Analytical Predictive Modeling for the Scalability Study of DG and by alextt

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									Analytical Predictive Modeling for the Scalability Study of DG and GAA MOSFETs
Hamdy Abd El-Hamida, Benjamin Iñigueza, Jaume Roigb
Dept. d’Enginyeria Electrònica, Elèctrica i Automàtica, Universitat Rovira i Virgili, 43007 Tarragona, Spain. E-mail: hamdy@abd.cat
a bLAAS,

CNRS, 31007 Toulouse Cedex 4, France

Modeling Summary
• We have developed analytical scalable models of the threshold voltage roll-off, DIBL and subthreshold swing of nanoscale Gate All Around (GAA) and Double-Gate (DG) MOSFETs • The models are derived from an analytical solution of the 2D or 3D Poisson’s equation, obtained using variable separation • Very good agreement with numerical 2D and 3D simulations have been observed

Modeling Applications
• The models have been used to compare the performance of nanoscale GAA and DG MOSFETs • We have determined the dimensions of the devices necessary to obtain a certain value of the subthreshold swing • It results that the GAA device can be 33% shorter than the DG MOSFET, and with a 10 mV/V lower DIBL


								
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