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									EDI 连续电再生除盐技术
        EDI 技术介绍

Water purification without regeneration
chemicals:
水的纯化,勿需化学再生药剂:
A 、 Reverse Osmosis replaces primary
catio/anion exchange
  反渗透 技术已取代了原来的阳,阴床
B 、 Electrodeionizat replaces primary
mixed bed ion exchange
 EDI 技术正在取代原来的混床
        EDI 技术的演变
流程图:
                                    酸
                               碱

 预处理    阳床       阴床                混床


                      酸        碱


  预处理     反渗透 R.O.        混床



  预处理     反渗透 R.O.        E-Cell
               混床和EDI的比较
          进水


                           产品水


失效层树脂

有效工作层                           E-Cell 模 块

保 护层 树脂



                           进水
    产品水
清达康产品流程图
产品模块结构
系统的工作过程
Ion exchange occurs as per usual kinetic &
      thermodynamic factors
    由于常规的动力学和热力学因素而发生的离子
  交换反应
  • Ions in the IX resin migrate toward the
  electrode,
   through IX membranes and into concentrating
           chambers
  离子交换树脂中的离子向电极方向迁移,通过离子交换
 膜到达浓水室
 • Water splitting produces H+ and OH- ions
    ...resulting in continuous regeneration
   水分解成氢根和氢氧根, 使其不断地再生
         离子交换

         H+
                    OH-

 Resin
                     Resin



Na+           Cl-
                 离子的迁移
_                               +

       Resin
                    Na+   H+

     OH-
           Cl-        Resin




阴级                             阳极
水的分解和再生

          Na+
                        Cl-

  Resin
                Resin
H+           OH-
 H+ H+ OH- OH-
  H+
       OH-
  H2O
                  浓水室
        阴膜                       阳膜

    淡水                                      +
     室             H+      Ca+        Na+
-                                           阳
      OH- OH-       Na+                     极
阴                                 H+
                   H+                       +
极               H+          H+
-
      Cl-          OH-
              Cl-
             OH  -   OH-
     OH-                    H+        淡水室
            OH-
                  浓水室
           浓 水室

  阴膜                 阳膜

淡水室                   Na+
        阳 离 子 不 能 通 过 H+
         阴离子交换膜
  Cl-                   淡水室

 OH-    阴离子不能通过
        阳离子交换膜
                  不同的 P H 属性
• 3 to 10 times the number of H+ and OH- ions as other
  EDI中氢离子和氢氧离子的含量是其它离子总和的3到10倍
• Concentrate chamber side of Cation membrane is at low pH (many
  H+ ions) 浓水室阳膜一侧 P H低
• Concentrate chamber side of Anion membrane is at high pH (many
  OH- ions) 浓水室阴膜一侧 P H高
• Extreme pH levels can facilitate scaling!
  过高的 P H 值会导致结垢
• High velocity in C chamber minimizes scaling
• 在浓水室保持高流速,可抑制结垢
              EDI 工作过程总结
• Ion exchange removes contaminant ions from water.
    离子交换法去除水中的离子
•   Contaminant ions and H+ and OH- move through resin
    and membranes to C chambers under influence of the
    electric field. 在电场作用下H,OH和离子树脂和膜到达浓
    水室
•   Ions are trapped in C chambers. 离子在浓水室里聚集
•   Scaling can occur if design limits exceeded.
    如果设计超过极限,会导致结垢生成
•   Electrode (E) flow is sent to waste due to chlorine and
    hydrogen gas. 极水中有氯气和氢气生成 全部排放
•   All energy ends up as heat - minimum flows must be
    observed. 由于有热量散发,所以进入EDI的水量必须大于
    安全值
EDI 的特性
                       Resistivity/Conductivity




                       10
                            15
                                 20
                                      25
                                           30
                                                35
                                                     40
                                                          45
                                                               50




               0
                   5
        8:54
        9:23
        9:51
       10:20
                                                     uS/cm




       10:48
                                                     Mo-cm




       11:17
       11:46
       12:14
       12:43




Time
       13:11
       13:40
                                                                     Constant Current




       14:09
                                                                    Variable Feed Water,




       14:37
       15:06
       15:34
       16:03
       16:31
                                        Product Resistivity vs. Feed Conductivity At
                                                    Varying Currents
                               18
Product Resistivity(Mohm cm)




                               16
                               14
                               12
                               10
                                        1.0 Amps
                                8
                                        2.0 Amps
                                6
                                4       3.0 Amps

                                2       4.0 Amps

                                0       5.0 Amps

                                    0   Life @ 2.0   20        40           60        80   100
                                        Amps
                                        Life @ 3.0        Feed Conductivity (uS/cm)
                                        Amps
Case study: EDI Test SystemTM at TVA
Brown's Ferry Nuclear Plant

• In collaboration with Ecolochem
• Existing 200 gpm (45 m3/h) system

• Install 100 gpm (23 m3/h) EDI SystemTM
 ...divert 50% of RO product into EDITM

• Operated by client water technician
          TVA BROWN’S FERRY


Media Filter      Softener          Carbon Filter

                 Divert Valve



                                   200 gpm (46 m3/h)
                                         RO
               100 gpm (23 m3/h)
                   E-CellTM
Effect of Pre-RO Injection of NaOH

                     Resistivity         CO2      TOC      SiO2

 No NaOH
                  14 Mohm.cm*        8-10 ppm   850 ppb   55 ppb
 Injection

 NaOH injection
                17.8 Mohm.cm* <1.25 ppm 110 ppb           51 ppb
 (pH=8)




      *Resistivity readings are approximate
                        100 gpm E-Cell at TVA Brown's Ferry Nuclear Plant

                      20.0                                                                  20.0
                                            Product Resistivity
                      18.0                                                                  18.0




                                                                                                   Feed Conductivity
Product Resistivity




                      16.0                                                                  16.0
                                                 Recovery following
                      14.0                                                                  14.0
   (MOhm.cm)




                                                 current interruption




                                                                                                        (uS/cm)
                      12.0                                                                  12.0
                      10.0       Feed Conductivity                                          10.0
                       8.0                                                                  8.0
                       6.0                                                                  6.0
                       4.0                                                                  4.0
                       2.0                                                                  2.0
                       0.0                                                                  0.0
                             0      10      20       30     40          50   60   70   80

                                                     Time (hours)
Pilot EDI SystemTM
TVA Brown’s Ferry Nuclear Plant
   Feed Water            E-CellTM           TVA
                         Product         Specification
   5.5 - 6.0 uS/cm   17.8-18.0 Mohm.cm   >16.7 Mohm.cm
                        (0.056 uS/cm)        (<0.06)
   55.0 ppb SiO 2
                       4.06 ppb SiO 2     <5.0 ppb SiO 2

  110-120 ppb TOC     30-32 ppb TOC       <50 ppb TOC
Case Study:EDITM Pilot System at
Semiconductor Plant (U.S.A.)
  Existing primary DI loop

  24 hour continuous operation

  100 gpm (23 m3/h) E-CellTM System
                                               100 gpm E-CellTM System at Semiconductor Plant
                                20.0                                                                    2.5
                                           Product Resistivity
                                18.0
Product Resistivity (MOhm.cm)




                                                                                                              Feed Conductivity (uS/cm)
                                16.0                                                                    2.0

                                14.0

                                12.0                                                                    1.5

                                10.0
                                           Feed Conductivity
                                 8.0                                                                    1.0

                                 6.0

                                 4.0                                                                    0.5

                                 2.0

                                 0.0                                                                    0.0
                                       0         100             200   300     400    500   600   700

                                                                       Time (hours)
EDI StacksTM
            EDI StacksTM 模块
MK-2
最新工业用EDI模块
可应用于电子,医药,电力 等行业
7.2 to 15 gpm/stack (1.6 to 3.4 m3/h)

MK-2Mini
迷你型EDI模块,小流量和实验室使用
2.5 to 5.0 gpm/stack (0.57 to 1.14 m3/h)

MK-1E
常规EDI模块, 现仅用在现有系统中模块的更换
6.0 to 15.0 gpm/stack (1.36 to 2.8 m3/h)
Feed Water Specifications
EDI 进水要求
Constituent Units            MK-2     MK-1E
TEA              ppm         <25      <16
Conductivity uS/cm           <65      <40
pH                           5 to 9   5 to 9
Hardness         ppm CaCO3   <1.0              <1.0
Silica(reactive) ppm         <0.5              <0.5
TOC              ppm         <0.5              <0.5
Free Chlorine ppm            <0.05    <0.05
Fe, Mn, H2S ppm              <0.01    <0.01
SDI 15 min                   <1.0              <1.0
Operating Parameters运行参数
Parameter            Range
进水温度 T               40 to 100°F (5 to 38°C)
进水压力 P               45 to 100 psi (3.1 to 6.8 bar)
进水压差 Pressure Drop   20 to 35 psig (1.4 to 2.4 bar)

回收率 R1- STACK        80 or 90%
回收率 R2- SYSTEM         可 达 到 97%
                        ( 浓水排放到 RO 前的水箱 〕
Operating Parameters运行参数
Stack            Maximum Power
MK-2       Up to 600 VDC
           1.5 to 4.5 amps

MK-2Mini   Up to 400 VDC
           1.5 to 4.5 amps

MK-1E      Up to 600 VDC
           1.5 to 4.5 amps
EDITM Cleaning有关清洗
              EDI Cleaning 清洗
Over time, or under certain upset conditions,EDI
  StacksTM and plumbing may foul with:
   长期运行,或者在某种不确切工作状态下,EDI
  模块和管件可能会
   由于以下原因行成污堵
     •   Hardness scaling   结垢
     •   Biofouling         生物污染
     •   Organic matter     有机物
     •   Metal oxides       金属氧化物
             EDI Cleaning清洗
A Few Causes of Fouling 照成污堵的其它原因
• Feed water does not meet requirements ex. hardness >
  1 ppm
  EDI 进水没有达到要求, 比方说硬度大于1PPM
• Recovery too high
  回收率太高
• Storage of Stack or shutdown of E-Cell SystemTM greater
  than three days without storage / long term shutdown
  procedure followed
  EDI 模块的存放 或者 EDI 长期不运行时,没有按规定对其保护
Symptoms of Fouling污堵的症状
• High Stack pressure drop / low product, concentrate or
  electrode flow 如果 压差增大,产品水,浓水或极水减少
   – Hardness or metal oxide scaling硬度或金属氧化物结垢
   – Biofouling 生物污染
• High voltage 如果 电压增高
   – Hardness or metal oxide scaling硬度或金属氧化物结垢
• Low product quality 如果产品水质下降
   – Hardness or metal oxide scaling硬度或金属氧化物结垢
   – Biofouling 生物污染
   – Organic fouling 有机物污染
Note: If both hardness and organic/biofouling are
  suspected, both the acid and sodium chloride / sodium
  hydroxide cleanings must be done in sequence.注意,当
  硬度和有机污染生物污染同时发生,那么酸和氯化钠以及
  氢氧化钠 须同时按顺序清洗
       Four Cleaning Procedures
             四种清洗方法
• Sodium Carbonate / Hydrogen Peroxide (Sodium
  Percarbonate Solution)         To clean organic
  matter, and to sanitize 碳酸钠和过氧化氢 - 清洗有机物
  和消毒
• Sodium Chloride / Sodium Hydroxide Solution
     To clean out organic matter
     氯化钠 和 氢氧化钠 - 清除有机物
• Peracetic Acid 过乙酸
     To sanitize      消毒
• Hydrochloric Acid
   To remove hardness scale and metal oxides
  盐酸 - 除垢,除金属氧化物
Cleaning Connections
Hydrochloric Acid 盐酸
Hydrochloric acid 1.8% is useful for removing
  hardness scale and metal oxides. Cleaning is
  done in three steps.
用1。8%的盐酸清洗EDI系统以去除结垢和金属氧
  化物,清洗分以下三个步骤
• Hydrochloric Acid Solution
   加盐酸溶液清洗
• Salt Solution Recirculation: 5% NaCl
   用百分之五的氯化钠溶液再打循环
• Water Rinse
   纯水洗净
          EDI 进水中硬度的控制
Install softener before E-Cell:
   在 EDI 前安装软化器
  Feed flow rate: 3.4 m3/h per MK-2 Stack.
   每个MK-2 模块的进水流量为15GPM
  Run softener at 40 gpm/ft2 (96 m/h).
   软化器的流速为 96米 每小时
  Requires 0.04 m2 of bed surface area per MK-2 stack.
   对每个MK-2 模块, 软化器的截面积为0。04平方米
  A 3 foot (0.9 m) deep bed implies 1 ft3 (28 liters) of
  resin per stack with a service run of 8.5 days if feed is
  3ppm hardness as CaCO3.
  如果进水中硬度是3PPM,那么28升阳树脂放在0。9米高
  的软化器中, 可对一个MK-2模块EDI系统进行8。5天的
  软化

								
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