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									           Pattern creation on Preformed SAMs by Smart Contact Lithograhy

                   Xue-Mei Li, Jurriaan Huskens, David N. Reinhoudt
  Laboratory of Supramolecular Chemistry and Technology, MESA+ Research Institute
       University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
             Email: x.m.li@ct.utwente.nl; homepage: http://smct.ct.utwente.nl



       Self-assembled monolayers (SAMs) on gold are attractive for the development of

sensors,1,2 interfaces,3 and nanofabrication.4-6 Here we report the use of reactive contact

lithography to create patterns on a preformed -functionalized self-assembled monolayer

on gold.

       5-Mercapto-2-benzimidazole sulfonic acid sodium salt (MBS-Na+) was used as a

ligand for gold nanoparticles. These monolayer-protected gold colloids (MPCs) were

transformed into the catalytically active H+-form by ion exchange. This colloid-bound

catalyst hydrolyzed the TMS adsorbate (TMS-OC11H22S)2 both in solution and when self-

assembled on gold surfaces. The colloidal particles were deposited on the same SAM

surfaces by microcontact printing. Thus, local hydrolysis of the TMS adsorbate created

patterns on the SAM surfaces.

       Furthermore, MBS-Na+ was used to form a self-assembled monolayer on a

metallized PDMS stamp. After transformation from Na+ to H+ form, this stamp was

brought into contact with the TMS adsorbate monolayer. The surface was imaged by

contact mode AFM (Figure 1) showing a patterned surface has been created, which

confirmed the reactivity of reactive stamp.
        Figure 1. Contact mode AFM images (acquired in air) of TMS adsorbate SAM

after contact with a functionalized PDMS stamp for 15 min. (left, height profile; middle

and right, friction)




References


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2. Schierbaum, K. D.; Weiss, T.; van Velzen, E. U. T.; Engbersen, J. F. J.; Reinhoudt,
    D. N.; Gopel, W. Science 1994, 265, 1413-1415.


3. Shon, Y. S.; Lee, S.; Perry, S. S.; Lee, T. R. J. Am.Chem. Soc. 2000, 122, 1278-1281.


4. Díaz, D. J.; Hudson, J. E.; Storrier, G. D.; Abruña, H. D.; Saudararajan, N.; Ober, C.
    K. Langmuir 2001, 17, 5932-5938.


5. Xu, S.; Miller, S.; Laibinis, P. E.; Liu, G. Y. Langmuir 1999, 15, 7244-7251.


6. Liu, G. Y.; Xu, S.; Qian, Y. Acc. Chem. Res. 2000, 33, 457-466.

								
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