devices




                                 W Ho et al., Science, published
                                 online Sept. 4, 2003.




H Park et al., Nature, 417 (2002) 722
Scope of Presentation

1.   Structure of Surfaces
        A rule for structures of open (high index) metal surfaces
        A high index surface: Cu(210)
        SiC(0001)-63x63 “honeycomb” reconstruction
2.   Adsorbate-induced Reconstructions
        SiC(0001)-O
        Cu(210)-O; Cu(210)-Br
3.   Surface as Template
        Monodispersed Co nanoparticles on SiC(0001) honeycomb
         template
        Co ring clusters on Si(111)-(7×7)
1. Structure of Surfaces
   A rule for structures of open (high index) metal
    surfaces
   A high index surface: Cu(210)
   Adsorbate-induced reconstructions: Cu(210)-O;
    Cu(210)-Br
   SiC(0001)-63x63 “honeycomb” reconstruction
A rule for structures of open metal surfaces
    Ref: YY Sun, YP Feng, CHA Huan, ATS Wee, Phys. Rev. Lett. 93 (2004) 136102.


 Open metal surfaces: The coordination of the atoms in
  at least two layers is reduced when creating the surface;
  hence, more than one atomic layer is “exposed” to the
  vacuum.
 Rule: “At bulk-truncated configuration, define a surface
  slab in which the nearest neighbors of all atoms are
  fewer than those in the bulk; in the process of relaxation,
  the interlayer spacing between each pair of atomic layers
  within this slab contracts, while the spacing between this
  slab and the substrate expands.”
  Surface                                                               Contracts
   Slab                                                                 Expands


   Bulk
Density Functional Theory (DFT)

 Kohn-Sham equation:




  where the last term (the exchange-correlation) is not known exactly.
  Various approximations are available. Among others, the LDA and
  GGA are most widely used.




            LDA                                  GGA
Methodology
 Plane Wave Expansion:                 Advantages:
                                        Simple mathematical formulism
                                        Independency of basis set on ion
                                         positions
                                        Availability of fast Fourier transform
                                         (FFT) between direct and reciprocal
                                         spaces
 Pseudopotentials:
 Keep the eigenvalues and scattering properties unchanged compared
with those of the real potential.
Softer in the core regions, hence fewer PW’s are needed for the expansion
above.

 Vienna Ab-initio Simulation Package (VASP) is a very efficient
implementation of the pseudopotential plane-wave package.
  A rule for structures of open metal surfaces


First-principles
calculations:
Based on density
functional theory with
either LDA or GGA
approximation for the
exchange-correlation
functional

Ref: Sun YY, Phys. Rev.
Lett. 93 (2004) 136102.
 A rule for structures of open metal surfaces




Physical picture: For more open surfaces, electrons from the deeper
layers contribute to the smoothing, hence more layers relax.
 Further evaluation of the rule

               Ni          Cu           Rh           Pd           Ag                Ir     Pt
(311)       (- + …)      (- + …)      (- + …)      (- + …)      (- + …)      (- + …)     (- + …)

(331)       (- - + …)    (- - + …)    (- - + …)    (- - + …)    (- - + …)    (- - + …)   (- - + …)


(210)       (- - + …)    (- - + …)    (- - + …)    (- - + …)    (- - + …)    (- - + …)   (- - + …)


  All fcc(311) surfaces have relaxation sequence (- + …)

  All fcc(331) and fcc(210) surfaces have relaxation sequence (- - + …)
  All these surfaces obey the rule.

 Reference: Sun YY, Xu H, Feng YP, Huan ACH, Wee ATS, Surf. Sci. 548, 309 (2004).
Low Energy Electron Diffraction (LEED):
Quantitative Determination of Surface Structure
       LEED diffraction pattern
                                      I-V data          Q-LEED
                                     collection         analysis


                                      Guess a
                                      structure


                                  Multiple scattering




                                                          structure
                                                          Adjust
                                    calculations


                                       Reliability
                                        factor          Bad

                                            Good

                                         Stop
  A high index surface: Cu(210)

Clean Cu(210):
I-V LEED
• Studied by layer-
doubling LEED
analysis and
pseudopotential DFT
calculations.
• Excellent
agreement between
the calculated and
measured I-V curves
as judged by small
Pendry R factor of
0.12.


Sun YY, Xu H, Zheng JC, Zhou JY, Feng YP, Huan ACH, Wee ATS, Phys. Rev. B 68 (2003) 115420
 A high index surface: Cu(210)

   Multilayer relaxation of Cu(210) surface: IV-LEED vs DFT

                                                                 LEED         DFT
                                                Δd12 (%)         -11.1        -16.7
                                                Δd23 (%)          -5.0         -4.3
                                                Δd34 (%)          +3.7        +6.8
                                                Δr12 (%)          -1.9         -1.0
                                                Δr23 (%)          -1.9         -0.6
                                                Δr34 (%)          +0.6        +1.9

Sun YY, Xu H, Zheng JC, Zhou JY, Feng YP, Huan ACH, Wee ATS, Phys. Rev. B 68 (2003) 115420
cf. A rule for structures of open metal surfaces
Structure of 6H-SiC
 Wide band gap semiconductor, very hard, good
  thermal conductor, chemical inert.

 Structure: Si-C sp3 configuration, different Si-C
  bilayer stacking sequence and orientation, ≥200
  polytypes, determine the physical property.

      C atom
      Si atom
                                    A                      A
              A
                                    B                      B
              B




                                                                 15.11Å
                                    A                      C
              C
                                    C                      A
              A
                                    A                      C
                                                                                    3C   4H   6H
                  7.55Å




              B
                                                           B
                                         10.05Å




                                    B
              C
                                    A                      A
              A
                                    C                      B              Eg (eV)   2.3 3.2   3.0
              B
                                    A                      C
              C
                                    B                      A
              A

   3C-SiC(111)            4H-SiC(0001)            6H-SiC(0001)
  Monodispersed Co nanoparticles on
  SiC(0001) honeycomb template
   6H-SiC(0001) surface reconstruction
                                                                30 nm x 20 nm




(1x1)           (3x3)           (√3x√3) R30           (6√3 x 6√3 )R30
        1170K           1230K                 1250K
Photoelectron spectroscopy data of
  SiC(0001) surface reconstructions

                                       C 1s
                                                    o
                                 h eV                            284.4 eV



                                              o
                         (e) graphite (1300 C)
        Counts (a. u.)




                                                                                      285.1 eV

                                                            o
                         (d) nanomesh + graphite (1200 C)

                                                  o
                         (c) nanomesh (1100 C)

                                                        o
                         (b) Root 3 + nanomesh (1050 C)
                                        o
                         (a) Root 3 (950 C)                      282.9 eV



                                 280                    282                 284                  286   288
                                                                Binding energy (eV)

The C1s binding energy of carbon nanomesh is at 285.1 ev; graphite (HOPG) is at 284.4 eV.
The well-developed carbon nanomesh surface is formed before the graphitization of the SiC surface.
Therefore, the carbon nanomesh surface is not due one monolayer graphite.
       C 1s of the carbon nanomesh surface

                               C 1s for the carbon nanomesh                 S1
                                     h eV                                      S1 (285.1 eV)
                                                                                       S2 (283.8 eV)
                                                                                       B (282.9 eV)
        Counts (a. u.)




                                                                  S2
                                             o
                                    (a)               B

                                                                            S1




                                                            B     S2
                                                 o
                                    (b) 

                         278       280               282           284           286     288           290
                                                           Binding energy (eV)


The carbon nanomesh is a honeycomb superstructure formed by the self-assembly of
carbon atoms at high temperature.
Two surface-related components for the carbon nanomesh surface have been identified
with a binding energy of 283.8 eV and 285.1 eV, respectively.
Building the SiC(0001) honeycomb model

 one-layer thick nanomesh; identical honeycomb cells
 topmost Si atoms desorb
 all the outermost surface atoms are C atoms
 C atoms collapse, can substitute Si atoms below
 Building model
   Class III




                   III-12
 Building model
   Class III




                   III-13b
    DFT-LDA Calculation results
 Structure Optimization: force on ion < 10 meV/Å
                                                                                     C atom
                                                                                     Si atom

                                                                                     H atom




                                                                                        fixed
                                                   Unit cell parameters: a=b= 18.450Å, c= 20.0Å.
~ 300 atoms; CPU time ~ 3 weeks
DFT-LDA Calculation results

  STM images calculated to compare with
  experimental images

     Partial charge density calculated


          Smoothing techniques



              STM images
DFT-LDA Calculation results




  Model III-12                Model III-13b
 DFT-LDA Calculation results




Relaxed structure of       Relaxed structure of
model III-12, 2x2x1 cell   model III-13b, 2x2x1 cell
       Simulated STM images

  Model III-12, V=1.6 eV   Model III-13b, V=1.6 eV




(a) VT = 1.5V                 (b) VT = 1.8V
   Explanation of PES Peaks
    Relaxed nanomesh structure consists of graphene-like
       superstructure bonded to Si atoms below.

C1s spectrum can be                             C 1s for the carbon nanomesh                 S1
understood                                            h eV                                      S1 (285.1 eV)
                                                                                                        S2 (283.8 eV)
accordingly by:                                                                                         B (282.9 eV)
• a graphite-like C-C
                         Counts (a. u.)




peak (S1)                                                                          S2
• an asymmetric low                                           o
                                                     (a)               B
energy tail due to the
boundary C atoms                                                                             S1

which have both C-C
bonds and C-Si
bonds (S2)                                                                   B     S2
• bulk SiC substrate                                 (b) 
                                                                  o

with Si-C bonds (B)
                                          278       280               282           284           286     288           290
                                                                            Binding energy (eV)
2. Adsorbate-induced
     Reconstructions
     SiC(0001)-O
     Cu(210)-O; Cu(210)-Br
6H-SiC(0001)-3×3




                                               LEED, E=70eV


 60 × 60 nm2 and detailed 9 ×7 nm2 (insert).
          (I = 0.30 nA VT = 2.2 V)
6H-SiC (0001) 3×3 twisted reconstructed model
U. Starke et.al, PRL, 80, 758 (1998); PRB, 62, 10335 (2000).

                                                        T
                                                        T2                                                 30º
                                                                                                 60º    60º
                                                             T0       T
                                                                      T3

                                            1         T
                                                      T1
                                                                           3
                   T
                                                                           3           4
                                                                                       4
                   T2                                                                         T
                                                                                              T2
                                       2
                                       2                6
                                                        6
                        T
                        T0    T
                              T3
                                                A
                                                A                         B
                                                                           B                       T
                                                                                                   T0        T
                                                                                                             T3
                                                                                                                  Top view
                                                                 5
                                                                 5                 1
                 T
                 T1
                                   3
                                                                                   1        T1
                                                                                            T
                                   3            4
                                                4       T
                                                        T2                     2
                                                                               2
                                                             T0
                                                             T
                                                                      T
                                                                      T3
                                                      T1
                                                      T


     Tetra-
                              1st-layer
     cluster           T0                                   T0
                                                                          2nd-layer                T0
               T1 T2         T3
                                  32       1 4A
                                                    T1 T2
                                                        6
                                                                     T3
                                                                          3
                                                                          B2       1 4
                                                                                           T1 T2           T3     Side
                                                                 5
  Si adlayer                                                                                                      view
     Bulk Si
                                                                                                        Bulk layer
Initial oxidation mechanism
       F. Amy, et. al., Phys. Rev. Lett. 86, 4342 (2001)
  O2
                                               O2 reacts with the
                                               third Si-layers.




                                      Dangling bond

  O2                                           Si-adatom is
                                               much more active.



                                              Si-adatom sites or
                                              the third Si-layers?
Initial oxidation mechanism
Clean Surface        0.2 L O2        1.0 L O2               2.0 L O2



                                                *
                 * *
                                      *
                   **       *
          2 nm                                      I = 0.10 nA, VT = 2.2 V

In-situ oxidation with low tunneling current to minimize the
inelastic tunneling electron scattering induced reactions.

   Dark sites appear initially, saturated after 1.0L O2 exposure.

Bright sites appear after O2 exposure, and keep increasing.
 Explanation

                                           Or
              O2, initial                               Si
      Si                       Si



Si adatom+trimer      O2 attach on the dangling bond of Si adatom.
                      Dark sites, O2 depletes the DOS of Si atom

More O2

             Si

                             O2 inserts into the back bonds of Si
                             adatom. Bright sites, Si atom is lifted
                             by 0.5 Å. Thermal stable sites.
DFT simulations (Using CASTEP codes)
   Models where O2 reacts with the third Si-layer

                     O                                                Top view
                               1                                                                          1              T1
                                              T1



                     2                             6                                                2                           6
                                    A                                                     T3
                                                                                                                  A
                T3
                          O                                                                         O                     O
                                                           5                                                                        5
                     3              4                                                           3                 4
                                                   T2                                                                         T2

                                                                      Side view
                                                                                                                      A-O-6
                                                                                                        2-O-A
                     2-O-1         2-O-A                                                                            =120.8o
                                                                                                        =119.5o
                     =121.2o        =128.4o
           T0                                                   T0                   T0

   T1 T2                 T3                             T1 T2           T3   T1 T2             T3


                               32       1 4A                    6 5                                     32        1 4A              6 5




                                A1                                                                        A2
Models where O2 reacts with the third Si-layer

                      T0                                                    Top view                   T0
                                    T3                                                                               T3
                                                 O
            T1                                                                               T1
                                         3                                                                                3                 4
                                                           4           T1                                                                               T1
                               O                                                                                O
                 6                                                                                6
                                                                            T0                                            B                                  T0
                                         B
                           5                                                                                5
                                                     1            T3                                                                   1           T3
                                                                                                                          O
                 T2                                                                               T2
                                             2                                                                                2

                      T0                                                                               T0
                                    T3                                                                               T3

                                                                                 Side view

                                B-O-3                                                                              B-O-3
                                                 3-O-4                                                             =117.7o       B-O-1
                                =120.1o
                                                 =118.5o                                                                          =119.4o
                T0                                                     T0                         T0                                                    T0

        T1 T2                  T3                              T1 T2               T3    T1 T2                  T3                              T1 T2             T3


                6 5                  B32         1 4                                             6 5                  B32          1 4




                                             A3                                                                               A4
Models where O2 reacts with Si-adatoms

   O2

                +                   Tetra-
                                    cluster
                    T0                                         T0




       T2                     T3                  T2                      T3

                         T1                                         T1

       5                 2                        5                 2
  4             1              63             4            1               63                    T0                          T0


                                                           C1
                                                                                                                    T2                 T3
                                                                                        T2                T3

                                                                                                  T1                              T1

                +                                                                       5             2             5             2
                                                                                    4        1             63   4        1                  6
                    T0                                          T0
                                                                                             C3                          C4
           T2                 T3                      T2                   T3

                         T1                                          T1

       5                  2                       5                  2
   4            1              63             4            1                   63

                                                               C2
The model where O2 insets into the back bonds of
the Si-adatoms is thermally most stable!

                Oxygen                     Chemisorption
                              Surface
              coverage: C                     energy:
                              models
                 (ML)                     ∆E (eV/unit cell)
                                C1             -4.10
                                C2             -4.32
                                C3             -5.61
              x=1, C = 2/9
                                C4             -6.93
                3×3:2O
                                A1             -3.52
                surface
                                A2             -3.48
                                A3             -3.50
                                A4             -3.51


Chen W, Xie XN, Xu H, Wee ATS, Loh KP
Atomic scale oxidation of silicon nanoclusters on silicon carbide surfaces
J PHYS CHEM B 107 (42): 11597-11603 OCT 23 2003
      Adsorbate-induced Surface Reconstructions
                 O-Cu(210) adsorbate induced reconstructions
    (a)




                                                     FHS-BR                        FHS-MR                              LBS-BR

                                                                                                            d0
                                                                                                            3
                                                                        d02 d01                                                   d1
                                          [120]                                                                                   2
                                                                 L0
                                                                 2                               [120]

                                                                              L0
                                                                              1

                                                                      L0
                         (2x1)                                        3
                                                                                            Definition of parameters for LBS-MR
                                                                      [001]



    Superstructure formation in the                 LBS-MR

     Cu(210)-O system                            LBS-MR (oxygen at long bridge site with missing row), LBS-
    1000 x 1000 Å2 image of (2x1)                BR (long bridge site with inward buckled row), FHS-MR
     reconstruction                               (four-fold hollow site with missing row) and FHS-BR (four-
                                                  fold hollow site with inward buckled row)
    Wee ATS, Foord JS, Egdell RG,
     Pethica JB, Phys. Rev. B 58 (1998)          Tan K. C., Guo Y. P., Wee A. T. S. and Huan C. H. A., Surf.
     R7548.                                       Rev. Lett. 6 (1999) pp. 859-863
   Adsorbate-induced Surface Reconstructions
                              1st Cu-O row (side view)                                   2nd Cu-O row (side view)

                                                            d01=0.12Å                                               d01’=-0.17Å
                  d12                                                       d12 ’
             0.99Å (+22.6%)                                             1.03Å (+27.6%)
                                                            D22=0.17Å                                               D22=0.17Å
                                                                             d23’
                   d23                                                   0.78Å (-3.4%)
                 0.70Å (-                                                                                           D33
                 13.3%)                                     D33
                   d34                                                       d34’
                                                            D44                                                     D44




 LEED study of oxygen-
  induced
  reconstructions on                                                                          L01’=0.54Å
  Cu(210)                  L01=0.25Å
 Buckled (3x1)
  reconstruction – 2/3
  ML                    L00=4.84Å(+19.9%)
 Guo YP, Tan KC,                                                                                  Top view
  Wang HQ, Huan CHA,             [120]
  Wee ATS, Phys. Rev.
  B 66 (2002) 165410.
                                                         [001]
      Adsorbate-induced Surface Reconstructions
                           Cu(210)-O superstructures

                                            (a)                                        (b)
                                                        A
                                                        B

                                                        C

                                                        D
                                 [121]



             [12 1]                 [001]
                                                                                     [001]


(a)   (a) 2000 x 2000 Å2 (VB = -1.0 V, IT = 2.5 nA),
(b)   (b) 300 x 300 Å2 (VB = -1.0 V, IT = 0.30 nA) images after 500 L RT oxygen exposure and
      subsequent annealing to 620 K for a few minutes. Analysis of corrugation profiles shows
      that A and C are at the same height, whereas B is one unit cell below and D one above.
     Adsorbate-induced Surface Reconstructions




       [121]

                [001]
 Cu(210)-Br system                                                Cu(100)-Br system
   200 x 200 Å2 images of the triangular checkerboard                T.W. Fishlock, J.B. Pethica and R.G. Egdell,
    recorded at VB = -1.0 V, IT = 0.1 nA, showing an inversion of      Surf. Sci. 445, L47 (2000)
    the triangles during different scans but using the same tunnel
    current and sample bias.
   Wee ATS, Fishlock TW, Dixon RA, Foord JS, Egdell RG,
    Pethica JB, Chem. Phys. Lett. 298, 146 (1998)
 Adsorbate-induced Surface Reconstructions

 Cu(100)-N
  system
 Adsorbate
  induced
  nanostructures
  also observed in
  Cu(110),
  Cu(111)-N
  systems
 F. M. Leibsle,
  Surf. Sci. 514, 33
  (2002)
3. Surface as Template
   Monodispersed Co nanoparticles
    on SiC(0001) honeycomb template
   Co ring clusters on Si(111)-(7×7)
Self-assembly in a Honeycomb template?
Monodispersed Co nanoparticles on
SiC(0001) honeycomb template
   (a)                          (b)




                                                4nm

     (c)
            1.7Å    0.1ÅCo            16×16nm2 STM filled state images for
                          (1)           the carbon nanomesh with:
                                      (a) 0.1Å Co coverage
         nanomesh         (2)         (b) 0.2Å Co coverage
                                      (c) line profile 1 for (a) and line 2 for
                                          clean surface. VT=2.5V
  Monodispersed Co nanoparticles on
  SiC(0001) honeycomb template
                                           At the lower coverage (0.1Å Co), the
                                           clusters will adsorb on these active sites, with
                                           a diameter of 1.4±0.2nm and a height of
                                           1.7±0.1Å.
                                           At the higher coverage (2.0Å Co),
                                           neighbouring Co clusters will coalesce to
                                           form big clusters, 3.4±0.2 nm in diameter
                                           and 3.3±0.1Å in height.
                                           • Monodisperse Co nanoclusters can be
                                           fabricated on SiC honeycomb template under
                                           submonolayer condition.
                                           • Boundaries of honeycomb structures serve
8nm×8nm STM image: blue circles            as active sites for Co cluster growth.
highlight the Co cluster adsorption sites.
              References:
               W Chen, KP Loh, H Xu, ATS Wee, Appl. Phys. Lett. 84 (2004) 281
               W Chen, KP Loh, H Xu, ATS Wee, to appear in Langmuir.
cf. Boron Nitride Nanomesh
M. Corso et al., Science, 303 217 (2004)




       The BN nanomesh was formed by deposition of B3N3H6 on
       Rh(111).
  Hole formation is likely driven by the lattice mismatch of the film and
   the rhodium substrate.
  This regular nanostructure is thermally very stable and can serve as
   a template to organize molecules, e.g. C60 molecules.
Co ring clusters on Si(111)-(7×7)



               C

          C′
                   U
               B    F
         A
Co ring clusters on Si(111)-(7×7)

                                           M.A.K. Zilani, Y.Y. Sun et al.,
                                           in preparation




  Empty state: 1.9 V , 0.1 nA




                                STM simulation
Published work on other nanotemplates




In nanocluster array formed on     3nm
Si(111)-7×7 surface.
J. L. Li, PRL, 88, 066101 (2202)   The hexagonal networks were formed by
                                   co-deposition of PTCDI and melamine
                                   molecules on Ag/Si(111).              J.
                                   A. Theobald, Nature, 424, 1029 (2203)
Acknowledgements
Current students:             Research Fellows:
 Md. Abdul Kader Zilani       Dr Xu Hai
 Qi Dongchen                  Dr Liu Lei
                               Dr Guo Yong Ping
Past students:                 Dr Xie Xianning
 Ong Wei Jie                  Dr Gao Xingyu
 Tan Kian Chuan
 Wang Huiqiong               Collaborators:
 Dr Zheng Jincheng            Dr Loh Kian Ping
 Dr Sun Yiyang*               Dr Tok Eng Soon
 Dr Chen Wei*                 Dr Wang Xuesen
                               A/P Alfred Huan
* Currently Research Fellow    A/P Feng Yuan Ping

						
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