Screen Printed Phosphorus Diffusion for Low-Cost and
Simplified Industrial Mono-Crystalline Silicon Solar Cells
D. H. Yang, T. Y. Kwon, M. K. Ju, W. W. Jung, S. Y. Kim, Y. W. Lee, D. Y. Gong
And J. Yi*
School of Information and Communication Engineering, Sungkyunkwan University
300 Cheoncheon-dong, Jangan-gu, Suwon, 440-746 Korea
E-mail : firstname.lastname@example.org
Tel : +82-31-299-6571
Fax : +82-31-299-6569
Screen-printing is considered to be the most efficient technique for large-scale Si solar cell
production. Doping technique currently in use, such as POCl3 diffusion furnace, H3PO4 spray
doping and spin-on-doping (SOD) tend to be time-consuming and wasteful of source materials.
Screen printing technology can be used for the application of doping substance for diffusion.
Diffusion paste doping by the support of screen printing has enough potential to overcome the
disadvantages of other doping techniques. This paper demonstrates a simple method for
creation of P-N junction, with efficiency above 16.1%, using a screen printable
phosphorus diffusion paste (DP99-038). To optimize the doping process using screen printing,
we varied several experimental conditions, including firing temperatures and time. A fill factor
above 77% has been reached, with an efficiency of 16.1% in a 10.0 cm × 10.0 cm. The high fill
factor with paste doping is mainly due to a contact resistance (3.53 Ω) lower than that for POCl3
(5.64Ω). These results could be applied to the manufacture of low cost, Simplified and high
efficiency Si solar cells.
Keywords: Screen printing, Paste doping, Diffusion paste, Solar cell, Contact resistance