Winter www svc org News A P u b ll

Winter 2005 www.svc.org News A P u b ll ii c a t ii o n f o r t h e V a c u u m C o a t ii n g II n d u s t r y A Pub cat on for the Vacuum Coat ng ndustry Smart Materials Sneak Preview: Large-Scale Organic Photovoltaics New! Fundamentals 2005 TechCon Program Report Original article on the of Optical Coatings Inside This Issue Letter from the President . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 4 Editorial. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 4 Plasma Fusion: What can we learn? by Donald M. Mattox Page 8 Page 7 Page 15 Page 20 SVC Technical Program Report . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5 Highlights include: • From the Program Chairs . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5 • Win a $200 Cash Award for Best Poster . . . . . . . . . . . . . . . . . . 7 • A Vacuum Wizard’s Guide to Understanding Vacuum and Vacuum Coating. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8 • Special Joint Session: Processes, Materials, and Systems for Flexible Electronics and Optics . . . . . . . . . . . . . . . . . . . . . . . . . 8 • Special Joint Session: Plasma Processing of Webs. . . . . . . . . . . . 9 • Special Session on HIPIMS . . . . . . . . . . . . . . . . . . . . . . . . . . . 11 • 2nd Annual Smart Materials Symposium. . . . . . . . . . . . . . . . . 12 • Workshop on Specialty Coatings. . . . . . . . . . . . . . . . . . . . . . . . 13 • SVC TechCon Plenary Address presented by Salil Pradhan . . . . 14 • Donald M. Mattox Tutorial Program . . . . . . . . . . . . . . . . . . . . 17 • SVC Equipment Exhibit. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18 • Education Program Schedule at TechCon . . . . . . . . . . . . . . . . 20 • SVC History Committee News. . . . . . . . . . . . . . . . . . . . . . . . . 21 • SVC TechCon Meeting Schedule . . . . . . . . . . . . . . . . . . . . . . . 21 • SVC TechCon Keynote Presentation by Zhenan Bao. . . . . . . . . 27 Smart Materials Sneak Preview Large Scale Organic Photovoltaics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15 by Frederik C. Krebs Sample Education Guide. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24 Safety: Safety Aspects of Vacuum Processing by Donald M. Mattox Report on Plasma Surface Engineering (PSE) 2004 . . . . . . . . . . . . . . . . . 26 by Ric Shimshock, MLD Technologies LLC Fundamentals of Optical Coatings. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28 contributed by Angus Macleod, Thin Film Center Inc. From the 2004 SVC Technical Conference Proceedings Adhesion Promotion Techniques for Coating of Polymer Films . . . . . . . . 34 by Rolf Rank, Tilo Wuensche, Matthias Fahland, Christoph Charton and Nicolas Schiller, Fraunhofer Institute for Electron Beam and Plasma Technology Society and Industry News . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38 Corporate Sponsor News . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 Corporate Sponsor Profile. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 40 Advertiser’s Index . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 42 On the Cover Plasma Processing Sandia's Pauline Ho checks processing of components in her Plasma Processing Research Laboratory. Plasmas are hot gases used to etch circuits on microchips and to clean the surfaces of components to enhance adhesion. Photo by Randy Montoya, Sandia National Laboratories 2005 Winter News Bulletin 3 Letter from the President appy New Year! I hope you had a great holiday season and are looking forward to a wonderful 2005. We are looking forward to the annual SVC Technical Conference (TechCon) to be held from April 23 to 28, 2005, at the Adam’s Mark Hotel in Denver, CO. Put those dates on your new calendar now. Also, look for the Preliminary Program describing the outstanding lineup of technical presentations and educational courses, plus the bonus Smart Materials Symposium. As part of the Board’s fiduciary responsibility, an industry benchmarking process and a competitive bidding process were used to select a management organization for SVC. I am happy to report that we have signed a letter of intent for a new management contract with Management Plus, Inc. (MPI). We are finalizing the details of this contract, which will be in place by the end of January. Vivienne and Don Mattox and their team have managed our Society for over 16 years and deserve much of the credit for H our success. We are delighted to have them continue as our management company. We look forward to implementing their plans for an operational structure to grow with the Society in the future. I want to welcome four newly elected Directors to the SVC Board: David Christie, Wolfgang Decker, Vasgen Shamamian, and Ed Wegener. These Board members help represent the diversity of our Society membership, and will bring fresh viewpoints. Dave and Wolfgang are regular speakers at the TechCon but new to the leadership of our Society. Vasgen has been active as the Plasma Processing Technical Advisory Committee (TAC) Chair, and Ed previously served as a Board member, is Chair of the Investment Committee, and most recently served as Treasurer. Please congratulate them on their election. Also, I want to thank the outgoing Board members for their dedicated service to SVC. Directors whose terms expire at the TechCon are Liz Josephson, Traci Langevin, and Ric Shimshock. They all have contributed significantly as Board members to the success of our Society. Of course, they continue helping the Society in other capacities. Liz is Chair of the International Relations Committee; Traci is Chair of Foundation Fund Raising; and Ric is our 2005 TechCon Program Chair and Publications Committee Chair. SVC enters 2005 in excellent financial condition, technically strong, and well managed thanks to the efforts of MPI, our volunteers, and the support of our dedicated membership and TechCon exhibitors. As always, I ask for your participation in influencing the course of SVC. Join a TAC or other committee or run for the Board and become an Officer. We need your ideas, help, and support in facing new challenges for the Society in 2005 and beyond. Clark Bright, 3M Company (cibright@mmm.com), is the SVC President. Editorial Plasma Fusion: What can we learn? here is a tendency for persons working in a particular area to only read material on that subject. Often related material can be found in other subject areas. This article discusses some of the work done on the subject of plasma fusion that may be of interest to persons studying plasmas as related to plasma-based vacuum coating processes. In the 1970s and 1980s a great deal of work was performed on plasma fusion—an attempt to generate energy by the fusion of deuterium (2H) and tritium (3H) in very high-temperature plasmas. Fusion is the basic method by which the sun generates energy and was described by Hans Bethe just before WWII. In the 1960s the Russians developed a toroidal magnetically confined plasma reactor, called a TOKAMAK, that ultimately allowed attaining plasma temperatures of greater than 100M K, the temperature needed for a fusion reaction. Several problems are important in attaining high plasma temperatures that are relevant to vacuum coating. The first is contamination in the hydrogen plasma. The higher the atomic number (Z) of the contaminant, the more the cooling effect on the plasma. There have been a number of studies on how to clean the walls of the vacuum chamber. The result has been the use of hydrogen plasma cleaning using detection of C-H species in the exhaust gas as the indicator of the degree of removal of hydrocarbon contamination. Stability of the confined plasma is another concern. When instabilities occur, the plasma may hit the wall, causing ejection of high-Z contaminants. These high-Z materials become ionized in the plasma and then strike the walls, causing “self-sputtering”. Self-sputtering has been the subject of many studies by the fusion plasma community. One potential solution to the plasma instability problem was to introduce low-Z “limiters” on the walls of the vacuum chamber. These limiters would prevent the plasma from striking the chamber walls. The ideal limiter material would be beryllium, but that was judged as being too much of a health hazard so the most common limiter material is carbon. Unfortunately, carbon erodes rapidly under hydrogen ion bombardment. In the mid 1970s it was considered that high-temperature, low-sputtering4 2005 Winter News Bulletin T yield coatings on the limiters were not feasible because of the high thermal pulses present. However, it was shown that carbide coatings could be applied to the carbon that could withstand thousands of thermal pulses introduced by pulsed high-energy e-beam bombardment. When the carbide coating was placed on a ductile material (Cu), the thermal cycling caused interfacial failure due to “ratcheting” of stress voiding. Another potential solution was to coat the vacuum chamber walls with a renewable carbon coating. This reduced the Z of the material eroded from the walls. The carbon coating was periodically deposited and renewed by decomposing a hydrocarbon vapor in a low-energy argon plasma. Another problem was retention of hydrogen (particularly the radioactive hydrogen isotope, tritium) in the vacuum materials. This “plasma hydrogen charging” has been studied for a number of materials, particularly carbon. It was also found that the structure of “redeposited” material (material that had been sputtered and then redeposited) has a large effect on hydrogen retention. This is due to both the deposit morphology (columnar) and the lattice defects (vacancies, grain boundaries, etc.) in the deposited material. Charging (“subplantation” is a term that is now commonly used) of a material with a bombarding gas (ions) has been studied for a number of reasons. One of the earliest applications (Chleck et al 1963) was for charging gas turbine surfaces with radioactive krypton (85Kr) (Chleck called these charged materials “kryptonates”). By determining the thermal desorption spectrum after heating, the maximum temperature that portions of the surface has seen in service can be determined. The energy for thermal desorption is determined by the type of lattice defect binding the 85Kr atom. Deposition of film material with concurrent gaseous bombardment has been used to study “storing” of gases in film structures (Mattox et al, 3He –1971; Cuomo et al, 85Kr – 1977). It is interesting to note that what is now the Plasma Science Division of the AVS Science and Technology Society started out as the Plasma Fusion Division. References to self-sputtering and other fusion technology problems may be found in Journal of Vacuum Science and Technology, Radiation Effects, Journal of Nuclear Materials, and other journals. by Donald M. Mattox, SVC Bulletin Editor and Technical Director SVC Technical Program Report Get ready for Denver! Be sure to include the upcoming 48th Annual SVC 2005 TechCon in your plans for this spring. Make your travel arrangements and get your hotel reservations. You won’t want to miss the SVC’s premier information exchange and networking event. The 2005 SVC TechCon convening in Denver on April 23–28 promises to be one of the best ever! We have assembled a very full program of offerings. Our Educational Program has been expanded with new courses; our TechCon is once more scheduled over the course of four days packed with must-see presentations; and we have programmed three special joint TechCon sessions focusing on the plasma processing of webs, the very promising new deposition technology of high-power impulse magnetron sputtering (HIPIMS), and a special session on Processes, Materials and Systems for Flexible Electronics. This is in addition to our Smart Materials Symposium, jointly sponsored with Elsevier, our late-breaking reports in the Hueréka! Session, and the very full sessions assembled by our TACs (see the specific TechCon Session summaries included in this issue of the Bulletin.) We would like you to note that we have added a special Sunday afternoon presentation that highlights demonstrations of vacuum principles. This first-ever special session will be offered by Don McClure. This session is entitled “A Vacuum Wizard’s Guide to Understanding Vacuum and Vacuum Coating” and is offered free of charge. Attendees need to preregister because of space limitations, so don’t forget to sign up on the conference registration form for this sure-tobe memorable event. Our Plenary Session will feature a presentation by Dr. Salil Pradhan, the Chief Technology Officer at the Hewlett Packard (HP) Corporate Research Laboratories. Dr. Pradhan is a member of the Center of Excellence on Radio Frequency Identification (RFID) technology at the HP Labs. While some of our SVC members participate in developing and producing components for this technology, others among us are impacted by the expanded use of RFID technology in the retail, transportation, and security industries. Dr. Pradhan will provide an overview of RFID technology on a systems level, some interesting current applications, and a roadmap outlining further developments in RFID. Our Keynote Speaker on Monday morning is an outstanding researcher in the field. SVC will be hosting Professor Zhenan Bao, who is leading a research group at Stanford University, CA. This Denver has some of the most spectacular sunsets in the West. group is investigating various approaches to fabricating electronic devices (including flexible displays) using organic materials. She will report on work that will have a major impact on these next-generation devices. You won’t want to miss this lecture. It will provide a strong background for our Joint Session on Flexible Electronics that starts on Tuesday. We will offer three Donald M. Mattox Lunchtime Tutorials this year on Monday, Tuesday, and Wednesday. On Monday, a sandwich lunch can be purchased outside the session room, and on Tuesday a free box lunch can be picked continued on page 6 2005 Winter News Bulletin 5 Photo courtesy of the Denver Metro CVB SVC Technical Program Report continued from page 5 up in the Exhibit Hall. However, please note, on Wednesday that attendees will need to supply their own lunch. The topics for our three tutorials will be: • Monday, April 25th, “Plasma Surface Engineering for Nanotechnology Applications,” presented by Ralf Fellenberg. • Tuesday, April 26th, “Optical Coatings in Systems,” presented by H. Angus Macleod • Wednesday, April 27th, “A Guide to Starting Up a Technology-Based Business,” presented by John B. Fenn, Jr. Monday evening we will once again convene our Hueréka! Session to capture late-breaking key presentations. This is a popular session, so you won’t want to miss it. The popular Technology Forum Breakfasts are back on Tuesday and Wednesday, and the “Meet the Experts” Corner will convene on Monday, Tuesday, and Wednesday to assist attendees who have special processing problems or basic questions. Tuesday evening we will hold a special SVC As an exhibitor, you can enhance your presence at the TechCon by presenting in the Innovators Showcase, the ideal venue to introduce new ideas, processes, products, and services to a focused and sophisticated worldwide audience. This approach is particularly effective when the presentation dovetails with your company’s participation in the SVC Exhibit. Presentations can be made on any topic related to the vacuum industry and will be limited to 10 minutes (including questions). Payment of a registration fee to make a presentation in the Innovators Showcase in 2005 is waived. Abstracts must be received before February 15, 2005 in order to be included in the Final Program. Abstract submission guidelines are available at www.svc.org, or contact the SVC at 505/8567188 or E-mail: svcinfo@svc.org. There is always keen competition for the presentation slots, and a last-minute submission may lead to disappointment. Submit your abstract for the 2005 SVC TechCon today! Exhbitors: Show Your Stuff in the Innovators Showcase workshop covering “The Past, Present, and Future of the Specialty Roll Coating Industry.” Our organizers will be John B. Fenn, Jr., and Roger Philips who each have an extensive background in this area and will host a discussion on this timely topic. Our Smart Materials Symposium will again convene on Wednesday and will provide further discussions of systems that change in response to their environment. We have a full cadre of exhibitors signed up again, and the Exhibit Hall will be filled with key vacuum processing equipment and support technologies. As we go to press there is still a chance for you to participate in one of the SVC presentation forums: Hueréka!, our Innovators Showcase, and the Poster Session venues. However, if you do elect to participate, we will need you to submit an abstract via the SVC Web Site no later than February 15, 2005. Our TACs have worked hard to develop another strong TechCon Program. I am sure as you read their session summaries in this Bulletin you will come to the conclusion that you need to make the time to be at SVC this spring. Please check the SVC Web Site (www.svc.org) for further updates. See you in Denver! Ric Shimshock, MLD Technologies LLC (ricshimshock4mld@aol.com), and Ludvik Martinu, École Polytechnique, Montreal, Canada, (lmartinu@polymtl.ca), are the 2005 SVC Program Chairs. 6 Photo by Jowdy Photography 2004 Fall News Bulletin Emerging Technologies he SVC Emerging Technologies program will have two sessions. The Monday afternoon session will begin with an invited presentation by David Glocker, Isoflux Incorporated, on “Nanocomposite Mo-Ti-N coatings for WearResistant Applications” deposited both by cosputtering and by sputtering from composite targets. A dispersoid hardening model was used to predict the hardness as a function of particle size and volume fraction of TiN. The next presentation will report on multilayer deposition of refractory and fusible metals and alloys on powder materials. Experimental results and implementation of powder material coating technology is described. This work will be followed by a presentation of pulsed reactive magnetron sputtering of photocatalytic TiO2 films. Time-resolved optical emission spectroscopy is used to analyze the pulsed plasma properties during deposition. The following contribution will discuss surface characteristics of biocompatible hexamethyldisiloxane-based coatings incorporated with TiO2 synthesized in a radio-frequency reactor from hexamethyldisiloxane and Ti-isopropoxide with addition of oxygen. Growth mechanisms of TiN and nanocomposite coatings, crystalline TiN in amorphous matrix of Si3N4 and TiCN in amorphous SiCN will be presented next. Nanocomposite materials were synthesized by PECVD from TiCl4/CH4/SiH4/N2 gas mixtures. T Win a $200 Cash Award for the Best Poster! Once again, the Program Committee welcomes poster presentations on subjects of technical interest for inclusion in the Best Poster Contest at the 2005 TechCon. Abstracts must be submitted using the On-line Abstract Submission process at www.svc.org. A manuscript is required for review at the TechCon for the entry to be eligible to receive the award and to be published in the Conference Proceedings. Each presenter will be provided one side of an 8 ft. by 4 ft. poster board for display of text and graphics describing the work. Poster presenters will arrange their display on Monday morning, April 25, and will be required to be available at their posters to answer questions from 4:30 p.m. until 7:00 p.m. that same day. The Poster Session is an excellent way to present your work in a relaxed question and answer format. Submit your abstract today! The session will proceed with a presentation on low outgassing silicon-based coatings on stainless-steel surfaces for vacuum applications. The coatings are resilient, inert, and capable of withstanding temperatures above 400°C. The last presentation in the Monday session will present a new ion beam system, where the anode voltage has a half-wave sinusoidal form. The ion gun has been designed to enhance the gas delivery and anode cooling. On Tuesday afternoon, the session will open with a presentation on nanoparticle impregnation and deposition of catalytic and diffusion barrier materials. Impregnation of metal foam samples exhibiting a uniform coating coverage will be described. The following presentation will discuss PVD of films on ferromagnetic substrates in magnetized plasma systems. PVD regimes in high-density plasma must be adapted, continued on page 8 2005 Winter News Bulletin Photo by Jowdy Photography At last year’s TechCon in Dallas, the SVC awarded $200 for the Best Poster presentation and participants displayed more than a dozen posters on a myriad of vacuum related topics. 7 SVC Technical Program Report A Vacuum Wizard’s Guide to Understanding Vacuum and Vacuum Coating Sunday, April 24, 1:00 p.m.–4:00 p.m. Your Vacuum Wizard is Don McClure with 3M Company This half-day event is based on an extensive set of engaging tabletop demonstrations— with many that use a transparent vacuum chamber so attendees can “see” the principles of vacuum coating in action. The goals of this event are to make selected concepts related to vacuum and vacuum coating seen and remembered. This in turn provides a path to deeper understanding. Attendees will be offered highly accessible and thought provoking demonstrations and/or descriptions of the essential elements and principles of vacuum, vacuum processing and vacuum coating. The presentation is suitable for both non-technical and technical attendees. The only prerequisite is curiosity about our amazing world. There is no charge to attend this Special Event and everyone is welcome. Space is limited and registration is required. If you want to reserve a seat at this event, check the box on the registration form. New! continued from page 7 taking into account the effect of, for example, martensitic steel on bombardment by energetic particles. The session will proceed with an introduction of space-based deposition technologies for solar power and astronomical applications. The last presentation is devoted to atmospheric pressure plasma and its applications. An atmospheric pressure plasma jet can be used in a downstream or remote regime for surface cleaning, etching, activation, and reactive deposition and plasma polymerization. Join us to hear about new topics, technological solutions, and emerging processes in coating and surface treatment. Hana Baránková, Uppsala University, Sweden (hana.barankova@angstrom.uu.se), and Lad Bárdos, Uppsala University, Sweden (ladislav.bardos@angstrom.uu.se), are the Emerging Technologies TAC Co-Chairs. Joint Session on the Processes, Materials, and Systems for Flexible Electronics and Optics his Joint Session is devoted to hot topics of primary interest to the SVC community. In 2005, this session, jointly organized by the SVC T Vacuum Web, Optical Coating, Large Area, and Plasma Processing TACs will focus on recent advances in the area of “Flexible Electronics and Optics,” stimulated by the technological and economic challenges in the fields of displays, security devices, and energy control. The 2005 program will feature this Joint Session on Tuesday morning. Experts from six different countries and two continents will share with us the results of their latest work on the fabrication processes, materials aspects, and film performance in conjunction with their applications on flexible polymeric substrates. Roger W. Phillips, Flex Products – a JDSU Company, will introduce the session with an invited talk entitled “Using Vacuum Roll Coaters to Produce AntiCounterfeiting Devices.” This presentation will be followed by a series of original presentations devoted to phase-modulated spectroscopic ellipsometry for OLEDs, PECVD silicon carbide coatings for organic luminescent devices, multilayer ultra barrier coatings, Al2O3 barrier coatings by atomic layer deposition (ALD), ioncontrolled performance of transparent conductive oxides, TiO2 for filters in plasma displays, and permeability testing. Closely related to the topic of this joint session is the Tuesday afternoon Workshop on “The Past, Present, and Future of the Specialty Roll Coating Industry” moderated by Roger W. Phillips and John B. Fenn, Jr. We look forward to a very stimulating session, and encourage you to bring suggestions Throttlemaster™ Throttle/Isolation Valves • Aluminum or Stainless Steel Valves • Seals Up To 3 Atmospheres Differential • Vacuum or Pressure on Either Side • ANSI Sizes From 2 Inch to 12 Inch • ISO Flanges From 63 to 300 mm • Manual or Closed Loop Operation Optional Hand Held Unit • 3 Position or Downstream Control Throttlemaster™ Gate Valve & Positioner Unit ™ The VRL Throttlemaster™ valve with positioner can be used in either of two control schemes. As a 3 position valve for upstream pressure control with an MFC, or for downstream pressure control with modulating gate position. For 3 position control the basic Throttlemaster™ consists of two components: an aluminum or stainless steel gate valve and a positioner/indicator to drive the fast response servo motor. This is all you need to operate the Throttlemaster™ as a 3 position valve in systems where the mass flow controller is controlling the pressure. The Throttlemaster™ can also be used for downstream pressure control where the gas flow to the chamber is held constant and the Throttlemaster™ gate is moved to control conductance of the pumping system. This requires the use of a PID pressure controller to provide a signal to the valve positioner and a vacuum gauge with a 0 to 10 vdc signal to the PID controller. These may be purchased from VRL along with your Throttlemaster™ Valve and positioner or you may be able to use your present gauge and controller. Vacuum Research Limited • 2419 Smallman Street • Pittsburgh, PA 15222 USA (800) 426-9340 • (412) 261-7630 • FAX (412) 261-7220 • VRL@vacuumresearch.com Throttlemaster is a registered trademark of Vacuum Research. 8 2004 Fall News Bulletin and ideas for similar future activities. Ludvik Martinu, École Polytechnique, Montreal, Canada (lmartinu@polymtl.ca), Optical Coating TAC Chair, Peter J. Moulds, Ursa International Corporation (ursaintL@sbcglobal.net), Vacuum Web Coating TAC Co-Chair, Michael Andreasen, VACUUM COATING Technologies, Inc. (michael.andreasen@vact.com), Large Area Coating TAC Chair, and Vasgen Shamamian, Dow Corning Corporation (v.shamamian@dowcorning.com), Plasma Processing TAC Chair, jointly organized this session Joint Session on Plasma Processing of Webs he Plasma Processing and Vacuum Web TACs are delighted with the enthusiastic turnout of our solicitation for a joint session specifically devoted to the science and technology associated with the plasma processing of flexible substrates. Plasma processing of flexible webs has become increasingly important in both the commercialization of new products and the reduction of costs for production of established products. Plasmabased technologies offer potentially higher deposition rates and a more flexible choice in both gas phase and surface deposition chemistries. Many researchers now consider plasma-based technologies to be an enabling and economically desirable technology in polymerbased web coating. However, there are many technical issues to be resolved before the marriage of the two communities is solidified. This year our invited speaker, Moses David of the 3M Corporation, will discuss continuous plasma-enhanced chemical vapor deposition (PECVD) of diamond-like carbon (DLC) films on moving substrates. The session will host a number of talks that present the plasma and surface chemistry pretreatment for the promotion of adhesion and functionalization of chemical structures to polymer webs. Several talks will also feature the development of new atmospheric discharges that introduce specific surface chemical structures that exhibit hydrophilic and hydrophobic behavior. Some of these novel sources employ liquid precursors, which open opportunities to perform very exciting plasma chemistry and novel thin film applications. Finally, detailed studies of barrier films and their performance with polymer surface and bulk fillers and agents will be presented. We encourage you to attend and learn about the latest innovations in plasma-based web coating and converting! Vasgen Shamamian, Dow Corning Corporation (v.shamamian@dowcorning.com), is the Plasma Processing TAC Chair, and Peter Moulds, Ursa International (ursaintL@sbcglobal.net), is the Vacuum Web Coating TAC Co-Chair. T Large Area Coating he SVC Large Area Coating TAC will sponsor two sessions of presentations this year. The first session will start off with an invited paper given by Dr. Takuji Oyama of Asahi Glass Company Ltd., titled, “Theoretical Considerations of T Magnetron Discharges with Respect to Arcing and Plasma Structure in DC and AC Sputtering,” in which he proposes a three-step model for better understanding of cathode arcing phenomena. Also covered will be co-author Dr. Shidoji’s work in simulation of the plasma structures of unbalanced and bipolar magnetrons. Following the opening invited talk will be a mini session on sputter technology in which new and advanced hardware, processes, applications, and systems are presented in the following presentations: • “Monte Carlo Simulation of Anomalous Erosion in Large Area Sputter Magnetrons,” presented by Guy Buyle of Ghent University • “Flexibility and Productivity Improvements in a New Coating System Design,” presented by Philip Greene of VACUUM COATING Technologies • “Advanced Rotatable Magnetron Module Designed for Large Area Glass Coaters,” presented by Joern Brueckner of VON ARDENNE • “Advances in Sputter Hardware for Rotating Cylindrical Magnetron Sputtering,” presented by Krist Dellaert of Bekaert Advanced Coatings • “Large Area Rotating Cylindrical Magnetron Sputtering: Magnetic System Enhancements,” presented by Anja Blondeel of Bekaert Advanced Coatings • “MF and RF Systems for Large Area Glass Coating and Flat Panel Display Applications,” presented by Thomas Rettich of Huettinger Elektronik • “New Steps Toward Large Area PlasmaActivated EB PVD,” presented by Ekkehart Reinhold of VON ARDENNE • “About the Application of UltraHydrophilic Coatings to High Voltage Transmission Lines,” presented by Claudia Roero of the Swiss Federal Institute of Technology The second session will start off with an invited talk presented by Professor Roger de Gryse entitled, “Aspects of Target Voltage Behavior in Reactive Sputtering,” in which Dr. de Gryse discusses his research into target poisoning relative to two predominant mechanisms: subplantation of reactive gas ions beneath the target surface and chemisorption on the target surface. He will discuss how these two mechanisms have a significantly different influence on target voltage and surface poisoning. Following the opening invited talk will be a mini session on the latest developments in sputter target manufacturing and presentations on modeling plasma impedance, use of pulsed plasmas in the reactive deposition of ITO, use of ion sources in large area coating processes, and the influence of deposition parameters on sputtered chromium morphology in presentations entitled: • “Modeling of the Plasma Impedance in continued on page 10 2005 Winter News Bulletin 9 SVC Technical Program Report continued from page 9 High power plus exceptional reliability and stability. Improve the performance of your process with the RELIABILITY and STABILITY of Comdel's RF power supplies. Our rugged CXH Series high power supplies combine time-tested power device designs, precise and repeatable power control with a solid-state driver that does not require tuning or adjustments. For the high power demands of plasma, flat panel display, thin film processes and a wide range of industrial heating applications, the CXH Series delivers: • Reliability and stability in the presence of erratic loads • Fixed frequency operation from 2 to 40 MHz • Standard power ranges: 15kW, 25kW, 50kW • Precise power management and diagnostic monitoring Reactive Magnetron Sputtering for Various Target Materials,” presented by Andreas Pflug of the Fraunhofer Institute for Surface Engineering and Thin Films IST • “Hydrogen Doping of ZnO:Al Films Deposited by Pulsed-DC Sputtering of Ceramic Targets,” presented by Florian Ruske of the Fraunhofer Institut fur Schicht und Oberflachentechnik (IST) • “New Developments in the Manufacturing of Thermal Sprayed Cylindrical Targets,” presented by Hilde Delrue of Bekaert Advanced Coatings • “Pulsed Plasmas for Reactive Deposition of ITO Layers,” presented by Wolf-Michael Gnehr of the Fraunhofer Institut FEP • “Closed Drift Ion Sources for Large Area Architectural Glass Coating,” presented by Denis M. Shaw of Advanced Energy Industries, Inc. • “Application of HIP (Hot Isostatic Pressing) to Rotatable Sputter Targets,” presented by Alan Plaisted of Soleras Ltd. • “Flowformed Rotatable Sputtering Targets,” presented by Matthew Fonte of Dynamic Machine Works, Inc. • “Influence of Deposition Parameters on the Morphology of Sputtered Chromium Coatings,” presented by Fang Yee of Benet Laboratories All in all, it looks like we will have two interesting and informative sessions covering the latest developments in systems, hardware, modeling, targets, and applications in the large area coating arena for 2005. Michael Andreasen, VACUUM COATING Technologies, Inc. (michael.andreasen@vact.com), is the Large Area Coating TAC Chair, and Johannes Strümpfel, VON ARDENNE Anlagentechnik GmbH (struempfel.johannes@vonardenne.biz), is the Assistant TAC Chair. Optical Coating he 2005 SVC Optical Coating technical program has attracted a large number of presentations. Important developments in this field and the most recent trends are characterized by the diversification of activities and illustrated by a large spectrum of topics. The program will consist of presentations divided into two morning sessions and one afternoon session; in addition, selected talks will be presented as part of the joint session focused on flexible optics and electronics. The first optical coating session on Monday morning will highlight a very important subject within the optical coating community, namely, the “Advanced Optical Metrology and Measurement Accuracy.” This topic will be introduced by the invited talk of D.E. Aspnes, North Carolina State University, entitled, “Recent Advances in Optical Characterization of Thin Films by Spectroscopic Ellipsometry.” Subsequent speakers will discuss specific examples of film analysis by ellipsometry in the context of solar selective coatings, modelling of anisotropic stacks, and in situ real-time film growth monitoring. This topic will be further elaborated by the analysis of sensitivity variation during manufacture and statistical process analysis for reverse engineering. The second optical coating session on Wednesday afternoon on “New Optical Materials and Processes” will be introduced by Peter Mascher from the McMaster University in Hamilton, Canada, who will focus on “Modelling and Experimental Determination of the Optical Properties of Thin Films.” Contributed presentations in this session will discuss different complementary aspects, in particular, new and novel deposition approaches (end-Hall ion source and closed field magnetron sputtering), materials synthesis, and characterization and optimization for enhanced performance (wear-resistant coatings on plastics, high-index niobium and scandium oxide films, fluoride films, supersmooth surfaces, interface layers for next-generation DVD, and plasmon resonance characteristics for biosensors). The third session on Thursday morning will be devoted to “Advanced Applications of Optical Coatings,” providing a unique set of examples illustrating recent trends in this area. The opening presentation in this session will be by Joanne Jones-Meehan from the Naval Research Laboratory in Washington, D.C. Her talk, entitled, “Rapid Optical Immunoassays to Detect Environmental Agents and Pathogens in Clinical Specimens,” will introduce the fast-evolving field of biomedical applications. Other specific examples will include thin film T Find the perfect fit for your process! For a copy of our new product catalog, visit our website: www.comdel.com or email us at: RFPower@comdel.com 11 Kondelin Road Gloucester, MA 01930 Phone: 978-282-0620 Reliability • Stability • Flexibility 10 2005 Winter News Bulletin security devices, coatings for extreme ultraviolet (EUV) applications, nonpolarizing beam splitters, and process optimization involving rate and uniformity control and stress reduction. This session will also feature a student presentation from Ècole Polytechnique in Montreal, entitled, “Playing with Light: The Quest for New Optically Variable Devices.” An integral part of the Optical Coating activities is a series of traditional technology forum breakfasts. Apart from the gastronomic pleasures, these sessions encourage discussion. Conversation on “Optical Monitoring and Process Control” will be facilitated by Ric Shimshock, MLD Technologies, on Tuesday morning. Discussions of “N- and P-type Transparent Conductive Coatings,” facilitated by Clark Bright, 3M Company, and “Ion- and Plasma-Based Processing for Optical Coatings,” facilitated by Ludvik Martinu, École Polytechnique, will take place on Wednesday morning. H. Angus Macleod, Thin Film Center, Inc., will share his wisdom with us in his lunchtime tutorial lecture on real-life experience with “Optical Coatings in Systems” on Tuesday at 12:40 p.m. We expect a very exciting and stimulating program and look forward to a successful conference. Ludvik Martinu, École Polytechnique, Montreal (lmartinu@polymtl.ca), is the 2005 Optical Coating TAC Chair, and George Dobrowolski, retired from the National Research Council of Canada, Ottawa (dobrowolski@magma.ca), is the 2005 Optical Coating Assistant TAC Chair. Plasma Processing lasma processing is as dynamic as ever, with new plasma sources, techniques, and applications that will revolutionize the manufacturing thin film technology base in the future. In order to stay current with the rapid changes in our community, the SVC Plasma Processing TAC has assembled a program filled with the latest developments from corporate, government, and academic laboratories around the world. This year, we have a special session within our TAC forum to address the growing technique known as high-power impulse magnetron sputtering (HIPIMS). HIPIMS has found its first applications in hard coatings, substrate pretreatment, low-friction coatings, and optical layers. The high ionization of the HIPIMS plasma provides opportunities to develop novel and improved materials with unique microstructure and macroscopic properties. HIPIMS processing requires a fundamental understanding of the dynamics in the plasma, on the target, and the substrate surface, as well as strong development of the hardware. Professor Ulf Helmersson of Linköping University, Sweden, will give us an overview of the science of the technique, opportunities, applications, and limitations. We will see plasma diagnostic presentations and several applications for coating technology. Come learn what all the buzz is about! Finally, our regular two sessions will cover the broad area of plasma science as it pertains to thin film deposition. Paul Gagnon of Corning, Inc., will discuss a variety of plasma sources and how they are employed to tailor the surface chemistry of polymers to medical drug discovery applications. Professor Jurgen Engemann of JE Plasma Consult will show spatially and temporally resolved optical emission studies of the development of plasma “bullets” in an atmospheric plasma jet and its consequence on dissociation chemistry in molecular gases. The contributed presentations span broad topics in sources from electron-beam-generated plasmas, barrier discharges, pulsed systems, radio frequency, and microwave sources. Plasma diagnostics, plasma theory and modeling, and process chemistry for both PECVD and PVD will be included as well. Diagnostic techniques for experiments such as sampling mass spectrometry and optical emission are featured. The talks and question/answer period provide an excellent opportunity to learn from the experts presenting their work. If you have any questions, please contact the TAC Chairs. The Plasma TAC breakfast is scheduled for Monday morning at 7:00 a.m. Please contact one of the TAC chairs if you are interested in attending. Vasgen Shamamian, Dow Corning Corporation (v.shamamian@dowcorning.com), is the Plasma Processing TAC Chair, and Scott Walton, Naval Research Laboratory (sgwalton@ccs.nrl.navy.mil), and Falk Milde, VON ARDENNE Anlagentechnik GmbH (milde.falk@ardenne-at.de), are the Assistant TAC Chairs. P continued on page 12 2005 Winter News Bulletin 11 SVC Technical Program Report continued from page 11 Process Control and Instrumentation he SVC Process Control & Instrumentation session remains focused on the instrumentation and control techniques used in vacuum coating processes. Innovations and developments used to create new coatings or that improve quality, productivity, or reduce cost are of special interest. The 2005 Process Control & Instrumentation session will begin with an invited presentation, “Multi-Gas, Multi-Zone T Reactive Sputtering Control System,” from Bill Sproul, Advanced Energy Industries. The operation of a control system capable of controlling up to three reactive gases in as many as 15 zones with unique feedback signals will be discussed. A topically related presentation, “Long-Term Process Control and Stability in Reactive Sputtering,” will follow, exploring the benefits of multi-sensor and smoothed data feedback to prevent process drift or disturbances. Diverse presentations on “Pole Piece Insertion in Target for NiCr Magnetron Sputtering: Influence on Plasma and Coating Properties,” “Coating of Powder Particles in a Magnetron Plasma,” “Spectroscopic Mueller Matrix Polarimeter Using Liquid Crystal Device Polarization State Generator and Detector,” “On the Application of Quantum Cascade LaserAbsorption Spectroscopy for Plasma Process Monitoring,” “True 2-D Imaging Spectroscopy in a Reactive Sputter Process for Large-Scale Optical Glass Coating,” and “An Optical Sensor for Real-Time In-Situ Endpoint Monitoring During Dry Etching of III/V Multi-Stack Layers,” will follow. And finally, the session will close with two presentations on arc management: “Arc Handling Considerations for DC Sputtering Power Supplies” and “Managing Arcs in RF-Powered Plasma Processes.” Please plan to join us and learn more about these very exciting and relevant topics to the vacuum coating process. J. Grant Armstrong, Carberry Technologies (JGrantA@carberrytech.com), and David Chamberlain, MKS Instruments, Inc. (dave_chamberlain@mksinst.com), are the Process Control and Instrumentation TAC Co-Chairs. Smart Materials Symposium his symposium focuses on new and emerging functional materials and coatings with unique intelligent properties as indicators, protective coatings, early warning of tampering, aging, biological and chemical change. The intent of the Symposium is to bring together many specialists working on active and intelligent materials. Smart materials is a growing area for new products. Examples of smart materials are smart switchable glass and plastic for use in visors, architectural and automotive glazing. These coatings can be used for dynamic energy and light control. Some technologies can switch in the infrared wavelengths. Other materials include switchable polymers, smart ink and dynamic labeling. Also, included in this group are highly refined evacuated glazing, which can be used for both energy and acoustical control. Other developing areas concern health applications such as drug delivery systems from multilayer patches and food safety packaging. This mixture of technology will broaden the future of coating technology. See page 15 for a sneak preview article on Large-Scale Organic Photovoltaics, to be presented on Wednesday, April 27, as part of the Smart Materials Symposium in Denver. Carl Lampert, Star Science (cmlstar@sonic.net), is the Smart Materials Symposium Organizer. T Tribological & Decorative Coating he Tribological & Decorative Coating session of the SVC 2005 TechCon has attracted a number of very interesting presentations on topics in this field. Presentations will deal with a wide spectrum of topics in the field, ranging from fundamental analysis through developments of new technologies, industrial application developments, and decorative coating developments and applications. In the group of sessions on the fundamental analysis of coating systems, a very interesting invited presentation has been submitted dealing with superhard nanostructured T-B-C-Al-N films developed with closed-field unbalanced magnetron by the 12 2005 Winter News Bulletin T Colorado School of Mines. The presentation by John Moore will reveal the results of a systematic investigation into the relationship between microstructure and mechanical properties of these coating systems consisting of a mixture of different nanoparticles in an amorphous BN-matrix. Two presentations from the University of Groningen, The Netherlands, will be contributed on the topic of carbon-based coatings of low friction combined with good wear behavior. The presentation of Y. Pei will deal with analysis of nanostructured T-C coatings. These coatings have been investigated in different environments (humidity, lubricant, temperature). The structure will be related to results of detailed examinations of the mechanical film properties. Nuno Carvalho will address the relationship between structure and properties of tungsten-based metal-DLC films produced with different process parameters, including sputtering from tungsten versus tungsten carbide targets. Guido Janssen from the Technical University in Delft will present the results of investigations on the tensile and compressive stress in hard coatings. Conclusions of theoretical and empirical results of investigation will show the existence of a gradient in stress from tensile at the interface to compressive at the surface of the coating. Representatives of the two major job coaters worldwide will make presentations from the perspective of industrial automotive components and applications. André Hieke from IonBond will present an interesting comparison between the mechanical properties of DLC coatings produced with RF and DLC coatings and produced with mid-frequency PACVD. Markus Esselbach of Balzers will talk about component coatings for the automotive industry produced with a new type of high-volume coating machine that enables the production of coatings with competitive prices. Coatings for machining applications will be addressed by Papken Hovsepian of Sheffield Hallam University. This talk will present a new superlattice structured TiAlN/VN PVD coating as a new potential coating for machining of Al and Ti alloys for aerospace and automotive components. He will show that the combination of low friction and hardness of the coating yields excellent results in cutting of the aforementioned highly abrasive and adhering materials. New technologies in the form of hybrid processes, especially processes where surface nitriding and coating are combined, are a third group of presentations. J.-D. Kamminga of the Netherlands Institute for Metals Research is invited to present developments achieved on the properties of a CrN coating supported by a nitrided base layer. Both the nitrided layer and the PVD-coating are produced in a combined process in one PVD-machine without interruption of the vacuum. Kamminga will show that it is possible to improve mechanical properties of the coated system substantially by the preceding insitu nitriding step. Jaime Trujillo of the Universidad del Valle in Cali, Colombia, a student continued on page 14 Workshop on Specialty Coatings “The Past, Present, and Future of the Specialty Roll Coating Industry” Tuesday, April 26, 5:30 p.m. –6:30 p.m. Workshop Organizers: Roger Phillips, Flex Products, Inc. and John B. Fenn, Jr., Fennagain Bring Your Questions! This should be a lively experience. Vacuum roll-to-roll coating has been around for over half a century. In fact, one of its first commercial applications was a specialty roll coating process used to deposit very thin films of gold for decorative processes in 1934. In the late 1970’s and early 1980’s companies began to apply other vacuum coating techniques such as sputtering, PECVD and Polymer Multi-Layer (PML) techniques to develop specially engineered thin film coatings to do highly specific and technically difficult jobs. Out of that work came transparent conductive coatings for use in touch panels, displays and shielding. Current concerns question the health of the business and where is it heading? This workshop will attempt to address these issues and try to remove some of the clouds from the future’s crystal ball. This exciting TechCon session enables authors to present their Heuréka! Post-Deadline Recent Developments Session at the 2005 TechCon Expected to be Standing-Room Only Again! Date and Time: Monday, April 25 7:15 p.m.–9:15 p.m. Moderators: L. Bárdos and H. Baránková, Uppsala University, Sweden late- breaking results, developments, disclosures, and stimulating achievements, long after the official abstract submittal deadline has passed. It will be run independently of all other TechCon sessions on Monday evening. The criteria for Heuréka! presentations are as follows: • 20-minute presentation. Allow about five minutes for questions. • The presentation abstract must be submitted (submit on-line at www.svc.org) no later than February 15, 2005, to be included in the Final Program. • A manuscript is required for the Conference Proceedings. This is not a “catch-all” session for late papers, and the number of presentations will be limited. Last year, this popular session allowed for many presentations that would not have been possible otherwise. Once again, Heuréka! will be SVC’s forum for new and exciting “hot-off-thepress” developments. If you have questions about this session, E-mail Ladislav Bárdos at ladislav.bardos@angstrom.uu.se or Hana Baránková at hanabarankova@angstrom.uu.se Heuréka! Abstract Deadline: February 15, 2005 Submit your 200-Word Abstract On-line at www.svc.org to be included in the Final Program. 2005 Winter News Bulletin 13 SVC Technical Program Report continued from page 12 sponsored by the SVC Student Sponsorship Program, will give a presentation on the effects of duplex treatment (nitriding and PVD coating), where the nitriding step preceding the actual coating step is either a plasma nitriding or salt bath nitriding step. Several coatings will be investigated in this presentation, all preceded by a nitriding step. In the field of decorative coatings, an invited contribution by Michiel Eerden from Hauzer and Papken Hovsepian of Sheffield Hallam University will be presented by Papken Hovsepian. This presentation will provide an overview of the developments of the last decade on applications of PVD in the decorative field, as well as an overview on the specialized development work of Sheffield Hallam University in the last decade on corrosion protection and on new colors and applications by anodizing of coatings. Pedro Carvalho of the University of Minho, Portugal, a second student sponsored by the SVC Student Sponsorship Program, will present his work on the characterization of reactive sputtered decorative zirconium oxynitride coatings. He will relate the optical measurement results to structure, mechanical, and electrical characterization results. The presentation of Vispi Gheyara of Shiloh Industries will deal with investigations into the correlation between a Xenon weatherometer and outdoor testing of UV curable clearcoat PVC samples mounted on a vehicle. Michiel Eerden, of Hauzer Techno Coating BV, will make a presentation on the decorative properties that depend on the composition of the coating. Comparisons are made for TiCN-coatings produced with arc evaporation processes and those produced with unbalanced magnetron sputtering processes. Roel Tietema, Hauzer Techno Coating BV, The Netherlands (rtietema@hauzer.nl), is the Tribological and Decorative Coating TAC Char, and Gary Doll, Timken Research (gary.doll@timken.com), is the Assistant TAC Chair. Vacuum Web Coating The Vacuum Web Coating TAC’s annual breakfast committee meeting will take place on Monday morning, April 25, 2005, at 7:00 a.m. We encourage all SVC Web TAC committee members and those interested in joining Web TAC to attend. This meeting is extremely important because it sets the tone for our sessions at the 2006 Technical Conference. For the 48th Annual Technical Conference, 2005 TechCon Plenary Address “RFID Technology, Promise and Challenges” Presented by Salil Pradhan Sunday Evening, April 24, after the Opening Ceremonies at 7:00 p.m. Radio Frequency Identification (RFID) is a proven technology that has been around since the early 1970’s. However, the promise of improved supply chain visibility and management, real time logistics and inventory control in operations has been limited by the lack of standards, the lack of a systematic approach and cost. HP Labs has recently established a RFID Center of Excellence in Palo Alto, CA to implement, characterize and expand RFID technologies in the marketplace. Hewlett Packard Laboratories (HP Labs) has been a leader in this field and was an early adopter of RFID technology within its own operations. HP is also a producer of RFID-enabled goods and a proven innovator in the RFID Field offering consulting, technology solutions and enterprise applications. HP RFID technologies are being widely implemented in the Wal-Mart supply chain, within the US government and with industrial concerns such as Hasbro Inc. This talk will review the current RFID landscape, survey the RFID Developmental Roadmap and provide a vision for RFID Technology. Dr. Salil Pradhan is the Chief Technical Officer for RFID Programs at HP Labs in Palo Alto, CA. the Web TAC has assembled two sessions and is participating in two joint sessions. One joint session will be Processes, Materials, and Systems for Flexible Electronics and Optics to be held with the Optical Coating, Large Area Coating, and Plasma Processing TACs. The other joint session new for 2005, and at the request of the Web TAC members attending the annual breakfast committee meeting, will be Plasma Processing of Webs, involving both the Web TAC and the Plasma Processing TAC. On Monday morning, we will kick off with the topic of vacuum web applications and processes. Reiner Kukla of Applied Films GmbH will present the invited talk on “Multiprocess Roll-to-Roll Web Coater: First Results.” Cuttingedge products like flexible displays, flexible printed circuits, and flexible solar cells require production web coaters with multiprocess capacity. Other presentations will include the plasma-enhanced CVD process, limitation of heat transfer mechanisms, gas barrier properties of SiOx films, and security devices. On Tuesday afternoon, the Web TAC session will be on vacuum web industrial applications. The invited presentation on “The Development of Global Markets for Vacuum Coated Films and Papers” will be made by William Llewellyn of AWA Alexander Watson Associates BV. This presentation will detail global markets, regional uses, product volumes, and commercial development of vacuum-coated films and papers. This talk will be a great kick off for the session. Other presentations will include discussions of the influence of PET substrates, barrier studies of multilayer films, copper on polyimide films, and durability and cost analysis of solar reflective hard-coated materials. In addition to the sessions and joint sessions sponsored by WebTAC, Roger Phillips and John B. Fenn, Jr. have volunteered to organize a Workshop at the 2005 SVC TechCon on Tuesday at 5:30 p.m. on the “Past, Present, and Future of the Specialty Roll Coating Industry.” Read more about this Workshop on page 13. Peter J. Moulds, Ursa International Corporation (ursaintL@sbcglobal.net), and Charles Bishop C.A. Bishop Consulting Ltd. (CABishopConsulting@cabuk1.co.uk), are the Vacuum Web TAC Co-Chairs. 14 2005 Winter News Bulletin Large-Scale Organic Photovoltaics by Frederik C. Krebs Risoe National Laboratory, Roskilde, Denmark This is a sneak preview of an interesting talk to be presented in the Smart Materials Symposium on Wednesday, April 27, at the SVC Annual Technical Conference in Denver, CO. O rganic/polymer photovoltaics are a promising technology that could result in low-cost flexible large area solar cells. The technology is typically presented as a thin film of a lightabsorbing conjugated organic/polymer material sandwiched between a transparent electrode and a metal electrode. The traditional vision has been mass production of these devices by simple roll-to-roll or printing processes with a low thermal budget and less stringent requirements than traditional inorganic semiconductor technology. The production potential for a singleprocess line based on printing could reach in excess of 1,000 square metres per hour or more. The fabrication of the devices on a large scale and at high speed has been demonstrated to be possible by a technique called “screen printing,” where a polymer solution is printed on a substrate with the desired electrode pattern. Following on from the printing, the final electrode is applied by vacuum coating. Various barrier layers can be applied by vacuum coating before and after the printing process. The final device is typically laminated with a protective layer of a flexible polymer material to protect the electrodes. While the technology is promising, there are still a few technical issues that must be solved before large-scale production and widespread application can be envisaged. There has been a race amongst scientists to achieve the highest efficiency because this has often been seen as the limitation of the technology when compared to inorganic semiconductor photovoltaics. The current efficiency record for polymer photovoltaics is just below 5%. For comparison, an efficiency of 20% is easily achieved with highquality silicon photovoltaics. There is however a much more aggravating (and neglected) problem for organic/polymer photovoltaics in general, and that is their stability, which is far from even competing with the inorganic solar cells that easily achieve operational lifetimes in excess of 25 years. The lifetime of the organic photovoltaics has been given relatively little attention as judged by the technical and scientific literature. It is most often quoted as the half-life (i.e., the time it takes until the power delivered by the photovoltaic device has reached half its starting value). There are many possible causes of the observed instability/decay of these devices, such as operational temperature, light intensity, photochemistry, photo-oxidation, and chemical reactions between the electrodes and the various A 0.1-square- metre solar polymer photovoltaic employing a simple silkscreen printed homopolymer junction. constituents of the layers in the photovoltaic device under illumination and in the dark. The polymer photovoltaic initiative at Risoe National Laboratory covers many aspects of polymer photovoltaic research and is mainly focussed on synthesis of new materials, preparation and characterisation of materials and devices, large-scale prototype fabrication of polymer photovoltaics, and stability and degradation studies on materials and devices. We see the stability problem and the problems associated with making larger area devices as much more continued on page 16 2005 Winter News Bulletin 15 Large-Scale Organic Photovoltaics continued from page 15 pertinent than the problem of attaining a high efficiency. The reason for this is that the chemistry and physics of stable polymer photovoltaic materials will be very different from the current state of the art, and the efficiency improvement process will have to start all over using the new and stable type of materials. Using the state-of-the-art, commonly employed efficiencies of 1–2% have been obtained at Risoe National Laboratory with active areas of 3 to 4 square centimetres. Half-lives of the order of ten, 12-hour days in the ambient atmosphere under full solar illumination have been attained (solar irradiation of 1000 W/m2, AM1.5). The current state of the art involves the use of a mixture of a soluble fullerene derivative and polymer. Degradation is also observed under the exclusion of oxygen, albeit a little bit slower. Also, when scaling up the area of the devices, the problems of good process control and conducting the current out of the device without (or with little) loss lowers the efficiency dramatically. Radical improvements are thus needed in order to take polymer photovoltaics further and hopefully put this technology to work in society. The most recent results have been a significant improvement on the lifetime of small area photovoltaic devices. In an oxygen-free environment, test devices have been run under full solar illumination (1000 W/m2, AM1.5) for 500 hours with no decay even at high temperature. The efficiency is low (0.1%), but because it is a new type of material with different chemistry and device fabrication methods, this is regarded as promising. The construction of a polymer photovoltaic process line has been initiated and will be completed in 2005. It permits the fabrication of 0.1-square- metre devices by employing silkscreen printing and large area vacuum coating with multiple e-beam and thermal sources. Current results have been obtained with operation in air, but the final process line will allow for preparation, processing, evaporation, testing, and encapsulating large area devices (0.1 m2) under glovebox conditions. Aluminum Gate Valves DN 160-320 Series 12.1 for vacuum and high vacuum isolation Simple Quick and easy maintenance Clean Low particle generation Soft Smooth sealing operation «Split body» desig n Swiss Headquarters Tel ++41 81 771 61 61 reception@vat.ch VAT USA Tel (781) 935 1446 usa@vatvalve.com VAT Japan Tel (045) 333 11 44 sales@vatskk.co.jp VAT Korea Tel 031 704 68 57 korea@vatvalve.com VAT Taiwan Tel 03 516 90 88 taiwan@vatvalve.com VAT Benelux Tel ++31 (30) 6018251 benelux@vatvalve.com VAT France Tel 01 69 20 69 11 france@vatvalve.com VAT Germany Tel (089) 46 50 15 deutschland@vatvalve.com VAT U.K. Tel 01926 452 753 uk@vatvalve.com www.vatvalve.com 16 2005 Winter News Bulletin Donald M. Mattox Lunchtime Tutorial Program Pick up a lunch and join a tutorial! Here are three great ways to enhance your skills, increase your knowledge, and position yourself for professional advancement. The Program Committee is pleased to announce the addition of a Wednesday afternoon tutorial with John B. Fenn, Jr., entitled “A Guide to Starting Up a Technology-Based Business,” which is not listed in the Preliminary Program. Read more about the tutorial topics below and plan to “learn at lunch”. Plasma Surface Engineering for Nanotechnology Applications Monday Afternoon, April 25 12:40 p.m.–1:20 p.m. Presenter: Ralf Fellenberg, VDI Technologiezentrum GmbH, Germany Nanotechnology is often described as the technology of the future. R&D and applications in the field of nanotechnology are attracting growing interest worldwide. Plasma Surface Engineering is one of the valid tools for nanoprocessing and was established to achieve properties based on nanoscale effects for many possible applications and products. Plasma processes use the potential of nanoparticles, functional coatings, and surface structures. Nanoparticles are used for paints, lacquers, and in UV-reflecting films. These particles can be included in protective coatings for household appliances, spectacle lenses, glazing materials for sanitary applications, or in exterior house paints to prevent scratches, tarnishing, smudging or algae growth. Functional coatings fabricated with special plasma sources as well as systems allow the production of thin films for engines, windows, or mirrors and other parts in cars. Structured surfaces can be prepared via ultra-precision processing to enhance the efficiency of machines and measuring tools. In addition, plasma surface engineering is needed to prepare surface modifications for biomedical applications and to increase the biocompatibility of implants. Therefore, nanotechnology and plasma technology as new technological trends will have a powerful impact on the market of the 21st Century. Come learn about this technology of the future! Optical Coatings in Systems Tuesday Afternoon, April 26 12:40 p.m.–1:20 p.m. Presenter: H. Angus Macleod, Thin Film Center Inc. After a coating has been designed, it is eventually manufactured, tested, and then applied in a system. The real conditions under which the coatings are first tested and later employed can be, and almost invariably are, rather different from the ideal conditions under which they have been designed. For example, it is rare for a coating to be illuminated solely at normal incidence. The effects are not mysterious (in the sense that they can all be explained and calculated), but if it is the behavior under ideal conditions that is expected, then they can, on occasion, be surprising (sometimes unpleasantly). This tutorial will survey and explain some of these effects and will include some pitfalls to be avoided. Get the Competitive Advantage Contact us to find out why Pfeiffer Vacuum should be your first choice for turbo pumps New! A Guide to Starting Up a Technology-Based Business Wednesday Afternoon, April 27 12:40 p.m.–1:20 p.m. Presenter: John B. Fenn, Jr., Fennagain There are many times when a person says, “Why don’t I just start up my own business?” The presenter has asked this question several times and never really found the proper answers. However, he has learned many practical lessons during his career and will share these with the audience. This is by no means meant to be “the gospel” for starting up a new company, but this tutorial will address some every day issues that are important. Hopefully, there will be questions and comments stirred up by the presentation that will contribute as much information to the audience as the talk does. Reliability – Indisputably, the most reliable turbo pump manufactured Support – An independent solid company fueled by a highly motivated Support Team Performance – Best choice for all coating applications with maximum gas load, light gas pumping and fast pressure/cycle changes Pfeiffer Vacuum Inc. 24 Trafalgar Square · Nashua · NH 03063-1988 Tel. 800-248-8254 · Fax 603-578-6550 superturbo@pfeiffer-vacuum.com www.pfeiffer-vacuum.com 2005 Winter News Bulletin 17 SVC Equipment Exhibit at the 2005 TechCon in Denver Time is running out to reserve booth space at the 48th Annual SVC TechCon! Photo by Jowdy Photography Exhibit Hours: Monday, April 25 12:00 p.m.–7:00 p.m. Tuesday, April 26 10:00 a.m.–5:00 p.m. on’t miss out on this incredible opportunity to exhibit at the SVC TechCon in Denver, CO, April 25–26, 2005. Recognized as the premier event by engineers, manufacturers, technologists, and scientists within the international vacuum coating industry, the SVC TechCon and Exhibit is a wise investment of your marketing dollars. Coupled with the Smart Materials Symposium, this show will bring new prospects and customers your way. The show has sold out for the last 10 years, so don’t delay in signing up for booth space. There are only a few remaining spaces, so reserve now for the best selection. In addition to the Exhibit itself, there are numerous other opportunities to promote your products and services at the TechCon. Your company can also participate in the Innovators Showcase. This is an opportunity to make a 10-minute presentation about new products, new equipment, or a new D process. This approach is particularly effective when the presentation dovetails with your company’s participation in the SVC Exhibit. Your company can also sponsor a Refreshment Break, Internet Cafe, Beer Blast, and the Heuréka! Session. All sponsors are widely acknowledged in SVC publications, including the Final Program, News Bulletin, Web Site, and on signage at the TechCon. For more information or to reserve your booth, call the SVC Administrative Office at 505/856-7188, or e-mail svcinfo@svc.org. Contact Lisa Robillard, SVC Exhibit Committee Chair, Director of Corporate Communications, MKS Instruments, Inc., if you have questions about the 2005 Exhibit. Lisa can be reached at Lisa_Robillard@mksinst.com or at 978/284-4050. 18 2005 Winter News Bulletin Exhibiting Companies at the 2005 TechCon (as of January 15, 2005) This is your chance to see the latest in vacuum coating and related equipment and technologies! It’s not too late to join these companies that have already signed up to exhibit at the 2005 show: A&N Corporation • Academy Precision Materials • Advanced Energy Industries, Inc. • Advanced Vacuum Company, Inc. • Alcatel Vacuum Products, Inc. • Ambios Technology, Inc. • Ametek Process Instruments • Angstrom Engineering, Inc. • Angstrom Sciences, Inc. • Applied Films Corporation • Arcotronics-Aerre Machines • Bekaert VDS n.v. • BOC Edwards • CERAC, Inc. • CeramTec, Ceramaseal Division • Dark Field Technologies, Inc. • Denton Vacuum, LLC • Dexter Magnetic Technologies, Inc. • Duniway Stockroom Corporation • Dynamic Machine Works, Inc. • DynaVac • Eddy Company • Elgar Electronics Corporation • EMD Industries Inc. • ESK - A Ceradyne Company • Ferrotec (USA) Corporation • Fil-Tech, Inc. • Fischer Technology, Inc. • Fraunhofer FEP • Galileo Vacuum Systems, Inc. • General Plasma Inc. • GENERAL Vacuum Equipment Ltd. • GfE Metalle und Materialien GmbH • Hauzer Techno Coating bv • Helix Technology Corporation • Heraeus Incorporated • HORIBA Jobin Yvon, Inc. • HORIBA-STEC, Inc. • Huettinger Electronic, Inc. • HVA, LLC. • IFU Diagnostic Systems GmbH • IGC - Polycold Systems, Inc. • INFICON • Inland Vacuum Industries, Inc. • INP Greifswald • Insulator Seal, Inc. • Ionic Fusion Corporation • iplas-innovative plasma systems GmbH • ISRA Vision Systems Inc. • J.A. Woollam Co., Inc. • KLA-Tencor Corporation • k-Space Associates, Inc. • Korea Vac-Tec Co., Ltd. • Kurt J. Lesker Company • Leybold Optics GmbH • Lubtec Corporation • M. Theiss Hard-and Software • Maxtek, Inc. • MDC Vacuum Products Corporation • Midwest Tungsten Service, Inc. • Mill Lane Engineering Co., Inc. • MKS Instruments, Inc. • NAGY Instruments GmbH • Nor-Cal Products, Inc. • Optilayer, Ltd. • Pfeiffer Vacuum • Phelps Electronics, Inc. • PHPK Technologies, Inc. • Plasma Process Group, Inc. • Plasma Surface Engineering Corporation • Plasmaterials, Inc. • Precision Metal Works Ltd. • Precision Plus Vacuum Parts, Inc. • Process Materials, Inc. • PVT Plasma und Vakuum Technik GmbH • R.D. Mathis Company • Restek Corporation • Ricor Cryogenic & Vacuum Systems • Rigaku/MSC Vacuum Products • Rocky Brook Associates, Inc. • Rohwedder, Inc. • SAGE industrial sales, inc. • Saint-Gobain Ceramics • Semicore Equipment, Inc. • Seren IPS Inc. • SHI - APD Cryogenics, Inc. • Sidrabe, Inc. • Sigma Instruments, Inc. • Soleras Ltd. • Southwest Research Institute • Sputtering Components, Inc. • System Control Technology, Inc. • Tecport Optics, Inc. • Telemark • Thermionics Vacuum Products • Thin Film Center, Inc. • Tico Titanium, Inc. • Torr International • Tuthill Vacuum & Blower Systems • UCM AG • Ulvac Technologies, Inc. • Umicore Thin Film Products • US, Inc. • VACUUM COATING Technologies, Inc. • Vacuum Engineering & Materials Co., Inc. • Vacuum Technology & Coating • Vapor Technologies, Inc. • Varian Inc. • VAT, Inc. • VEECO Instruments, Inc. • Vergason Technology, Inc. • VON ARDENNE Anlagentechnik GmbH • VTD Vakuumtechnik Dresden GmbH • Williams Advanced Materials, Inc. Other Events Attracting Visitors to the Exhibit Hall The Exhibit Hall is also home to the Poster Session, Internet Cafe, Beer (and wine) Blast, Networking Dinner Reception, and Exhibitor Lunch. These events are instrumental in bringing (and keeping) even more visitors to the Exhibit Hall. Medium Frequency Generators, Big Plasma Sputtering Benefits! Model TIG 10/100P TIG 20/100P TIG 30/100P TIG 50/100P TIG 100/100P BIG 150/50P BIG 200/50P BIG 300/50P Power 0-10kW 0-20kW 0-30kW 0-50kW 0-100kW 0-150kW 0-200kW 0-300kW 20-100kHz 20-100kHz 20-100kHz 20-100kHz 20-100kHz 10-50kHz 10-50kHz 10-50kHz High reliability, compact size, cost-efficiency, low energy consumption, easy integration into your production line. That’s what you get with Huettinger’s solid state series TIG-P and BIG-P high power generators Frequency for reactive sputtering applications. Huettinger’s free-running oscillator type units, operating in a range of 20 to 100kHz, respond faster to arcs and provide a wider matching range to various load impedances. Find out more about Huettinger’s medium frequency generators. For your metallic mode applications, ask about our DC power supplies with advanced arc management circuitry. TRUMPF Group Huettinger Electronic Inc. Farmington, CT 06032 Tel: 860-255-6555 Fax: 860-255-6423 email: info@huettinger.com www.huettinger.com 2005 Winter News Bulletin 19 Photo by Jowdy Photography SVC Education Committee Report Education Program Schedule April 23–28, 2005 during the SVC TechCon A full slate of courses will be offered at the SVC Tech Con 2005, including three new courses. “Practical Aspects of Permeation Measurement: from Polymer Films to Ultra-High Barriers” will be presented as a half-day course on Thursday morning by Holger Nörenberg, Technolox, Ltd., UK, and Bernard Henry, University of Oxford, UK. Jeremy Grace, Eastman Kodak, will present a full-day course on “Plasma Web Treatment” on Sunday, April 24, before the Vacuum Web Coating sessions begin. André Anders, Lawrence Berkeley National Laboratory, will present a new course on “Pulsed Plasma Processing” on Wednesday, April 27. A total of 34 courses will be offered. If you notice anything missing from the program that you think could enhance the education mission of SVC, please do not hesitate to contact Ismat Shah, Vasgen Shamamian, or the SVC Administrative Office. The Distance Learning Program, a collaboration of SVC and the University of Delaware is also available. This self-paced course is offered twice a year, once in December and once in June. Look for more details on the registration for this course in the coming months. You don’t have to register for the TechCon or be a member of SVC to attend courses! Anyone can take advantage of the practical, problem-solving courses developed by the SVC. Taught by some of the most respected professionals in the vacuum coating industry, these courses cover every aspect of vacuum coating. Can’t make it to the TechCon? Most of the courses are available through our On-Site Education Program. Bring high-quality, practical courses in PVD Processing and Vacuum Technology to a facility that you select! For more information on this excellent education opportunity, contact the SVC at 505/856-7188 or E-mail: svcinfo@svc.org, or visit www.svc.org. April 23 Saturday Understanding Vacuum Systems (Discount package for V-201, V-202, V-203) High Vacuum System Operation (O’Hanlon) An Introduction to Physical Vapor Deposition (PVD) Processes (Shah) Basics of Vacuum Web Coating (McClure) An Introduction to Optical Coatings (Macleod) Vacuum System Gas Analysis (O’Hanlon) Basic Principles of Color Measurement (Caskey) Sputter Deposition (Greene) Process Control for Applications in Large Area Sputtering (Strümpfel) Optical Coating Design and Monitoring (Willey) Tribological Coatings (Sproul & Matthews) Plasma Web Treatment (Grace) NEW! Vacuum Materials and Large System Performance (O’Hanlon) Practical Helium Leak Detection Workshop (Webb) Primer on Thin Films and Vacuum Technology (McCrary) Material Science Aspects of Plasma Processing (Kay) Sputter Deposition onto Flexible Substrates (McClure) Sputter Deposition in Manufacturing (Glocker) Introduction to Plasma Processing Technology (Baránková & Bárdos) Thin Film Growth and Microstructure Evolution (Greene) Introduction to Smart Materials (Martin) Cryogenic High Vacuum Pumps (Ash) V-201 C-103 C-204 C-104 V-202 M-101 C-203 C-312 (a.m.) C-301 C-308 C-314 V-203 V-206 C-101 C-209 (a.m.) C-211 C-208 C-210 (a.m.) C-311 C-213 (p.m.) V-304 V-301 (a.m.) V-207 C-102 (a.m.) C-214 C-302 C-212 C-313 (a.m.) C-304 C-306 C-307 C-207 C-303 C-203 April 24 Sunday April 25 Monday April 26 April 27 April 28 Tuesday Wednesday Thursday S. Ismat Shah, University of Delaware (ismat@udel.edu) is the SVC Education Committee Chair, and Vasgen Shamamian, Dow Corning Corporation (v.shamamian@dowcorning.com), is the Assistant Chair. Career Opportunities Service As a service to Conference attendees and industry employers, the SVC Career Opportunities Service connects hiring companies with job seekers. Employers interested in posting career opportunities at the Conference should check with the SVC Information Center. There is no charge for posting announcements; however, employers/recruiters who wish to review the "Resume Book" must register the position with SVC. Job Seekers who did not preregister for this service by sending SVC a copy of their resume in advance must bring five copies of their resume to the SVC Information Center. These copies will be placed in the “Resume Book” and will be supplied to registered employers/recruiters who request them. 20 2005 Winter News Bulletin Care and Feeding of Mechanical Pumping Systems (McCrary) Practical Aspects of Vacuum Technology: Operation & Maintenance of Production Vacuum Systems (Langley) Introduction to Evaporation and Sputtering (Glocker) Pulsed Plasma Processing (Anders) NEW! Preparation and Properties of Optical Thin Film Materials (Morton) Troubleshooting for Thin Film Deposition Processes (Ash) Practical Aspects of Permeation Measurement: From Polymer Films to Ultra-high Barriers (Norenberg & Henry) NEW! ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications (Bright) Nonconventional Plasma Sources and Methods in Processing Technology (Baránková & Bárdos) Cathodic Arc Plasma Deposition (Anders & Vergason) Evaporation as a Deposition Process (Belkind) Optical Coatings for Conventional and Unusual Applications, and a Review of Computer Methods for Their Design (Dobrowolski) Course Classification System The course codes are intended to provide the prospective attendee with some guidance as to whether the emphasis in the course is primarily on vacuum technology (V code), or vacuum coating processes and technology (C code), or other miscellaneous topics (M code). The course number is intended to indicate the level of course specialization—the lower numbers refer to courses that are basic or introductory in nature, and the higher numbers refer to courses that offer a more specialized treatment of a specific topic. Courses are full day (8:30 a.m. to 4:30 p.m.) unless otherwise noted. Students: Visit the SVC Web Site and note the significant discounted rates that are available to you. SVC History Committee News SVC TechCon Meeting Schedule The schedule of SVC meetings held during the 48th Annual SVC TechCon in Denver is listed below. The SVC Education Program offers courses starting on Saturday, April 23, and ending on Thursday, April 28. See page 20 for the detailed schedule. Sunday, April 24 7:00 a.m.–8:30 a.m. 10:00 a.m.–3:15 p.m. 1:00 p.m.–4:00 p.m. 3:30 p.m.–4:30 p.m. 4:30 p.m.–5:30 p.m. 7:00 p.m.–8:45 p.m. 8:45 p.m.–10:30 p.m. Monday, April 25 7:00 a.m.–8:20 a.m. 8:30 a.m.–9:15 a.m. 9:30 a.m.–5:00 p.m. 12:00 p.m.–7:00 p.m. 12:40 p.m.–1:20 p.m. 1:30 p.m.–4:30 p.m. 2:10 p.m.–3:10 p.m. 4:30 p.m.–7:00 p.m. 7:15 p.m.–9:15 p.m. Tuesday, April 26 7:00 a.m.–8:20 a.m. 7:30 a.m.–8:45 a.m. 9:30 a.m.–3:30 p.m. 10:00 a.m.–5:00 p.m. 12:40 p.m. –1:20 p.m. 2:10 p.m.–3:10 p.m. 5:30 p.m.–6:30 p.m. Wednesday, April 27 7:00 a.m.–8:20 a.m. 8:30 a.m.–5:00 p.m. 8:30 a.m.–5:00 p.m. 10:30 a.m.–12:00 p.m. 12:40 p.m.–1:20 p.m. 6:30 p.m.–10:00 p.m. Thursday, April 28 7:00 a.m.–8:20 a.m. 8:30 a.m.–12:00 p.m. Education Committee Breakfast Meeting Board of Directors Lunch Meeting Vacuum Wizard Presentations (Don McClure) TAC Chair and Moderator AV Training Session Newcomer’s Welcome Reception Awards Ceremony & Plenary Session (Salil Pradhan) Welcome Reception for TechCon Registrants TAC Breakfast Meetings Keynote Special Presentation (Zhenan Bao) SVC Parallel Technical Sessions (3) Exhibit Open. Dinner Buffet at 5:30 p.m. Donald M. Mattox Tutorial Program (Ralf Fellenberg) Innovators Showcase Session “Meet the Experts” Corner Poster Session – $200 award for Best Poster! Heureka! Late-Breaking News Session Technology Forum Breakfast Exhibitor Meeting SVC Parallel Technical Sessions (3) Exhibit Open. Lunch at 12:00 p.m. and Beer Blast at 3:30 p.m. Donald M. Mattox Tutorial Program (H. Angus Macleod) “Meet the Experts” Corner Workshop on Specialty Coatings Technology Forum Breakfast Smart Materials Symposium SVC Parallel Technical Sessions (2) “Meet the Experts” Corner Donald M. Mattox Tutorial Program (John B. Fenn, Jr.) Program Committee Dinner Meeting Board of Directors Breakfast Meeting SVC Parallel Technical Sessions (3) New! Streaming Video Clips Oral History Interviews Streaming video clips of some of the oral history interviews are now on the SVC Web Site at http://www.svc.org/H/Videos/H_Historical Video.html. You can actually hear and see the interview in progress! Video tapes of oral interviews with key individuals conducted by History Committee members can be viewed at the TechCon in the Plaza Ballroom Prefunction area near Registration on Sunday through Thursday, April 24–28, 2005. The Education Resources Library also has PowerPoint Playback files and tapes of the Plenary Address, Special Presentations, and some Tutorials at the 2002, 2003, and 2004 TechCons. These presentations will be available for viewing in the SVC Speakers’ Room/Educational Resources Library. New! 50th Anniversary Publication to Document History Don Mattox, SVC History Committee Chair, has agreed to spearhead activities relating to the SVC 50th Anniversary in 2007. One project planned is creation of a publication that will tentatively be titled “50 Years of the Society of Vacuum Coaters.” It is proposed that the publication will be in two parts. The first part will be the organizational history of SVC, and the second part will be vacuum coating technology as seen by SVC interests. The goal of the SVC History Committee is to have a hard copy version of the publication available at the 50th Annual SVC Technical Conference and to have it be published as a supplement to the Conference Proceedings. This would put it into archival form both as a hard copy and in an electronic, searchable form on the SVC CD-ROM and with Knovel.com—(where our SVC Proceedings reside). The work will also be placed on the SVC Web Site. Don would appreciate the help of anyone who would like to be on the editorial team for the publication. He would welcome a volunteer or group of volunteers from each TAC to be the Associate Editor for their appropriate technical subject. Thank you to Ludvik Martinu of the Optical Coating TAC, to Steve Nadel, of the Large Area Coating TAC, and to John B. Fenn, Jr., of the Vacuum Web Coating TAC, for volunteering to serve as Associate Editors for their technology! A preliminary outline of subject matter is available from Don Mattox. Attention Old-Timers! We need your input. The retirees of our vacuum coating community are the individuals who can help the History Committee and 50th Anniversary Committee fill in the blanks on the early history of SVC. If you are willing to contribute to the publication, please send your comments and contributions to Don Mattox at donmattox@svc.org, or call him at 505/856-7188. TechCon registrants are invited to attend committee meetings if advance notice is given to the SVC Administrative Office at svcinfo@svc.org. Thank you! The SVC would like to thank the companies sponsoring the following hospitalities at the 2005 TechCon. Refreshment Break Sponsors • A&N Corporation • Academy Precision Materials • Duniway Stockroom Corporation • Hauzer Techno Coating bv Beer Blast Sponsors • Dexter Magnetic Technologies, Inc. • DynaVac • GENERAL Vacuum Equipment Ltd. • Huettinger Electronic, Inc. • MKS Instruments, Inc. • Rocky Brook Associates, Inc. • Rohwedder, Inc. • SHI - APD Cryogenics, Inc. • VEECO Instruments, Inc. For Sale Stokes 72” Dia. x 110” L Vacuum Metalizer w/ support equipment Stokes 72” Dia. x 114” L Vacuum Metalizer w/ support equipment NRC 84” Dia. x 126” L Vacuum Metalizer w/ support equipment o Internet Café Sponsor • Varian Inc. C&C General L.L.C. Call Brad (231) 798-7609 E-mail: cbmorton@comcast.net 2005 Winter News Bulletin 21 Sample Guide from the Collection of Order Your Education Guides Today! Written by Donald M. Mattox, SVC Technical Director, this indispensible publication contains individual, standalone, two-page guides on different aspects of the equipment and technology associated with vacuum coating processing by physical vapor deposition. Titles of some of the sections include: • Introduction to the Basics of PVD Processing • Materials Science • Vacuum Technology • Plasma Technology • Surface Preparation • Vacuum Evaporation • Sputter Deposition • Arc Vapor Deposition • Ion Plating • Low-Pressure CVD and PECVD • Atomistic Film Growth and Resulting Film Properties • Surface and Film Characterization • Applications • Safety Education Guides to Vacuum Coating Processing by Donald M. Mattox SVC Technical Director Safety: Safety Aspects of Vacuum Processing The vacuum environment poses no direct safety hazard unless you happen to be in the chamber when it is pumped down. The pressure differential that is established between the ambient and the vacuum can cause safety hazards. If a glass enclosure, such as that of a glass belljar chamber or the envelope of an ionization gauge, breaks then the pressure differential will cause an implosion of the glass shards. In the case of the belljar, the flying glass can pose a safety hazard. This is the reason that glass belljars are not commonly used nowadays. Glass belljars can easily break if heated non-uniformly such as having an electron beam hitting one area. If they are used, they are surrounded by a wire enclosure to prevent the glass shards from escaping. The glass envelope of an ionization gauge should also be surrounded by an enclosure, more to prevent it from being accidentally broken than it being a safety hazard. When working around systems where implosion can occur, safety glasses should be worn. There have been several cases of death where large, vertical, top-opening vacuum chambers have been backfilled with a heavierthan-air gas, such an argon, and a person has entered the oxygen-deficient atmosphere. In one case, several would-be rescuers died as well as the original victim. When situations like this are possible the worker should have a safety-line that allows them to be pulled out of the chamber. Vacuum chambers are not designed for pressurization, and if backfilling from a high pressure source, such as tank nitrogen, causes the pressure in the chamber to exceed the ambient atmospheric pressure, a seal may release violently causing injury or damage. This hazard can be avoided by capturing the seal with clamps or bolts and having a pressure relief valve on the chamber. Doors should have stops that prevent them from opening more than a centimeter or so without removing the stop, this prevents them from flying open unexpectedly. The vacuum pumping system used to generate the vacuum poses the same safety hazards as those commonly encountered in electrical and mechanical equipment. Moving parts, such as belts and pulleys, should be shielded so that hands and clothing will not get caught. High voltage leads should be shielded. Interlocks should be used to prevent the high voltage from being turned on unless there is a vacuum in the chamber. If an interlock is overridden for maintenance reasons there should be a flashing red light for everyone to see. Liquid nitrogen is often used in vacuum technology to cool adsorption materials, traps and baffles. If the liquid nitrogen vaporizes in a More than 90 Guides in One Set With Updates Added Every Year! Each set is only $50 (includes shipping/handling in USA) $35 each for 10 or more sets For a complete list of titles and ordering information, visit the SVC Web Site at: http://www.svc.org/EP/EP_Educational Guides.html. You can also send us an E-mail at svcinfo@svc.org or call 505/856-7188 to request an order form. Society of Vacuum Coaters 71 Pinon Hill Place NE Albuquerque, NM 87122-1914 Telephone 505/856-7188 Fax 505/856-6716 E-mail svcinfo@svc.org Web Site www.svc.org poorly ventilated enclosed space it can displace enough air to form an oxygen-deficient atmosphere. This oxygen-deficient environment can cause workers in the area to pass out. One liter of liquid nitrogen will produce about 650 liters (STP) of nitrogen gas. When using liquid nitrogen, care should be taken that the cold fluid or a cold surface does not contact and “burn” the skin. In particular, liquid nitrogen should not be allowed to drop in your shoes! The liquid nitrogen can splatter, so safety glasses or a face shield should be used when transferring the fluid. Oxygen is used for reactive plasma cleaning and the reactive deposition of oxide compounds. Compressing pure oxygen in an oil-sealed mechanical pump, using hydrocarbon oil, can cause a diesel-type explosion that can blow the pump apart. This problem can be minimized by using an oxygen-nitrogen mixture, such as pure air, that is less explosive. More chemically stable fluids, such as silicone oil or perfluorinated polyethers (PFPE) such as Fomblin™, can be used in the mechanical pump, but generally they are not good lubricants and maintenance can be a problem. Pumping pure oxygen in a cryopump followed by pumping hydrogen, such as is formed by the decomposition of a hydrocarbon vapor in the reactive deposition of a carbide film, can cause an explosion in the cryopump on regeneration. Plasmas, along with high voltages, can pose a safety problem if a metal vacuum chamber is not adequately grounded. A plasma in contact with a surface at a high negative voltage can float to a high negative potential with respect to ground. If an electrically floating surface, such as a metal vacuum chamber isolated from ground by a rubber sealing gasket, is in contact with the plasma it can attain a high voltage with respect to ground. This can present a shocking hazard. High voltages in contact with the plasma can come from such diverse sources as bias voltages on substrates or ionization gauges that are left on, particularly in the degas mode, when the plasma is established. All metal surfaces in plasma systems that are not being used as electrodes should be well grounded to prevent such floating potentials. Plasmas generate ultraviolet radiation that can be transmitted through glass windows, particularly if the window is quartz. Ultraviolet radiation can harm eyes and skin on excessive exposure. The UV can be adsorbed by filters on the windows or by eye glasses worn by the operator. These are the same types of glasses used when working with lasers or with glass blowing. In thermal evaporation the material being evaporated is at a high temperature and the thermal radiation can harm skin and eyes, particularly those wearing contact lenses. An optically clear “heat mirror”, which transmits the visible 24 2005 Winter News Bulletin and reflects the infrared, can be used to prevent the radiation from reaching the observer. This is the type of mirror that is used in projection and lighting systems to prevent heating of objects being illuminated. Such heat mirrors should be cooled by air blowers. High-pressure gases are often used in vacuum processing. High-pressure gas cylinders can pose a major safety hazard if they fall and the tank-valve is knocked off. They then can become a jet-propelled missile. Gas cylinders should be transported with the correct equipment, stored with a protective cap over the tank valve and tied-down when not being transported, particularly when the pressure regulator is on the tank valve. Plumbing between the tank and the point-of-use should have a flow restrictor and a pressure relief valve to prevent over-pressurizing the gas line. When using toxic gases such as arsine or flammable gases such as silane, the distribution system should be of double-walled tubing. This allows the outer jacket to carry escaping gases to a volume, such as the cylinder cabinet, where they can be detected as shown in Figure 1. Gas plumbing should be helium leak-checked after installation. Detectors and alarms are available for toxic and flammable gases. The exhaust system for the storage cabinet should not exhaust near the intake for another area. Gas suppliers provide handling instructions and MSDSs for gaseous materials (see general references). When changing gas cylinders or investigating a gas leak in a toxic gas distribution system, Self Contained Breathing Apparatus (SCBA) equipment should be worn. Changing gas cylinders can introduce contamination into the gas lines. If this is a concern, a valve arrangement, such as shown in the figure, can be used to allow evacuation and purging of the gas distribution line prior to opening the cylinder valve. Gas cylinders should never be allowed to be emptied to ambient pressure since, when opened later, they can draw in air and water vapor if the new ambient pressure is higher than the pressure in the tank. Always leave 10 to 15 psig pressure in the tank. Regulator valves for use with oxidizing gases should not be lubricated with hydrocarbon lubricants. Vacuum pumps are often used to pump flammable, corrosive or toxic gases. These gases can accumulate in the pump oils and present a maintenance hazard. For example, pumping of chlorine-containing gases with a hydrocarbon-oil-containing vacuum pump in the presence of oxygen or water vapor can produce phosgene (COCl2), a toxic gas. Pumping fluorinecontaining gases with pumps containing hydrocarbon oil can lead to the formation of hydrofluoric acid (HF) which can accumulate in the oil. Often flammable, corrosive or toxic gases are removed from the pump exhaust by burning and/or by solution in water. For example: In the exhaust system, silane (SiH4) can be burned to form non-toxic SiO2. Chlorinecontaining gases can be dissolved in water either by bubbling through water or in a water spray tower. The exhaust system of such systems should be monitored and alarmed for flammable or toxic gases. Gas mass flow meters (MFM) generally are designed to only withstand several hundred psi inlet pressure. Higher pressures can result in the violent failure of the meter. Since the gas sources for PVD processing are often from high pressure gas cylinders, it is important that the full cylinder pressure never be applied to the flow meter. This can be avoided by using a pressure regulator on the gas cylinder and including an appropriate flow restrictor and pressure relief valve in the gas distribution line. In case the regulator fails and full cylinder pressure enters the line, the flow restrictor causes the line pressure to increase to the point that the pressure relief valve is actuated before pressure in the downstream line exceeds the design pressure of the mass flow meter. The MFM should be shielded from personnel just in case. In high rate vaporization of oxygen-active materials, such as titanium and zirconium, in an inert gas environment, vapor phase nucleated particles can form soot that deposit on the walls of the chamber (1). These fine particles form a very thin passivating layer when exposed to air. When disturbed the layer can catch fire and the fire can spread over the whole film. Such deposits should be wet-cleaned in order to prevent a fire. Concern has been expressed about forming toxic cyanide (CN) gas when combining nitrogen and a hydrocarbon vapor, such as acetylene (C2H2), in a plasma when depositing a carbonitride film. To my knowledge, Gas Detector/Alarm Exhaust Failure Alarm Dedicated Exhaust Sprinkler Head Main Shut-Off Valve Purge Gas Pressure Pressure Relief Valve Regulator/ Gauge Thermal Alarm Tank Valve Limited Access Cabinet Source Gas Flow Dual Wall Gas Piping Vacuum SelfContained Breathing Apparatus (SCBA) Sensor-Activated Shut-off Valve Flow Restrictor Tank Tie-down High Pressure Gas Cylinder (Toxic/Flammable) Tank Temperature Stabilizaton Figure 1: A cabinet for containing toxic, flammable, explosive, carcinogenic, or mutagenic high pressure gases. no harmful level of cyanide has ever been detected in the exhaust of such a plasma system. Cleaning vacuum systems, fixtures and substrate holders generally involves chemicals and the basic aspects of chemical safety (eye protection, skin protection, etc.) should be observed. Removing particulates of film deposit should be done by wet chemical methods to avoid forming “dust” of the material. When using dry abrasive cleaning, such as grit blasting, appropriate eye and respiratory protection should be worn and the work performed in a well-ventilated area. Silica grit (silica sand) should not be used for grit blasting because of respiratory concerns (silicosis) – use alumina. References: Air Products (gas supplier) Safetygrams and MSDSs - 800/245-2746 Office of Safety and Health Administration (USA) - www.osha.gov (internet web site) CRC Handbook of Laboratory Safety, A.K. Furr, 5th edition, CRC Press 2000 Sax’s Dangerous Properties of Industrial Materials,10th edition, Richard J. Lewis, Sr., John Wiley and Sons 1997 Safe Storage of Laboratory Chemicals, 2nd edition, edited by David A. Pipitone, John Wiley and Sons 1991 The SVC TechCon is still an incredible bargain for attendees! Look at what you get for your registration fee: • Entry to the TechCon and Exhibit • Newcomer’s Welcome Reception • Exhibit Dinner Buffet • Welcome Reception for TechCon Registrants • Exhibit Lunch and Exhibit Beer Blast • Technology Forum Breakfasts • and much more! Also, please support the Society by staying at the Adam’s Mark Denver Hotel. By staying at the Adam’s Mark Hotel, not only do you help the Society, but you also have the advantage of convenient access to all early morning and evening functions during the TechCon. Registering for the TechCon doesn’t get any easier than this! Register on-line at www.svc.org 2005 Winter News Bulletin 25 Report on Plasma Surface Engineering (PSE) 2004 Ric Shimshock presented an SVC-sponsored presentation in a workshop highlighting successful applications of plasma and ion surface engineering. very other year, the European Joint Committee on Plasma and Ion Surface Engineering (EJC/PISE) hosts an international conference on Plasma Surface Engineering (PSE). The Ninth International PSE (PSE 2004) was successfully held this last fall in the Congress Hall in the German town of Garmisch-Partenkirchen, which is nestled in the foothills of the Alps. With over 600 attendees from around the world, over 400 presentations, and 60 exhibitors, this symposium was the largest and most successful PSE to date. Professor H. Stoeri (University of Vienna) was the Conference Chair of the PSE 2004. The conference was organized by the Arbietskreis Plasma (AK Plasma www.akplasma.org), which is the German PISE Group, and VDI Technology Center (www.vdi.de), which was chaired by Dr. Karin Reichel. The focus of the PSE 2004 was on the utilization of plasma and ion beam technologies in surface engineering and thin films. The conference surveys progress in the research and development of plasma surface engineering and its various applications. The conference was arranged with a full week’s content around the following topics: • Properties and characterization of surface coatings and modifications • Deposition and modification • Materials aspects • Plasma and ion beam physics • Engineering of industrial plasma processes • Theory and modeling • Industrial applications • Special topics The symposium consisted of invited talks, keynote speakers, contributed presentations, and posters. A tutorial organized by AK Plasma /VDI and chaired by Dr. W. Moeller of the Research Center Rossendorf was held on “Fundamentals and Trends of Plasma Surface Processing.” This tutorial convened on the Saturday and Sunday prior to the start of the conference. This was a successful interchange of information, and the tutorial had roughly 50 attendees. Two days of an Industrial Exhibition were held on Tuesday and Wednesday of the conference, which allowed various industrial concerns to showcase their services and discuss their products with the attendees. In addition, a workshop highlighting successful applications of plasma and ion surface engineering was held on Wednesday afternoon. Speakers from industrial companies discussed specific practical examples of the successful implementations of plasma and ion-based processes ranging from automotive to optical applications. This workshop was organized by the VDI Technology Center in cooperation with the SVC. Dr. Gruen of PlasmaTechnik Gruen and Ric Shimshock of the SVC were the chairs of this workshop. In addition, Ric Shimshock presented an SVC-sponsored presentation on the successful applications of plasma-based deposition in current industrial use for the optical coating of light bulbs for energy conservation. E Dr. Ralf Fellenberg (VDI) and Ric Shimshock (SVC) in the front of the PSE 2004 Congress Hall. Dr. Fellenberg will present his nanotechnology tutorial at the SVC TechCon in Denver. SVC looks forward to continued participation in the 2006 PSE Workshop, which will be held in Garmisch-Partenkirchen in September 2006. The Nanotruck is a mobile, interactive science exhibit, designed to inform the public about the fascinating world of nanotechnology. This traveling exhibit hall can be easily moved from site to site and has traveled widely across Europe. Over 100,000 visitors have inspected the various nanotechnology exhibits and demonstrations since it begun touring. The theme of the various exhibits is “A Journey to the Nanocosmos – a World of Minute Proportions.” The exhibits were funded and developed by the German Federal Ministry for Education (BMBF) under the German Science in Dialogue (Wissenschaft im Dialog) initiative. The exhibits include many interesting and informative displays of applications of nanotechnology in textiles, semiconductors, optics, and chemistry. Applications of nanotechnology in the marketplace continue to expand. Coatings and functionalization of surfaces play a major role in achieving the goals of many nanotechnology applications. The Nanotruck has been very successful in drawing and educating visitors to the exhibit, and the tour of the Nanotruck has been extended. You can learn more about nanotechnology and the scheduled tour of the Nanotruck by visiting the web site www.nanotruck.net. Attendees to the upcoming SVC’s 48th Annual TechCon in Denver 23–28 April 2005 will also have the opportunity to listen to an interesting tutorial on nanotechnology at one of the tutorials presented in the Donald M. Mattox Tutorial Program. This tutorial will cover some of the most interesting applications of nanotechnology. Dr. Ralf Fellenberg will present his nanotechnology tutorial on Monday, April 25 at the SVC TechCon. We hope to see you there. Ric Shimshock, MLD Technologies LLC (ricshimshock4mld@aol.com), is the 2005 SVC Program Chair. He represented SVC at PSE 2004 as Co-Chair of the Workshop on “Successful Applications of Plasma and Ion-based Processes.” SVC Awards Committee Solicits Nominations The Awards Committee of the SVC is soliciting nominations from SVC members for the Nathaniel H. Sugerman Memorial Award and the Mentor’s Award Program. The Sugerman Award commemorates the enduring efforts of Nat Sugerman in founding, nurturing, and supporting the Society of Vacuum Coaters. It recognizes distinguished achievement in one or more of the following areas: • Distinguished service to the SVC • Outstanding technical achievement • Noteworthy educational contributions to 26 2005 Winter News Bulletin the vacuum industry • Creative innovation in the development of a product or process pertaining to the vacuum industry The Mentor’s Award recognizes people who have made or are making significant contributions to the SVC and/or the industry by their example or guidance, including one-on-one and one-on-many interactions. The award may be posthumous. Announcement of the awards will be made at the Annual Business Meeting of the Society at the TechCon in Denver on April 24, 2005. Nominations can be made by SVC members only and are due by January 31, 2005. Members of the Awards Committee as well as employees and contractors working for the SVC are ineligible. Please send nominations to David Glocker, the Awards Committee Chair, at david@isofluxinc.com and include the nominee’s affiliation, contact information, and the contribution(s) that the Awards Committee should consider. 2005 TechCon Keynote Presentation Organic Materials and Processes for the Fabrication of Electronic Devices Presented by Zhenan Bao Monday Morning, April 25 8:30 a.m.–9:15 a.m. Organic semiconducting materials are now being considered as the active materials in displays, electronic circuits, solar cells, chemical and biological sensors, actuators, lasers, memory elements, and fuel cells. The flexibility of their molecular design and synthesis makes it possible to fine-tune the physical properties and material structure of organic solids to meet the requirements of technologically significant applications. In contrast to inorganic materials, active organic thin films can be deposited at much lower substrate temperatures (less than 120°C) in low vacuum or atmospheric pressure environments. It has been demonstrated that low-cost deposition techniques such as solution spin-coating, casting, and even printing can be used for deposition of solution soluble organic materials. These processing advantages, together with the natural abundance of organic solids, make semiconducting organics attractive for large-area and low cost applications. The performance of Organic Thin Film Transisters (OTFTs), key elements for all electronic devices, depends on the construction of each of the active layers, which are the organic semiconductor layer, insulating (dielectric) layer and the electrodes. The deposition method, condition, sequence, post-deposition treatment, and surface treatment significantly impact OTFT performance. Therefore, it is important to fully understand various factors that affect the thin film growth processes. Specifically, one needs to pay attention to how the molecular structure of the organic semiconductor and thin film morphology affect the performance of OTFT devices, namely, the field effect mobility and on/off ratio. In this talk, semiconductor materials design in context of controlling the semiconducting material properties, such as electronic properties, molecular orientation, molecular packing, and morphology, will be discussed. A general overview of the current status of organic material based flexible electronic devices will be given. Zhenan Bao is an Associate Professor in the Department of Chemical Engineering at Stanford University CA. In 2002 she was selected by the American Chemical Society Women Chemists Committee as one of the twelve “Outstanding Young Woman Scientist” who is expected to make a substantial impact in chemistry during this century.” 2005 Winter News Bulletin 27 Photo by Jowdy Photography Fundamentals of Optical Coatings by Angus Macleod Thin Film Center Inc. Introduction During the 16th Century, a secret process to produce mirrors of a quality never before seen was devised in Venice. The mirrors consisted of a glass substrate carrying on their rear surface a layer of mercury-tin amalgam. In spite of vigorous attempts it proved impossible to retain the secret and the technique spread. Mirrors became an important feature of interior design. This was the beginning of the modern optical coating industry. Nowadays, optical coatings have penetrated every corner of our modern lives. From the $20 bill in our pocket to the DVD player in our home, optical coatings play a critical role. Optical coatings modify the optical properties of surfaces. Most often these are the carefully worked surfaces that shape and direct the light rays in an optical system but they can also be applied to other surfaces, often in a decorative mode. Their operation relies on interference effects combined with the optical properties of their materials. This account is necessarily limited to some of the more common coating types. characterize the wave. This wavelength is n times the actual wavelength and implies that we have to make the same adjustments to the distance, d, and so we introduce the quantity nd known as the optical thickness. When we talk of the thickness of a film in an optical coating, generally we imply the optical rather than the physical thickness. n governs refraction at a boundary between two materials through Snell’s Law: n0 sin ϑ0 = n1 sin ϑ1 (1) where ϑ is the angle between the ray and the surface normal. n is also involved, through the optical thickness, in the change of phase due to propagation through a material. If the physical thickness is d, then δ, known as the phase thickness, is given by δ= 2π nd λ (2) Fundamental parameters In free space, the propagation of an electromagnetic wave is independent of wavelength or frequency. There are two principal parameters that characterize this propagation. Both are exact and are fundamental physical constants. The first is the velocity of light in vacuum, c, of value 299,792,458 m sec-1, and the second, the permeability of vacuum, µ 0, of value 4π×10-7 N/A2. Propagation of an electromagnetic wave in an optical material is a little more complicated. The shape of any arbitrary wave changes as it propagates making it difficult to assign a velocity to it. Fortunately at normal power levels the phenomena are purely linear. That means that we can represent the light as a spectrum of harmonic components that can be treated separately and do not change shape as they propagate. We are so used to this process that we scarcely think about it. The spectral components that we use in the thin-film field are infinite, plane, harmonic waves, that is they are a harmonic function of time and distance along the direction of propagation only. The electric field, magnetic field and direction of propagation in these waves are mutually perpendicular and form what is called a right-handed set. The orientation of the electric vector is described by the term polarization. We will use the simplest form, called linear, or sometimes plane, polarization, where the electric vector is constant in direction. In an optical material the light interacts with the electrons so that its propagation characteristics are altered. We could build our theories of optical behavior using the velocity of light, v, and the permeability, µ, associated with a harmonic wave, to characterize our materials, but the results are a great deal less clumsy if we introduce two related parameters. The first is the refractive index, the ratio of the velocity of light in free space to the velocity in the material, c/v, written as n. The other is the characteristic admittance of the material, written as y and of value 1/(vµ). The characteristic admittance represents the ratio of the magnetic to the electric field amplitudes of a propagating harmonic wave. In free space, n is unity and y is 0.002654419 S (siemens). The electrical engineer usually prefers to use the characteristic impedance, z, of value 376.73031 Ω (ohm) in free space. There is an enormous simplification in optics because the frequencies are so high that there is no direct magnetic interaction with the electrons that are responsible for the optical properties of materials. This means that the permeability, µ, of the material remains at the value of µ0. This implies that y is simply n times the admittance of free space, or n free space units, and allows us to use the same number for both quantities. Note that y and n are only numerically equal and not physically equal. The effects we are dealing with are linear and so the frequency of the wave is constant. This means if it slows down then the wavelength is reduced in proportion. We avoid problems by using the wavelength in free space to 28 2005 Winter News Bulletin where λ is the wavelength measured in free space. y characterizes the amount of light reflected at a boundary between two media. The ratio of the reflected amplitude to the incident amplitude is given by: ρ= y0 − y1 y0 + y1 (3) In dielectric materials the electrons are bound. They accept energy from the electric field but then radiate it back and the principal effect is a slowing down of the light so that the refractive index, n, is greater than unity. In metals the free electrons extract energy from the electric field but do not return the energy to the wave. The amplitude of the propagating wave decays exponentially. The decay is usually expressed as exp(-2πkd/λ) where k is dimensionless and known as the extinction coefficient. An extinction coefficient can also be used to characterize the small residual losses in a dielectric material. In an ideal metal the light wave suffers no change in phase as it propagates. In a real metal there is a phase change, often quite small, and this can be associated with a refractive index through equation (2). A quite small refractive index can be mistakenly taken as an indication that the light is traveling faster than its speed in free space. We must not forget that we are dealing with an infinite harmonic wave in a steady-state condition and that the refractive index is derived from a steady-state phase difference. A pulse of light is a transient effect with quite different behavior. Provided that the effects are linear, we can conveniently combine the cosine and sine representation of a harmonic wave into a complex form, known as a complex wave. 2π nz  2π nz   2π kz    2π kz   E exp  −  cos  ω t −  + iE exp  −  sin  ω t −  λ  λ  λ   λ       2π ( n − ik ) z  = Eexp i ω t −  λ      (4) The quantity (n-ik) appearing in the right-hand side of equation (4) is known as the complex refractive index. As long as we stick to linear operations, like addition or subtraction or multiplication by a real constant, there is never any mixing of the real and imaginary parts of expression (4) and it is much simpler to use the right-hand side of (4) than either of the terms on the left-hand side. y, the characteristic admittance is then equal to (n-ik) free space units. All the previous relationships work equally well with complex arguments. The power per unit area carried by a harmonic wave is given by the product of the electric (E) and magnetic (H) fields. This fluctuates at twice the frequency of the wave and it is the mean rate that we detect and measure. The mean rate is called the irradiance. The product is a non-linear operation but fortunately we can write a form of product using the complex quantities that gives directly the mean. This expression is: The 8th International Symposium on SPUTTERING & PLASMA PROCESSES June 8-10, 2005 Kanazawa, Japan Irradiance = 1 Re  EH ∗   2  (5) For a harmonic wave, since H = yE, the irradiance is proportional to the square of the electric field amplitude. The expression, (3), is essential for calculations, but when a measurement is made it usually concerns the ratio of reflected to incident irradiance. This is known as reflectance, R, and, through (5), is given by Symposium • Poster Session Industrial Exhibition Scope of the Symposium: • Fundamentals of Sputtering and Plasma Processes • Sputtering Processes • Plasma Processes • Plasma Induced Process Technologies • Thin Films • Micro and Nano Technologies  y − y  y − y  y −y R =  0 1  0 1  = 0 1 y0 + y1  y0 + y1   y0 + y1  ∗ 2 (6) where we include the possibility that y might be complex. A similar quantity, transmittance, T, measures the ratio of transmitted irradiance to incident irradiance. Some typical values of optical constants are shown in Table 1. Although the exponential decay is characterized by k the actual absorption losses are better expressed by the product nk. Material MgF2 SiO2 Ta2O5 TiO2 n 1.38 1.46 2.14 2.35 k 0 0 0 0 Material Al2O3 Ag Al Glass n 1.673 0.051 0.70 1.52 k 0 2.96 5.663 0 Don’t miss the great opportunity • to find solutions for your needs. • to discuss sputtering and plasma processes face to face with your colleagues. http://issp2005.org/ Table 1. Some typical optical constants at λ=510nm. Note that they do depend to an extent on deposition conditions as well as wavelength. The glass is a typical crown glass. Simple coatings Usually the most important properties controlled by coatings are reflectance and/or transmittance. The simplest coating is probably a single metallic layer. Aluminum and silver have very high values of k. This has two implications. These simple coatings present very high reflectance, over 90%, and a quite thin layer, 100nm or so, has such small transmittance that it appears like bulk metal. Front surface mirrors of aluminum combine the high reflectance of the metal with the dimensional stability and surface optical quality of the underlying substrate, usually glass. The metal layer can quite easily be damaged and so it is normally protected. Architectural mirrors place the metal layer behind the glass but for high optical quality imaging it must be in front and it is usually protected by a thin dielectric layer, (silica being preferred). The protecting layer tends to reduce the metallic reflectance and this reduction is least with low-index protecting layers. More complicated coatings may be constructed entirely from dielectric materials, when they are known as all-dielectric, or they may also include one or more metal and dielectric layers, when they are know as metal-dielectric. Because n does not vary appreciably with wavelength the phase thickness, δ, of a dielectric layer reduces with increasing wavelength. The interference properties weaken with increasing wavelength. All-dielectric coatings, therefore, are most suited to a high reflectance at shorter and high transmittance at longer wavelengths. Over its useful region, the extinction coefficient for a metal is roughly proportional to wavelength. This large dispersion is a problem in that it complicates the design of metal-based coatings but it does mean that metal-based coatings become stronger in their effect, that is they tend to reflect, as we move to longer and longer wavelengths. Metal-dielectric coatings, therefore, perform best in applicacontinued on page 31 2005 Winter News Bulletin 29 Stay Updated What’s Ahead for the Vacuum Coating Industry? 48th Annual SVC Technical Conference and Smart Materials Symposium April 23–28, 2005 Adam’s Mark Denver Hotel Denver, Colorado Join us in the “Mile High City” for six days of education, innovation, and information on vacuum coating! Exciting developments and innovative ideas will be presented in the Technical Sessions (April 25–28), including the second annual Smart Materials Symposium, co-sponsored by Elsevier, as well as two Hot Topic Joint Sessions, a special HIPIMS Session, Heuréka! PostDeadline Recent Development Session, and much more. Other highlights include the Donald M. Mattox Tutorial Program, “Meet the Experts” Corner, Technology Forum Breakfasts, the Internet Cafe and Beer Blast in the Exhibit Hall, and various other hospitality events – all included in the registration fee. The two-day Exhibit & Innovators Showcase (April 25–26) is a one-of-a-kind forum dedicated to showcasing technological advances in the vacuum coating industry. Take advantage of the SVC Short Course Education Program (April 23–28) during the TechCon. You don’t need to register for the TechCon or be an SVC member to choose from more than 30 high-quality, practical courses taught by industry experts. Photos of Denver courtesy of the Denver Metro Convention & Visitors Bureau SVC Photos by Jowdy Photography For more information, go to www.svc.org to find out more about this one-of-a-kind event. Society of Vacuum Coaters 505/856-7188 Fax 505/856-6716 E-mail svcinfo@svc.org Fundamentals of Optical Coatings continued from page 29 y0 − R= y2 f 2 tions where transmittance is required at shorter and reflectance at longer wavelengths. We find when we are forced to achieve the opposite performance that quite difficult and complicated designs are necessary. As an example, the heat-reflecting and luminous light-transmitting coatings round the outer surface of the envelopes of incandescent floodlights must be of dielectric material to withstand the very high temperatures and a coating of one hundred or so layers is not unusual. ysub y2 y0 + f ysub (8) where y0 is the admittance of the incident medium. A half-wave film can be represented by a double application of the quarter-wave rule. This returns the admittance to ysub with the obvious result. The quarter-wave rule is particularly simple and yet completely accurate. Calculation of properties at other wavelengths or for other thicknesses is rather more difficult and involved. The model is essentially an elaboration of the style of the quarter-wave rule but now for any serious calculations a computer is used. Nevertheless, knowledge of the quarterwave rule and some appreciation of interference phenomena go a long way towards understanding the performance of a wide range of optical coatings. An immediate consequence of (8) is that the reflectance will be zero if yf is given by √(y0 ysub). For glass of admittance 1.52 in air of admittance 1.00, this implies a quarter-wave film of admittance 1.233. Unfortunately, we have difficulty creating a sufficiently rugged film of this low value admittance to serve as a general-purpose antireflection coating. Magnesium fluoride, with index around 1.38, is mostly used. The minimum reflectance is then 1.26%, as shown in Figure 2. Figure 1. The interference fringes as a function of layer thickness in wavelengths resulting from a dielectric thin film over a dielectric substrate. Note that the addition of each quarter wave results in the addition of a fringe extremum. Dielectric coatings are often constructed from a series of quarter-wave layers. Let us imagine a dielectric substrate surface. Let us apply a film of a different dielectric material to this surface. In the steady state condition achieved by our infinite harmonic waves there will be an infinite number of beams reflected back and forth between the two surfaces of the film giving rise to a multiple-beam interference condition. Let the film be exceedingly thin so that although it still exists, nevertheless the reflectance of the surface is unperturbed. Because the film still exists the multiple-beam effect also exists. When two beams of light of identical wavelength interfere their combination takes account of their phase difference. This is often expressed as a path difference. Because of the repeat cycle of the light, one wavelength long, a change in the path difference of one wavelength, or any whole number of wavelengths, makes no difference whatsoever to the interference. Now let us increase the thickness of our vanishingly thin film so that it is now one half wave thick. δ for this film is π. This imposes a double traversal of the film between each of the combining beams, (in other words a full wave). The interference condition is unaffected and, therefore, the reflectance is exactly the same as that of the uncoated substrate. The same is true of a layer one full wave thick and so on. Half-wave layers are sometimes called absentee layers because of this property. A similar argument shows us that the thicknesses midway between the half-wave points, quarter-wave layers, with δ of π/2, will yield a maximum interference effect so that the reflectance of the dielectric substrate will either be increased or decreased to a maximum extent. The quarter and half-wave condition can be expressed in terms of the concept of surface admittance and its transformation. A simple material surface presents its characteristic admittance to the light in the incident medium. A thin film can be considered to transform this surface admittance to a new value. In the case of a quarter-wave layer this transformation is known as the “Quarter-wave rule.” If the surface of the substrate has admittance ysub and the characteristic admittance of the film is yf, then the transformed admittance will be given as: Figure 2. Theoretical performance of a single-layer antireflection coating consisting of a quarter wave of magnesium fluoride on glass. The film is a quarter wave at a wavelength of 510 nm. Two quarter-wave films of admittance 1.70 next to the glass and 1.38 next to the air will, however, give virtually zero reflectance at a specified wavelength as shown in Figure 3. Here, however, the inexorable rule of interference coatings, as implied in Figure 1, applies itself. The greater the total thickness of the coating the greater the number of fringes in any given interval. Since we now have two quarter waves, the coating characteristic reflectance curve is narrower. ysub → y 2 f (7) ysub Figure 3. Theoretical performance of a two-layer antireflection coating consisting of a quarter wave of admittance 1.70 next to glass followed by a quarter wave of admittance 1.38 next to the air incident medium. Again the layers are quarter waves at a wavelength of 510nm. so that the reflectance of a quarter-wave film on a substrate will become continued on page 32 2005 Winter News Bulletin 31 Fundamentals of Optical Coatings continued from page 31 The coating is not broad enough to cover the visible region that stretches roughly from 400nm to 700nm. Early in the history of optical coatings, however, it was discovered that a half-wave layer of high admittance inserted between the two quarter waves of the two-layer coating could broaden the characteristic. The half wave is an absentee where the two layers yield low reflectance but perturbs the performance elsewhere in a favorable manner. Most modern antireflection coatings are related to this three-layer coating. Figure 6. Transmittance performance of a quarter-wave stack showing some of the various types of filter that can be produced from this simple structure. Ripple is the major remaining problem. The major problem that is obvious in Figure 6 is the interference fringes that we usually call “Ripple.” Ripple can be greatly reduced by tuning the outermost layers of the system so that they form a matching or antireflecting structure between the outside media and the quarter-wave core of the coating. If we place two quarter-wave stacks together we arrive at a structure like: Air | HLHLHLH HLHLHLH | Glass (10) Figure 4. The quarter-half-quarter coating. Here we are including dispersion. We use Al2O3 next to the glass, MgF2 next to the air and a half wave of Ta2O5 in between. The flattening effect of the added half-wave layer is pronounced. High-reflectance coatings consisting of metal layers are the only option for mirrors to be used over a very wide range of wavelengths. For a much narrower range, however, it is possible to build a high reflectance coating from a series of quarter wave layer of alternate high and low admittance. A shorthand notation where we represent quarter waves by capital letters is a useful way of expressing the design. We call the wavelength for which the layers are quarter waves, the “Reference wavelength” and denote it by λ0. Air | HLHLHLHLHLHLHLHLHLHLH | Glass (9) At the wavelength for which the layers are quarter waves the central HH layer is a half wave and, therefore, an absentee. Then we see that the surrounding LL combination must also be an absentee. A similar argument can be applied right through the structure and the whole coating is an absentee at the reference wavelength. The reflectance and transmittance are therefore the values of the uncoated substrate. The absentee condition involves many layers so that the high transmittance fringe is narrow and is surrounded by high reflectance regions typical of the quarter-wave stacks. In fact, the structure is a simple narrow-band filter. The width of the pass band will be reduced if the number of layers is increased and vice versa. We call the central half-wave layer a cavity and the entire structure is a single-cavity filter. In the same way that we couple tuned electrical circuits together to give more rectangular response we can couple cavities. Air | HLHLHLH HLHLHLH L HLHLHLH HLHLHLH | Glass and Air | HLHLHLH HLHLHLH L HLHLHLH HLHLHLH L HLHLHLH HLHLHLH | Glass (12) represent two and three-cavity filters. The L layers in between the cavity structures are known as coupling layers. They are necessary to avoid creating unwanted cavities from their surrounding H layers. Figure 7 shows how the edge steepness increases with the number of cavities. (11) Here we represent a high-admittance layer by H and a low-admittance by L. Figure 5 shows a typical curve. Note that at the half-wave points we have the reflectance of the uncoated substrate. Figure 5. A 21-layer quarter-wave stack plotted in terms of layer thickness in quarter waves, that is inversely proportional to wavelength. The layers in this stack have admittances 1.46 and 2.14 corresponding to SiO2 and Ta2O5.. Because we have dielectric layers with no loss, the transmittance of the coating is simply the inverse of reflectance. Plotting transmittance against wavelength we recognize basic characteristics that can serve as different types of filters. Long-wave-pass filters, short-wave-pass, notch filters and even broad band-pass filters are possible. If the reflected light is also to be collected then we have a special type of beam splitter that separates wavelength regions and is known as a “Dichroic beam splitter.” Figure 7. Single, two-cavity and three-cavity narrow-band filters using the designs (10) to (12) with materials SiO2 and Ta2O5. continued on page 42 32 2005 Winter News Bulletin Adhesion Promotion Techniques for Coating of Polymer Films Rolf Rank, Tilo Wuensche, Matthias Fahland, Christoph Charton and Nicolas Schiller Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden, Germany Presented on April 29, 2004, at the 47th SVC TechCon in the Vacuum Web Coating Session Abstract Adhesion of vacuum deposited thin films on polymeric films is a critical parameter for many applications and products. Therefore, during the last years, several plasma pre-treatment techniques have been developed to address this issue. However, it has been learned over the years that the pre-treatment parameters have to be well matched to the substrate and coating conditions. In this paper we describe the different demands on a plasma source with regard to the coating speed (evaporation, sputtering) used. Appropriate solutions and methods have been evaluated considering low investment costs for a hardware upgrade. In some cases the intelligent usage of already existing equipment can be already sufficient. will summarize the latter with respect to usability for industrial purposes only. At the beginning, a short summary will be given about different polymer types and practical solutions for pretreatment. In the second part, appropriate solutions for pre-treatment in combination with both evaporation and sputtering will be discussed. Short Review of Surface Modification of Plastic Although a vast variety of polymers exists, most of the common materials can be categorized with respect to the type of functional groups as shown in Table 1. Itroduction Polymeric materials are used in a still increasing vast number of applications. It seems however, that their surface properties behave inversely proportional to their respective price. Naturally, low cost materials are of considerable interest for industry. However, those materials (e.g. Polypropylene) are characterized by poor surface properties, particularly with regard to PVD deposition processes [1]. Such materials need appropriate surface modifications in order to achieve well adhering coatings. In this case, adhesion is a good measure for good pretreatment. Even though the lack of sufficient adhesion is the most important reason for pretreatment, its effects cannot be reduced to adhesion phenomena only. For instance, the performance of barrier coatings can also be improved [2]. A good knowledge of the polymer structure and possible bonding mechanisms is the first step in finding appropriate pre-treatment solutions. The second step comprises knowledge about plasma and extends to the species of a plasma that can be utilized to modify polymer surfaces in general. Although a series of plasma technologies has existed for several years, they have to be evaluated for the specific purpose. Besides scientific reasons, the most practical solution to be realized depends also on conditions like: • Budget • Re-use of available hardware • Nature of the deposition process (e.g. role of cross contamination) • Coating plant (e.g. available space) Different approaches exist to alter plastic surfaces. Modifications can be achieved using coextruded “polymer skins”, sophisticated polymer coatings or plasma treatment [3, 4]. This paper 34 2005 Winter News Bulletin Table 1: Simplified overview of common types of plastic for large area coating. Adhesion in general is based on attractive forces between different atoms or molecules. The strongest bonding possible is covalent bonding, and it has been shown for Aluminum layers that polymers containing C=O functional groups are able to establish covalent bonding of Al-O-C between polymer and Al-layer [7]. Even in cases where covalent bonding cannot be established due to chemical reasons, functional groups still provide permanent electrical dipole moments on atomic level. These are preferred bonding sites for condensing particles. These particles can become polarized and interact via electrostatic forces with the functional groups. On macroscopic scale, this behavior can be observed by contact angle measurements. Egitto et al. has summarized the results of different publications and could show that the decreasing contact angle correlates with an increasing concentration of oxygen (i.e. polar functional groups) at the polymer surface [8]. However, polymers like Polyolefines (see Table 1) without any permanent electric dipole moments cannot form such stable bonds. The only types of interaction possible with condensing particles are pure van-der-Waals forces which occur even between particles without any (classical) dipole moments. Van-der-Waals forces are of quantum mechanical nature. They are the weakest forces between atoms or molecules. Their bonding energy per atom pair is about 0.1 eV compared to 1…10 eV for electrostatic interaction and covalent bonding, respectively [9]. The considerations above imply perfect clean surfaces without any contaminations. In real life, we are far from this. Surfaces exposed to ambient air contain humidity and adsorbed molecules, even if they are freshly prepared and not contaminated by fingerprints or dust. Therefore, the first task for pre-treatment is the cleaning of the polymer surface. This is especially true for industrial deposition processes such as metallization. If we imagine the huge surface which is exposed to vacuum at the web speeds of >5m/s then it is obvious that the polymer surface has not enough time for “self cleaning” by outgassing during unwinding. This process is illustrated by Figure 1. A sputtering process has been monitored by mass spectroscopy. After initial evacuation, an increase for water and hydrogen is observed as soon as the web starts moving (a). The occurring hydrogen may be an artifact due to ionization of water within the spectrometer. Ten minutes later, past the inlet of Argon, the magnetron was powered on (b) and a sudden increase was observed for elements such as hydrogen, oxygen and elements of mass number 28. Drops in the water relevant signals occur after switching off the power supply of the magnetron (c) and after Maybe it is useful for discussion to split the pre-treatment phenomena into “first order effects” such as cleaning, and “second order effects” such as functionalization and degradation. Later it will be shown that in case of metallization “pre-treatment effects” rely more on the cleaning than on functionalization. Finally, it should be noted, that a good wettability of a surface, i.e. low contact angles does not necessarily provide good adhesion. So called over-treatment leads to rather highly wettable, but weak boundary layers due to chain scission processes [8]. Figure 1: Outgassing of PET during unwinding and coating. Effects of Plasma for Surface Modification of Polymers Using low pressure plasma for pre-treatment is the most obvious way, especially in the field of vacuum coating where pre-treatment process and coating process should be compatible. The role of the respective plasma components is roughly summarized in Table 2 (according to [8]). On most plasma sources, all of the given components are present, interacting simultaneously with the polymer surface, altering chemical composition and structure. Therefore, the desired properties can hardly be achieved without degradation of the sensitive polymer surface. In general, one has to find a balance to achieve most of the favorable properties and least side effects (see Figure 2). continued on page 36 stopping the PET film (d). The observed behavior indicates clearly, that even more water is released from the polymer due to thermal load. The origin of the water is not only the surface, but also the volume. Depending on their respective type, each polymer matrix contains more or less water [10]. The result is a modified layer growth. At the polymer surface an interfacial layer is formed by the outgassing molecules and the particles of the vapor. In case of metallization, this results in pinholes as well as an interface layer which contains (depending on the metal used) a mixture of oxides, nitrides and hydroxides [11]. The effect of such an interface on permeation barrier has been discussed [12]. 2005 Winter News Bulletin 35 2005 Winter News Bulletin 35 Board of Directors President Clark Bright 3M Company cibright@mmm.com Adhesion Promotion Techniques for Coating of Polymer Films continued from page 35 Plasma components Electrons Energy 1 … 8 eV (depending on discharge type) < 10 eV Effect Energy transfer (heating) Implantation, chemical reactions, functionalization Sputtering (etching), chain scissoring, Implantation (“behind” the surface) chemical reaction, functionalization, cross linking same as fast ions cracking of bonds (activating), cross linking Energy transfer (heating) Vice President Peter Martin Battelle Pacific Northwest Laboratory peter.martin@pnl.gov Ions Immediate Past President John T. Felts Nano Scale Surface Systems, Inc. felts.dnai@rcn.com 100 eV … some keV Secretary David A. Glocker Isoflux Incorporated isofluxhc@aol.com Excited neutrals (radicals) Fast neutrals Photons < 10 eV Treasurer Michael Andreasen VACUUM COATING Technologies, Inc. michael.andreasen@vact.com > 100 eV > 3.5 eV (UV) moving web surface is exposed to the plasma for a time reciprocal to the web speed. It has been found, that a threshold of 10 mJ/cm2 value is necessary to observe pre-treatment effects in case of metallizing biaxially oriented Polypropylene (BOPP) [2]. If one knows the power density of a given plasma source provided to the substrate surface, then the contribution of the energy flux density for a given speed can be estimated easily. Knowing this, it becomes clear whether one or more plasma sources in parallel are needed to achieve the required pretreatment effect. Table 3 gives an overview of possible plasma sources and gives a first indication of which plasma sources are suitable for evaporation. Type Mid-frequency plasma source Plasma treater (Atmospheric pressure discharge) RF-plasma tool (Linear RF plasma source) WebTreater (Magnetically enhanced linear RF plasma source) Duo PlasmaLine (Linear microwave plasma source) Anode layer ion source Magnetron plasma source Web speed >1m/s <1m/s X X X* [15] [16] Directors Hana Baránková Uppsala University hana.barankova@angstrom.uu.se Pamela Diesing SAGE industrial sales, inc. sage4sales@aol.com Elizabeth Josephson Applied Films Corporation ljosephson@usa.appliedfilms.com Traci Langevin Soleras Ltd. traci@soleras.com Ludvik Martinu École Polytechnique lmartinu@polymtl.ca Paolo Raugei Galileo Vacuum Systems, Inc. praugei@att.net Ric Shimshock MLD Technologies LLC rshimshock@mldtech.com Douglas Smith Vacuum Process Technology, Inc. dsmith@vptec.com Frank Zimone Denton Vacuum, LLC fzimone@dentonvacuum.com 3.5 eV … 1.6 eV (VIS) < 1.6 eV (IR) Table 2: Components of the plasma and their effect to polymer surfaces. X X X* X* [17] [2] X X X** X [18] [19,20,21] This paper Figure 2: Functionalization and degradation as a function of pre-treatment dose. *) Only if operated at low power **) Only if operated in the so called “diffuse mode” Table 3: Possible plasma sources for pre-treatment. Plasma Sources for Pretreatment In the following some practical aspects for the evaluation of suitable plasma sources are given. Instead of discussing about appropriate plasma sources for evaporation or sputtering, the web speed as a more universal criterion is used. The value of 1 m/s to distinguish high-speed from low-speed processes is somewhat arbitrary but it is not decisive for the discussion in itself. A) Web speed >1 m/s This area is usually covered by industrial evaporation techniques such as metallization. Common web speeds are well above 5 m/s. Plasma sources need a sufficient high power to achieve the desired results. In this case, we neglect the second order effects and consider only the cleaning of the polymer surface (i.e. the so-called “first order effects” mentioned above). Neglecting the individual influence of each plasma species, we can summarize the interaction of plasma and polymer surface using an energy flux density. Depending on its speed, a SVC Administrative Offices 71 Pinon Hill Place NE Albuquerque, NM 87122-1914 Telephone 505/856-7188 Fax 505/856-6716 E-mail svcinfo@svc.org Web Site www.svc.org Executive Director Vivienne Harwood Mattox Technical Director Donald M. Mattox This approach seems to be more relevant than considering pure plasma parameters like charge carrier density (commonly called plasma density) or ion current density, for instance. Terms such as the often cited “high density plasma sources” can be misleading. It is difficult to conclude to the effects on the polymer surface at a given web speed. In that case, the energy flux density is a more practical parameter which can be determined for any plasma source experimentally [13], and the reasoning regarding the threshold value mentioned earlier is supported by another, completely different “pre-treatment process” using laser technique [14]. The setup of the plasma source, i.e. geometric considerations, may become very important. For instance, a linear rf-discharge with a hollow anode design proofed to be very advantageous because the plasma is located in the immediate vicinity of the polymer surface and provides a power density of about 1 W/cm2. Due to the hollow anode design, the power absorbed by the plasma can be delivered 36 2005 Winter News Bulletin efficiently to the substrate surface. In contrast to magnetron discharges, this happens without losses to the chamber walls (see Figure 3). Figure 3: Closed and open types of plasma discharges. Beyond this, a fine tuning of the pretreatment process might be desired. Depending on the substrate used, the selection of the appropriate working gas or gas mixture is important. Mixtures of Ar with O2, N2 or CO2 and even NH3 are commonly used. Often only a small amount of reactive gas (1…10%) is necessary to obtain similar results compared to pure reactive gas. This is important to minimize a cross contamination of the evaporation process. B) Web speed <1 m/s For coating processes at lower speed, the threshold of energy flux density can be easily achieved by nearly any plasma source. Here other aspects become important, for instance questions like: • Is a new decent plasma source really necessary or can (already existing) magnetrons “do the job”? • If yes, how can magnetrons be operated to provide plasma power but negligible sputtering? • Can other cleaning systems already established for glass coating be utilized for the pre-treatment of polymer substrates? In many cases, magnetrons can be used for pre-treatment. This is self-evident for coating plants for sputtering, but is also an option for specific evaporation processes at low speed. If the application allows seed layers, i.e. the transparency of the layer or the layer systems is not important, then often a sputtering in reactive mode using O2, N2 or N2O is sufficient. It is known that pure reactive mode sputtering is characterized by much lower deposition rates compared to the metallic mode sputtering, e.g. [22]. However, reactive mode sputtering often causes arcs and the “disappearing anode problem”. Therefore, dual magnetron systems and power supplies featuring pulse mode are required. If advanced power supplies are available, even more sophisticated operating modes are possible. One process can be established using bipolar pulses of different duration length of negative and positive voltage [23]. During the short negative pulse (5 µs) the plasma at the cathode builds up, but the sputtering rate is still very low and can be neglected. The next pulse changes the polarity and lasts up to 200 µs. Then the positive ions from the plasma are accelerated away from the cathode towards the substrate. This mode of operation is quite insensitive to the target material used, although materials of low sputtering yield (like carbon) are favorable. Finally, some remarks are given for pretreatment using anode layer ion sources. These ion sources are easily scaleable and provide a good homogeneity across the substrate width. They have been successfully used for etching of glass, for instance. The application for pretreatment of polymer substrates is quite complicated because of the high ion energies in collimated mode and charging effects. In general, anode layer ion sources should be operated at higher pressure in the so-called diffuse mode. Additionally, a pulsed power supply is helpful to avoid charging of the polymer surfaces. In case of polymer substrates, the provided high voltage DC power supply can be replaced. Other measures effect the mechanical setup. A floating or even biased cathode also prevents charging effects [24]. Even if more technical possibilities exist to utilize plasma sources for pre-treatment, much care has to be taken regarding the “second order” effects. Due to the lower web speeds, over-treatment is more likely. Because some plasma sources provide a significant amount of high-energy ions, they should not be operated with Ar and, if possible, at rather high pressure. The challenge of pre-treatment for low speed processes are not powerful plasma sources but knowledge of plasma physics and plasma chemistry for the tailoring of pre-treatment process. Corporate Sponsors 3M Company Academy Precision Materials Advanced Energy Industries, Inc. Applied Films Corporation* Astron Advanced Materials, Ltd. Automated Vacuum Systems, Inc. Bekaert Advanced Coatings Bekaert Specialty Films, LLC BOC Edwards* CeramTec, Ceramaseal Division Comdel, Inc. CPFilms, Inc.* Darly Custom Technology, Inc. Denton Vacuum, LLC* Dexter Magnetic Technologies, Inc. DynaVac Eddy Company Engelhard Corporation ESK Ferrotec (USA) Corporation Fil-Tech, Inc. Flex Products, Inc.* Galileo Vacuum Systems, Inc.* GENERAL Vacuum Equipment Ltd.* Goodfellow Corporation Hanwha L&C Corporation Hauzer Techno Coating BV Helix Technology Corporation* Heraeus Incorporated Huettinger Electronic, Inc. IonBond Inc. ITN Energy Systems, Inc. Jeol Ltd. Kurt J. Lesker Company Leybold Optics USA, Inc. Materials Science International, Inc. MDC Vacuum Products Corporation MeiVac, Inc. Micro Photonics, Inc. Mill Lane Engineering Company, Inc. Mitsubishi Plastics, Inc. MKS Instruments, Inc.* Nor-Cal Products, Inc. Optical Coating Laboratory, Inc. Pfeiffer Vacuum, Inc.* Plasma Surface Engineering Corporation Polycold Systems Inc.* Process Materials, Inc. Providence Metallizing Company, Inc.* PTB Sales, Inc. PVT, Plasma and Vacuum Technologies LLC R.D. Mathis Company Research and PVD Materials Corporation Sage industrial sales, inc.* Semicore Equipment, Inc. SHI-APD Cryogenics, Inc. Singulus Technologies, Inc. Soleras Ltd.* Southwall Technologies* Sputtering Materials, Inc. Steag HamaTech AG Telemark Thermionics Vacuum Products Thin Film Center, Inc. Thin Film Technology, Inc. Tico Titanium, Inc. Toray Plastics (America), Inc. ULVAC Technologies, Inc. Umicore Thin Film Products VacuCoat Technologies, Inc.* VACUUM COATING Technologies, Inc. Vacuum Engineering & Materials Company, Inc. Vacuum Process Technology, Inc. Varian Inc., Vacuum Technologies Vergason Technology, Inc. VON ARDENNE Anlagentechnik GmbH Williams Advanced Materials, Inc. Yeagle Technology, Inc. * Charter Corporate Sponsor Conclusion The interaction of plasma and polymer surface is very complex. For the application of plasma for pre-treatment for industrial applications, a reasonable reduction to the most relevant effects is required. For high speed applications it is the cleaning of the surface, while at lower speeds functionalization becomes important. But in this case, more attention is necessary to avoid negative side effects. Even though a broad variety of plasma sources exists, they often fulfill only some of the requirements needed. All-purpose plasma sources are hard to find. Sometimes high performance plasma sources are available but do not have the required length, or other sources of sufficient length have to be used in parallel to achieve the desired pre-treatment effect. References 1. H. Morgner, R. Rank, J. Reschke and N. Schiller, “High Speed In-Line Treatment of Plastic Webs for Vacuum Coating,” 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 460, 1999. R. Rank, T. Wuensche, and S. Guenther, “Magnetically enhanced RF discharges for effective pre-treatment of plastic webs at high speed,” Surf. Coat. Technol., p. 218, 2003. 2. continued on page 42 2005 Winter News Bulletin 37 Society and Industry News The Society of Vacuum Coaters is pleased to announce that the following individuals have been elected by the SVC membership to serve three-year terms on the SVC Board of Directors, starting at the Annual Business meeting at 7:00 p.m. on April 24, 2005. • David J. Christie, Advanced Energy Industries, Inc. • Wolfgang Decker, Toray Plastics (America), Inc. • Vasgen Shamamian, Dow Corning Corporation • Edward Wegener, AFG Industries (second term) The Symposium on Functional Coatings and Surface Engineering (FCSE – 2005) will take place in Montréal, Canada on June 8–10, 2005. It is hosted by the “Regroupement québécois sur les matériaux de pointe— RQMP,” École Polytechnique, and the Université de Montréal. Symposium topics include: coatings for optics, optoelectronics, and imaging; coatings for aerospace and for energy control; coatings and films for micro-and nanoelectronics; new processes, process control, and monitoring; and characterization methods. For more information, contact the Meeting Chair Ludvik Martinu (lmartinu@polymtl.ca) or the Co-Chair Jolanta Klemberg-Sapieha (jsapieha@polymtl.ca), both with École Polytechnique, or go to www.unyvac.org. The AVS Sixth International Conference on Microelectronics and Interfaces (ICMI) is to be held March 21–23, 2005, at the Santa Clara Convention Center in Santa Clara, CA. The ICMI provides a unique opportunity for microelectronic process and integration specialists to gather and discuss challenges in fabricating nanodevices. This year’s program will enable participants to follow three tracks of presentations, FEOL processing/integration, BEOL processing/integration, and metrology/defects/yield enhancement. Each day a keynote address will cover one of these three topic tracks. For further details visit the AVS Web Site at http://www.avs.org or call AVS West at 530/896-0477. The Association of Vacuum Equipment Manufacturers International will hold a Spring Seminar at the Santa Clara Convention Center, CA, on the morning of March 22, 2005. The seminar titled, “The Latest Market Trends, Vacuum Techniques and Technologies,” will feature speakers from Advanced Forecasting, Lawrence Livermore National Laboratory, Hiden Analytical, Gencoa Ltd., and Stanford Research Systems. The speakers will address current topics of interest to those working in vacuum-related technology fields. Before the seminar, network with experts at the hot buffet breakfast at 7:45 a.m.—an integral part of this program. After the seminar, visit the Northern California Chapter AVS Annual Equipment Exhibit on the afternoon of March 22! Don’t miss this unique opportunity to gain knowledge you can use from experts in several vacuum equipment market segments. For registration and further information, visit www.avem.org/Seminar/index.html or send an e-mail to aveminfo@avem.org. The next offering of the Distance Learning Self-Paced Course on Fundamentals of Vapor Deposition (which is sponsored by SVC in collaboration with the University of Delaware) will be June 13–24, 2005. The flexibility of self-paced study allows students to work whenever and wherever they want, with the availability of the instructor through a web-based portal established at the University of Delaware. If you want more information, please contact SVC at 505/856-7188, or by E-mail at svcinfo@svc.org. Your Invitation to Learn! The Association of Vacuum Equipment Manufacturers International invites you to a Seminar on At this AVEM International Seminar, speakers will address current topics of interest to those working in vacuum-related technology fields. Before the Seminar, network with experts at the hot buffet breakfast starting at 7:45 a.m. – an integral part of this program. After the Seminar, visit the Northern California Chapter AVS Annual Equipment Exhibit on the afternoon of March 22! The Latest Market Trends, Vacuum Techniques and Technologies March 22, 2005 8:30 a.m.–11:45 a.m. (Breakfast at 7:45 a.m.) Topics include: " An Overview of Applications of Vacuum Technology Required for the World’s Most Powerful Laser System - NIF with Peter Biltoft, Lawrence Livermore National Laboratory " Forecast of the Next Turning-Point in Demand for Equipment Components with Moshe Handelsman and Rosa Luis, Advanced Forecasting Santa Clara Convention Center, Santa Clara, CA Seminar held during the AVS Sixth International Conference on Microelectronics and Interfaces (ICMI) " State of the Art and Industry Demands for Magnetron Sputter Technologies with Dermot Monaghan, Gencoa Ltd. " What Makes a Vacuum Product Successful? with Gerardo A. Brucker, Stanford Research Systems, Inc. " Quadrupole Mass Spectrometry Applications in Residual Gas Analysis and Production Control for Semiconductor Processing and Fabrication with Mark Buckley, Hiden Analytical Inc. Visit www.avem.org to download the registration form and make your hotel and travel arrangements. For additional seminar information, contact: Association of Vacuum Equipment Manufacturers International 505/856-6924 • Fax 505/856-6716 E-mail • Web Site 38 2005 Winter News Bulletin Corporate Sponsor News On December 1, 2004, Bodycote Plc. and Stirling Square Capital Partners (SSCP) concluded an agreement, whereby the PVD coating activities of Bodycote were acquired by SSCP. SSCP is also a majority shareholder of the IonBond Group. The two groups will be merged into one new group, called IonBond. In the Netherlands the name of Bodycote Coating Centrum BV will be changed to IonBond Netherlands BV. The new group, IonBond, will combine the competences of the former Bodycote PVD group and the IonBond Group. The combined global sales volume of 80 M Euros assures that the “new” IonBond Group is the second largest provider of PVD and PACVD coating services in the world. CeramTec North America has been certified as fully compliant with the stringent new ISO/TS 16949:2002 quality standard. The recognition came after an extended effort by CeramTec staff and exhaustive review of company processes by an independent third-party auditor. Successor to QS-9000 guidelines, the TS 16949:2002 standard provides a single quality management system. The standard has quickly won acceptance and support from automotive suppliers and manufacturers around the world, including GM, Ford, and DaimlerChrysler in the U.S. In announcing the certification, Walt Dollman, CeramTec North America President and CEO, thanked his colleagues for their dedication in achieving the very difficult process-oriented standard. CeramTec already supplies a wide range of high-strength, ceramic-based sensors and electronic insulators to the global automotive industry. The new requirement establishes a stricter level of documentation, process efficiency, quality control, customer focus, planning, training, and auditing than earlier standards. Comdel, Inc., is making a long-term commitment to customers in Japan by opening a branch office in Chiba, Japan. At the same time they entered into a strategic agreement with PRA Co. Ltd., a local service and repair company, to expand Comdel’s capabilities in the region. These actions were taken in an effort to better serve customers in Japan by improving equipment uptime and helping manage costs. Denton Vacuum LLC announces the recent addition of Rod Moore to the executive team as Director of Technology and Strategic Development. Rod brings considerable experience to the organization with thin film experience gained working for organizations such as Corning, Essilor, TetraPak, and the U.S. Army. Rod Moore has worked with ophthalmic and precision optical products, having developed new coating designs and re-engineered processes to establish stable manufacturing parameters for volume production. Ceradyne, Inc. (NASDAQ:CRDN) announces the acquisition of ESK from its previous parent, Wacker-Chemie, a German silicon and chemical manufacturer. ESK was started in 1922 to produce non-oxide powders and technical ceramics. The company, then known as Electroschmelzwerk Kempten AG, was acquired by Wacker-Chemie GmbH in 1933 and has operated under the name Wacker Ceramics since 2001. Ceradyne intends to revert back to the original ESK name. The company’s major product lines include its worldwide position as a prime supplier of boron carbide powder, which is the starting material for much of Ceradyne’s lightweight ceramic armor that accounts for over 60% of Ceradyne’s sales. ESK is considered a world leader in several industrial categories of advanced technical ceramics, accounting for over 90% of its sales, including evaporation boats for the vacuum metallizing process. Ceradyne develops, manufactures, and markets advanced technical ceramic products and components. Additional information about the company can be found at www.ceradyne.com. ESK customers can continue to refer any questions or comments to their existing sales and technical contacts. Goodfellow Corporation of Devon, PA, and an international supplier of highpurity metals and materials, recently learned from the British National Space Centre that platinum wire, gold, and other high-purity metals it supplied almost a decade ago are part of the Cassini-Huygens spacecraft that has been orbiting the ringed planet of Saturn after a seven-year journey from Earth. On December 24, continued on page 40 2005 Winter News Bulletin 39 Corporate Sponsor News continued from page 39 the Huygens probe section of the spacecraft began its historic descent to Titan, the largest of Saturn’s 33 moons. The Cassini-Huygens spacecraft is made up of the Cassini orbiter, developed by NASA, and the Huygens probe, developed by the European Space Agency. The Italian Space Agency provided the high-gain antenna, much of the radio system, and several of Cassini’s instruments. Cassini entered Saturn’s orbit on July 1 of 2004 and conducted in-depth studies of the planet, its moons, rings, and magnetic environment. On December 24, Cassini dispatched the 9-foot-diameter Huygens probe to Titan. The probe is scheduled to reach the atmosphere of Titan on January 14 and continue its descent to the moon’s surface. Huygens is the first probe to land on a world in the outer Solar System, and it is in Huygens that the instruments made from Goodfellow’s metals are housed. One of the scientific components being used in the exploration is the THP sensor, an instrument that measures thermal conductivity and thermal diffusivity by means of platinum wires supplied by Goodfellow. The sensor will transmit data relative to the temperature and thermal conductivity of the surface and lower atmosphere of Titan and the heat capacity of the surface material. The Cassini-Huygens mission is a model of international scientific cooperation, with thousands of academic and industrial participants worldwide. The project is one of the most ambitious and challenging interplanetary explorations ever mounted. IGC Polycold Systems Inc., a division of Intermagnetics General Corporation (NASDQ: IMGC), recognized its 30th anniversary on October 14, 2004, and celebrated 30 years of quality, reliability, and innovation. Polycold designs, manufactures, and sells a variety of specialized cryogenic refrigeration equipment used in numerous high tech, industrial, scientific, and biomedical applications. Products depending upon Polycold technology range from the everyday, such as eyeglasses and snack bags, consumer electronics such as cellular phones, digital cameras and flat screen televisions—to the extraordinary, such as baggage scanners for homeland security, drug discovery screening devices, to telescopes and precision scientific instruments. MKS Instruments, Inc. (NASDAQ: MKSI), a leading provider of process control technologies for improving productivity in semiconductor and other advanced manufacturing process environments, has relocated MKS’ two Austin, TX, sites into one larger facility. The consolidation brings together MKS Austin Sales & Field Service, product development for Control & Information Technology Products, and R&D/product development for Power & Reactive Gas Products into one 20,880-square-foot facility that has been organized and facilitated to better meet MKS’ business goals. The larger facility, which includes a new lab to provide hands-on product training to customers, enhances communication and interaction among the various MKS product groups, allowing MKS to more efficiently meet the needs of its customers. Registering for the TechCon doesn’t get any easier than this! Register on-line at www.svc.org Corporate Sponsor Profile Vacuum Coating Technnologies, Inc. In April 2002, the glass coater business of BOC Coating Technology was acquired by VON ARDENNE Anlagentechnik GmbH and renamed VON ARDENNE Coating Technology, Inc. (VACT). With this acquisition, VON ARDENNE became a leading supplier of coating equipment to the glass industry based on the market leading position of BOC Coating Technology. An investment group, led by the management of VON ARDENNE Coating Technology, located in Fairfield, CA, recently purchased the company from VON ARDENNE Anlagentechnik GmbH, Germany. VON ARDENNE Coating Technology, Inc., operating under the new name VACUUM COATING Technologies, Inc. (VACT), will continue to operate as a leading manufacturer and supplier of technologically advanced turnkey sputter coating systems and state-of-the-art components for production of low-emissivity and solar control glass for architectural and automotive applications. In addition, VACT will also continue to supply coating systems for production of antireflective coatings for display applications as well as for the photovoltaic industry in production of thin film solar cells in the same Fairfield, CA, location. VACUUM COATING Technologies, Inc., (formerly BOC Coating Technology) has the largest installed base of glass coaters worldwide with equipment operating in more than 40 countries. Although the name has changed, a number of times throughout the history of their company, their focus and team have remained extremely stable. BOC Coating Technology ▼ VON ARDENNE Coating Technology Inc. (VACT) ▼ VACUUM COATING Technologies, Inc. (VACT) 40 2005 Winter News Bulletin VACUUM COATING Technologies, Inc. benefits from and relies on a number of firsts accomplished by the company under former ownerships such as: • First sputtered glass automobile product 1975 • First architectural glass coater to go online 1977 • First silver-based low emissivity coater 1983 • Cylindrical sputtering cathode (C-MAG®) introduced 1989 • Medium frequency AC C-MAG® system for reactive sputtering introduced 1998 VACUUM COATING Technologies, Inc. will continue existing development programs leading to the introduction of new products and capabilities. They retain all rights to their current technologies, including our proprietary C-MAG cylindrical magnetron, VAC-MAG™ endblock design and AC technology. In addition to developing new and flexible coater designs, the company will continue to manufacture and sell diffusion pump based modular coating systems. The latest advances to the coaters includes the use of patented end-blocks capable of accepting up to 400 Amps AC for the C-MAG® sources, target designs that allow over 90% utilization, and designs for highspeed cycle times. VACUUM COATING Technologies, Inc. continues to be a source of coating equipment and technology products for the glass industry with offices in China and Europe in support of its current installed base and for future business in those areas in addition to its headquarters in the USA. For more information contact: Agnes Chow 707-423 2143; E-mail: agnes.chow@vact.com. Introducing the flexible VAC™ 870 Compartment Coating System. Diffusion pump Turbo pump Giving you choices. Visit us at the 2005 SVC TechCon Exhibit April 25–26, 2005 Denver, CO Leading the way in the glass coating industry for more than 25 years. USA Headquarters VACUUM COATING Technologies, Inc. 2700 Maxwell Way, Fairfield, CA 94534 USA Tel: +1-707-423-2100 Fax: +1-707-425-6071 E-mail: office@vact.com website: www.vact.com Asia VACUUM COATING Technologies (Shanghai) Co., Ltd. 188 Zhangyang Rd., Tomson Center, Suite B1303 Pudong, Shanghai 200120, China Tel: +86 21 5876 2900 Fax: +86 21 5879 8103 Europe VACUUM COATING Technologies GmbH Glashütter Straße 101a D-01277 Dresden, Germany Tel: +49 351 205 86-0 Fax: +49 351 205 86-10 Fundamentals of Optical Coatings continued from page 32 Advertiser’s Index A&N Corporation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 6 Ametek, Inc.. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12 APX Scientific Instruments, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 35 AVEM International . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38 C&C General, LLC . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 21 Coating 2005 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 33 Comdel, Inc.. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 10 Denton Vacuum, LLC. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 3 Ferrotec (USA) Corporation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18 Fil-Tech, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 14 Filmetrics, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7 Huettinger Electronic, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19 Inficon . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 11 Intelvac . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 16 ISSP 2005 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29 Maxtek, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 MDC Vacuum Products Corporation . . . . . . . . . . . . . . . . . . . . . . . . 22 & 23 MKS Instruments, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 Normandale Community College . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 29 Pacific Nanotechnology . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 12 Pfeiffer Vacuum . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 17 PHPK Technologies . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15 Polycold Systems, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 2 R.D. Mathis Company . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5 Society of Vacuum Coaters . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 30 System Control Technologies . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 44 Telemark . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 43 Torr International, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18 ULVAC Technologies, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 34 VACUUM COATING Technologies, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . 41 Vacuum Research Limited . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8 Varian Inc. Vacuum Technologies . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 27 VAT, Inc. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 16 Conclusion These are just some examples of simple optical coatings. They are typical of some of the building blocks that are used as the starting structures for more complex and higher-performance designs. For example the designs of Dense Wavelength Division Multiplexing Filters follow the kinds of structures used in Figure 7 but frequently have around 200 layers rather than the 44 or so shown. Because the structures are so complicated and accurate calculations are so involved and tedious, computers are indispensable in coating design. Further Reading There are many books dealing with thin-film optical coatings. Three recent ones, still in print, are: Kaiser, N and H K Pulker, eds. Optical Interference Coatings. Optical Sciences, ed. W.T. Rhodes. 2003, Springer-Verlag: Berlin, Heidelberg, New York. pp 500. Macleod, H A, Thin-Film Optical Filters. Third ed. 2001, Bristol and Philadelphia: Institute of Physics Publishing. Willey, Ronald R, Practical Design and Production of Optical Thin Films. Second ed. Optical Engineering, ed. B. Thompson. 2002, New York, Basel: Marcel Dekker Inc. Adhesion Promotion Techniques for Coating of Polymer Films continued from page 37 3. A. Yializis, M.G. Mikhael, R.E. Ellwanger, and E.M. Mount III, “Surface Functionalization of Polymer Films“, 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 469, 1999. A. Yializis, M.G. Mikhael, T.A. Miller, and R.E. Ellwanger, “Use of Functional Acrylate Polymers for Different Web Coating Applications,” Proc. 11th Int. Conf. on Vacuum Web Coating, p. 138, 1997. P. Grπning, O.M. Kuttel, M. Collaud-Coen, G. Dietler, and L. Schlapbach, “Interaction of low-energy ions (<10 eV) with polymethylmethacrylate during plasma treatment,” Appl. Surf. Sci. 89(1), p. 83, 1995. F. Garbassi, M. Morra, E. Occhiello, L. Barino, and R. Scordamaglia, “Dynamics of macromolecules: a challenge for surface analysis,” Surf. Interf. Anal. 14(10), p.585, 1989. R.W. Burger and L.J. Gerenser, “Understanding the Formation and Properties of Metal/Polymer Interfaces via Spectroscopic Studies of Chemical Bonding,” 34th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 162, 1991. F.D. Egitto and L.J. Matienzo, “Plasma modification of polymer surfaces for adhesion improvement,” IBM J. Res. Dev. 38(4), p. 423, 1994. B. Chapman, “Thin Film adhesion,” J. Vac. Sci. Technol., 11(1), p. 106, 1974. M. Roehrig and C. Bright, “Vacuum Heat Transfer Models for Web Substrates: Review of Theory and Experimental Heat Transfer Data,” 43rd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 335, 2000. A. Yializis, R.E. Ellwanger, and J. Harvey, “Barrier Degradation in Aluminum Metallized Polypropylene Films,” 40th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 371, 1997. W. Decker and B. Henry, “Basic Principles of Thin Film Barrier Coatings,” 45th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 492, 2002. H. Kersten, R. Wiese, D. Gorbov, A. Kapitov, F. Scholze, and H. Neumann, “Characterization of a broad beam ion source by determination of the energy flux,” Surf. Coat. Technol. 173-174, p. 918, 2003. D.J. McClure, D.S. Dunn, and A.J. Ouderkirk, “Adhesion Promotion Technique for Coatings on PET, PEN and PI,” 43rd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 342, 2000. V. Cassio, “Plasma Pre-Treatment in Aluminum Web Coating: A Converter Experience,” 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 465, 1999. 2005 Winter News Bulletin 4. 5. 6. 16. S.A. Pirzada, A. Yializis, W. Decker, and R.E. Ellwanger, “Plasma Treatment of Polymer Films,” 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 301, 1999. M. Geisler, J. Bartella, G. Hoffmann, R. Kukla, R. Ludwig, and D. Wagner, “rf Plasma Tool for Ion-Assisted Large-Scale Web and Sheet Processing,” 44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 482, 2001. R. Emmerich, M. Kaiser, H. Urban, M. Graf, E. Rauchle, P. Elsner, J. Feichtinger, A. Schulz, M. Walker, K.M. Baumgartner, and H. Muegge, “New microwave plasma sources for large scale applications up to atmospheric pressure,” Proc. IEEE 29th Int. Conf. on Plasma Sciences, p. 320, 2002. I.V. Svadkovski and A.P. Dostanko, “Ion sources for ion beam assisted thin film deposition,” Symposium Ion-Solid Interactions for Materials Modification and Processing, p. 635, 1996. A. Shabalin, M. Amann, M. Kishinevsky, K. Nauman, and C. Quinn, “Industrial Ion Sources and Their Application for DLC Coating,” 42nd Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 338, 1999. D. Burtner, R. Blacker, J. Keem, D. Siegfried, and E. Wahlin, “Linear AnodeLayer Ion Sources with 340- and 1500-mm Beams,” 46th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 263, 2003. S. Schiller, U. Heisig, Chr. Korndörfer, and J. Strümpfel, “Stabilization of the Reactive Magnetron Discharge with Close Target-to-Substrate Coupling,” Proc. 3rd Int. Conf. on Vacuum Web Coating, p. 155, 1989. Patent No.: EP 0867 036 B1. T. Linz (Advanced Energy Industries GmbH), private communication. 7. 17. 8. 9. 10. 18. 19. 11. 20. 12. 13. 21. 14. 22. 15. 23. 24. 42 It’s Not Too Late to Join the Exhibit and Innovators Showcase at the 2005 TechCon! Photo courtesy of the Denver Metro CVB April 25th and 26th at the Adam’s Mark Hotel, Denver, Colorado This two day, one-of-a-kind forum during the annual TechCon offers exhibitors an excellent opportunity to showcase their latest innovations in vacuum coating and related technologies. Exhibitors will become more visible to prospective customers at the TechCon by participating in the Innovators Showcase—a 10minute presentation about new products, new equipment, or a new process. Deadline for abstracts is February 15 for the Innovators Showcase and booths are still available. Call 505/856-7188; E-mail: svcinfo@svc.org or visit www.svc.org for more information. PRESORTED PRESORTED STANDARD US POSTAGE PAID ALBUQUERQUE, NM PERMIT NO 1893 Society of Vacuum Coaters 71 Pinon Hill Place NE Albuquerque, NM 87122-1914 USA CHANGE SERVICE REQUESTED FIRST CLASS US POSTAGE PAID ALBUQUERQUE, NM PERMIT NO 1893