Advanced solutions for electron beam lithography by afawe45t3qa


									                                                                                                             Advanced solutions for
                                                                                                             electron beam lithography

                                                                                                                                    Non spin-coated EB resists
Quantiscript Inc. is a nanotechnology company developing process
solutions aimed at next generation lithography (NGL) for the
microelectronics industry using proprietary NON SPIN-COATED EB
RESISTS. One of the main challenges for the industry in meeting the
lithography milestones set by the International Technology Roadmap for
Semiconductors over the next five years is the fabrication of lithography                                                              Evaporated resists                     Enabling advantages of QSR resist
masks. Quantiscript is currently developing its process for this major
                                                                                                                                •Deposited on any type of surface             •This technology package and process solutions
application.                                                                                                                       •Non-planar, fragile substrates or small   provides a series of advantages for advanced mask
                                                                                                                                   surfaces                                   fabrication
Our team includes seven research scientists with physics, chemical and
electrical engineering backgrounds and three microelectronic fabrication                                                        •Better thickness uniformity                     •Evaporated resist can be deposited on a multi-
technicians. Our expertise covers areas ranging from thin film                                                                     •Evaporation thickness uniformity is a        layered template substrate with ease
deposition, electron beam lithography and RIE etching. Our work is                                                                 function of evaporator                        •Negative and positive transfer of design to mask
conducted in a class M3.5 (100) clean room environment using a FEG                                                                                                               blank supported, providing flexibility
electron beam lithography system, a reactive ion etcher, several                                                                •Reduced contamination                           •Low keV of process virtually eliminates proximity
evaporators and a sputter coating system.                                                                                          •Deposition under vacuum                      effects in the EB writing step – eliminates pre-
                                                                                                                                                                                 processing of design
                                                                                                                                •In-situ thickness monitoring                    •Scalable process down to 32 nm – demonstrated
Quantiscript is a technology licensing company, currently                                                                                                                        to 50 nm
producing prototypes of NGL masks using its proprietary non                                                                     •Very thin layers (˜ 10 nm)
spin-coated EB resists.
                                                                                                                                                                                          Lithography on ANY surface
Quantiscript inc.
2500 boul. Université                                Quantiscript
                                                     is located in
Sherbrooke, Québec                                   Sherbrooke,
Canada                                              Canada, near
J1K 2R1                                                  Montreal.

http:\\                                          United States              Sherbrooke

                                                  Advanced lithography mask prototypes
Nano imprint Lithography                                                                                        X-ray lithography                                             LEEPL mask copying
        Mesa top patterningTM                                                                                                                                                   Direct exposure
                                                                                                              Flip side patterning™
                                                                                                                                                                               on membrane mask
                                                                                     20 nm                      Conventional mask


                      100 nm vias, 300 nm pitch

    100 nm diameter hole imprint mask (5x5mm)     100 nm diameter hole imprint in polymer layer

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