EUV Lithography Short Course

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					             EUV Lithography Short Course




March 23-25, 2010, ETH Zurich, Zurich, Switzerland

INSTRUCTOR

Dr. Vivek Bakshi
EUV Litho, Inc., Austin, TX, United States

COURSE OBJECTIVES

This course will enable you to learn:

   •   Fundamentals of EUV lithography (EUVL), with hands-on instruction
       using PROLITH™ software as a virtual scanner to learn and practice
       basic lithography

   •   History and basics of the development of EUVL

   •   Basic information on different EUV source types and current
       technical challenges of EUV source technology

   •   Essentials of    EUV    source   metrology   and   source    power
       measurements

   •   Rudiments of EUV multilayer optics

   •   Fundamentals of EUVL systems and patterning

   •   Introduction to EUVL mask technology and current technical
       challenges

   •   Design and modeling of EUVL masks using PROLITH™

   •   Fundamentals of Cost of Ownership

   •   Current status and technical challenges of EUVL for supporting high
       volume computer chip manufacturing
WHO SHOULD ATTEND

This course is designed for students, engineers and technologists who are
interested in lithography and for people involved in developing EUVL
and/or other emerging lithography techniques. Technology decision-
makers and those responsible for developing the lithography
manufacturing roadmap also will benefit. Seating is limited due to the
course’s hands-on, personal instruction environment.

REGISTRATION

Course Fee (Regular): EURO 900
Course Fee (Students): EURO 450

This rate applies to registrations received by January 23, 2010. After that
date, a late fee of Euro 50 will apply. Online registration is available at
www.euvlitho.com. Please direct any short course related questions to
meeting.services@euvlitho.com.

DELIVERABLES

The course fee covers tuition, course material, a short-term (10 day)
license for PROLITH™, and morning and afternoon refreshments.
Participants will receive a certificate of completion at the end of the
course.

SCHEDULE

Tuesday, March 23, 2010: Reception hosted by ETH Zurich
Wednesday, March 24 - March 25, 2010: EUV Lithography Short Course

Classes will consist of morning lectures followed by practical learning
using PROLITH™ in the afternoon.

SPONSORS

This short course is offered by EUV Litho, Inc. 10202 Wommack Road,
Austin, TX 78748, USA.

ETH Zurich is hosting this short course on their campus. PROLITH™ by
KLA-Tencor is a sponsor of this short course.
ACCOMMODATIONS

Hotel Sunnehus         Leoneck Hotel           Comfort Inn Royal
Sonneggstrasse 17      Leonhardstrasse 1       Leonhardstrasse 6
044 250 27 27          044 254 22 22           044 266 59 59
www.hotelsunnehus.ch   www.leoneck.ch          www.comfortinn.ch

Central Plaza Hotel    Romantikhotel Florhof
Central 1              Florhofgasse 4
044 256 56 56          044 261 44 70
www.central.ch         www.florhof.ch




ZURICH INFORMATION

http://www.zuerich.com/en/welcome.cfm