Wafer Level Burn-in &

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                 Applied Wafer Test




           Wafer Level Burn-In & Test (WLBT)
                        Presentation




              “The Advanced Platform for
                 Wafer Level Burn-In”
                               Applied Wafer Test




                                         Shared Vision…

   “To become the partner of leading
semiconductor manufacturers in supplying
 cost-effective test and burn-in solutions
   optimized for DFT Methodologies”
May 21, 2012                         "The advanced platform for WLBT"                                                     2

               This Presentation contains Confidential Information provided by Delta V Instruments and Covalar Research
Turnkey Solution for KGD

Covalar Research                                                    Motorola SMD
(Richardson, TX)                                                       (Chandler, AZ)
Design and develop                                           Provide the processing
SM and test                                                   required to apply SM,
circuitry for cluster                                         test and then remove
interface                            KGD                                     the SM
                                    Turnkey
                                    Solution

Delta V Instruments                                                     Customer
(Richardson, TX)
Design, manufacture and                                Provides design knowledge
integrate wafer test                                         and implements DFT
hardware                                                     structures into silicon

May 21, 2012              "The advanced platform for WLBT"                         3
Why Wafer Level Burn-In & Test?

 Process Control Feedback to the FAB
    Reduced reaction time to implement corrective actions
 Industry wants KGD and Multi-Chip Modules
    WLBT provides a cost effective solution to producing
     KGD when compared to Die Carrier solutions
    WLBT provides cost effective reliability screening for
     bare die
 Manufacturing Cost Saving
    Test and package costs saved by detecting defective
     parts at the wafer level.

May 21, 2012       "The advanced platform for WLBT"     4
Our Solution . . .

   A proven test platform: we can provide a turnkey
    solution to the implementation of a WLBT process

     Technology already used in
      production by a leading
      microprocessor manufacturer
     Uses sacrificial metal layers
      as an interconnect solution
     Makes use of a clustering
      scheme to limit test lines

May 21, 2012       "The advanced platform for WLBT"    5
Cluster Concept (Slide 1)

                                                                     Package Level Burn-in


                       DRIVER    BIB


                                 Parallel set of vectors presented to all DUTs
           Stimulus Vector
             Generation

                                           DUT       DUT       DUT      DUT      ...   DUT



               Monitoring


                                 Individual DUT outputs monitored througout the burn-in cycle




May 21, 2012                    "The advanced platform for WLBT"                                6
Cluster Concept (Slide 2)

                                                                       Wafer Level Burn-in
  DRIVER       WAFER

                                       Vector, JTAG or BIST Stimulus




               DUT     DUT ... DUT       DUT      DUT ... DUT            DUT   DUT ... DUT


                       MUX                       MUX                           MUX

                             CLUSTER                   CLUSTER                       CLUSTER



                                               Device Outputs




May 21, 2012                    "The advanced platform for WLBT"                               7
Cluster Concept (Slide 3)
                         DUT DUT
WAFER            DUT DUT DUT DUT DUT DUT

             DUT DUT DUT DUT DUT DUT DUT DUT

         DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT                      Vector, JTAG or   Multiplexed
     DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT                   BIST Stimulus      device
     DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT                                     outputs
 DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT

 DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT

 DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT
                                           DUT DUT DUT DUT
 DUT DUT DUT DUT DUT DUT DUT DUT DUT DUT
                                           DUT DUT DUT DUT            DUT DUT DUT DUT
     DUT DUT DUT DUT DUT DUT DUT DUT DUT
                                           DUT DUT DUT                DUT DUT DUT DUT
     DUT DUT DUT DUT DUT DUT DUT DUT DUT
                                           DUT DUT DUT                DUT DUT DUT
         DUT DUT DUT DUT DUT DUT DUT DUT
                                           DUT DUT                    DUT DUT DUT
             DUT DUT DUT DUT DUT DUT DUT
                                           DUT                        DUT DUT
                 DUT DUT DUT DUT DUT DUT
                                                                      DUT
                         DUT DUT                                                    CLUSTER



May 21, 2012                       "The advanced platform for WLBT"                              8
Cluster Test Configuration (Slide 1)

                                                       At the DUT Level
                                                         Vio
                                                         Vcore
                                                         0V
                       R(up/down)                        Monitor Lines
       Fuse Links




                    DUT




                             R(isolation)
                                                         I/O Lines



May 21, 2012        "The advanced platform for WLBT"                     9
Cluster Test Configuration (Slide 2)

                                                     At the Cluster Level
                                                              Vio
                                                              Vcore
                                                              0V
                                                              Monitor Lines




           DUT       DUT        Up to 64
                                                    DUT
                               DUT/Cluster




                                                              I/O Lines



May 21, 2012     "The advanced platform for WLBT"                         10
Cluster Test Configuration (Slide 3)

                                                     At the Wafer Level
                                                             Vio Rails

                                                            Vcore Rails

                                                            0V
                                                            Monitor Lines




       CLUSTER   CLUSTER      Up to 512
                                               CLUSTER
                            Cluster/Wafer




                                                            I/O Lines


May 21, 2012     "The advanced platform for WLBT"                         11
Cluster Pin Allocation (example)
                                                                                           Addr Lines (A0-A19) - bank A
                                                                                           Addr Lines (A0-A19) - bank B
                                                                                           Scan Lines (1-40)
                                                                                           Ctrl Lines (1-10) - bank A
                                                                                           Ctrl Lines (1-10) - bank B
                                                                                           IO Lines (1-64)
                                                                                           PS1dut1
           A(0-19) - bank A                         A(0-19) - bank B                       PS1dut2
                 S(1-10)                                S(1-10)
                                                                                           PS1dut3

                     CTRL(1-5) - bank A                      CTRL(1-5) - bank B

                           IO(1-16)                                IO(33-48)
                                                                                           PS1dut160
                                                                                           PS2dut1
               DUTS 1-40                            DUTS 81-120                            PS2dut2
                                                                                           PS2dut3
           A(0-19) - bank A                         A(0-19) - bank B

                 S(1-10)                                S(1-10)                            PS2dut160
                     CTRL(6-10) - bank A                     CTRL(6-10) - bank B
                                                                                           GND
                           IO(17-32)                               IO(49-64)


           DUTS 41-80                               DUTS 121-160

                                                                                   Wafer   Stimulus Hardware


May 21, 2012                               "The advanced platform for WLBT"                                               12
WLBT – Wafer Structure

                                         Interconnect die clusters and provide interface to
   sacrificial metal layer               test hardware (signals and power). This layer would
                                         be removed after production burn-in test

                                         Used to protect die from circuit damage and allow
     passivation layer
                                         access to metal for probing and wire bonds


    metalization layers                  Used to interconnect device structures on the die.
                                         SM will make use of these layers for trace routing

                                         Multiple layers used to define individual active
                                         device structures (formed by repeating steps of
    active device layers                 deposition, masking, etching and doping). Active
                                         multiplexing circuitry and isolation resistors would
                                         be added to the scribe lanes during this process

        silicon base                     Used as a base to fabricate the wafer



May 21, 2012                 "The advanced platform for WLBT"                            13
WLBT – Sacrificial Metal Technique

                                 a. Identify pads to be used

                                 b. Route pads to scribe lanes

                                 c. Place resistors in scribe lanes

                                 d. Identify Cluster

                                 e. Join individual die together

                                 f. Add pads for contact to interface

                                 g. After burn-in, remove sacrificial
                                    metal layer, bump and dice the
                                    die

May 21, 2012   "The advanced platform for WLBT"                    14
WLBT – Sacrificial Metal Design Guidelines

                                                                Signal and Power
Pad Size (assuming standard pogo contact)                        0.075” (1905µm)
Pad Pitch (sacrificial metal layer)                              0.100” (2504µm)
Maximum Pads per Wafer (8”, 12”)                                    3000, 6500
Maximum Die per Cluster; Clusters per Wafer                          64; 512
Pogo Contact (head diameter)                                      0.032” (813µm)
Maximum Icc per Pogo Contact                                            3A
Maximum I/O per wafer (4x stacked Drivers)                             384
Number of Monitor lines per Cluster                            Multiplex as required
Resistor Values (Isolation, Pull Up/Down)                            1K, 10K


May 21, 2012                "The advanced platform for WLBT"                       15
 Test Fixture Assembly



LN2 Supply
(opt.)                                                    Hot/Cold Chuck (opt.)


Driver                                                    Hot Chuck or Transfer Plate
Driver                                                    Wafer Mount
Pattern Generator                                         Pogo Interface

Driver

Driver
                                                          Power Supplies (opt.)
PS Controller (opt.)




 May 21, 2012          "The advanced platform for WLBT"                    16
Test System Hardware
 Supports 8” and 12” wafer formats
       Provides up to 6,500 points of contact between the
        wafer and the test circuitry
       Wafers are loaded into fixtures which incorporate the
        pogo contact interface
       Uses 32mil pogo contacts for signal and power
 Available with hot & cold thermal chucks
       Supports up to 2kW power dissipation per wafer
       Temperature range is -55°C to +180°C
       Multiple Probes for Temperature Stability across the
        wafer surface
May 21, 2012         "The advanced platform for WLBT"     17
Memory Stimulus Hardware




       Memory Pattern Generator Module               Memory Test Driver Module
      (MPGM) - One per Wafer Test Fixture        (MTDM) - Four per Wafer Test Fixture




May 21, 2012                 "The advanced platform for WLBT"                           18
Memory Pattern Generator (Slide 1)
   4Gbits address range
   36 Data Pattern Lines
   16 Programmable DUT Clocks
   40 Scan Lines
   Algorithmic Micro-Code Sequencer
   32 bit Address (16X + 16Y)
   Test Cell and Index Counter
   Incremental/decremental in row-fast or column-
    fast mode
May 21, 2012     "The advanced platform for WLBT"   19
Memory Pattern Generator (Slide 2)
   32K Vector RAM for arbitrary sequencies
   ALU functions on counter and vector outputs
   Software programmable address descrambling
                          3/2 2
   Capable of order N, N , N patterns
   Algorithmic pattern programming
   Set of pre-defined background patterns
   Software programmable data descrambling
   8 Unique data patterns selectable on-the-fly
   1nsec read strobe programming resolution
May 21, 2012     "The advanced platform for WLBT"   20
Memory Pattern Generator (Slide 3)
 6 Internal Clocks
       address multiplex
       address invert
       address output enable
       data invert
       data output enable
       read strobe
 32 Timing Sets
 40nsec to 10microsec cycle length
 10nsec programmable resolution
May 21, 2012        "The advanced platform for WLBT"   21
Memory Test Driver (Slide 1)
 Independent signal levels for clock, address
  and I/O lines
 Programmable threshold (Vth) for I/O
  comparators
 Programmable super voltage (Vihh) for 8 clock
  lines and 16 address lines
 64 (32 + 32) address lines
 72 I/O lines
 32 (16 + 16) clock lines

May 21, 2012    "The advanced platform for WLBT"   22
Memory Test Driver (Slide 2)
 32K failure log RAM
       32 bits DUT address
       36 bit expected data
       72 bits failure data
       15 bits sequencer data
       8 bits scan bank
 Maximum frequency
       50Mhz (standard signals)
       25Mhz (super voltage lines)


May 21, 2012        "The advanced platform for WLBT"   23
Memory Test Driver (Slide 3)
   10 Ohm Output Impedance
   200mA continuous drive current (2A peak)
   <15nsec rise and fall time (2000pF, 0-5V 10-90%)
   ±5nsec maximum skew
   Programmable Levels
       Vih    0V to 10V
       Vil    -0.5V to 2V
       Vihh   0V to 13V
       Vth    -2V to 10V

May 21, 2012         "The advanced platform for WLBT"   24
Memory Test Driver (Slide 4)
 3 Independent programmable voltages
       50mV resolution
       ±50mV accuracy
       0V to 13V, 2A reference level
       V1 Rail: 1.0V to 5.5V, 20A, 100W
       V2 Rail: 1.0V to 5.5V, 20A, 100W
       V3 Rail: 1.0V to 5.5V, 15A, 75W




May 21, 2012        "The advanced platform for WLBT"   25
Customer Plant Level Integration

 Remote Operation data processing off-site
 Local area network connects multiple test
  systems with local operator control and
  engineering support
 Centralized data archiving
 Direct feedback from data archive to process
  flow
 Driver platform common to both Package
  Level Burn-in Test (PLBT) and WLBT
  applications
May 21, 2012   "The advanced platform for WLBT"   26
Customer Considerations (Slide 1)

 Test During Burn-In (TDBI) at Wafer Level
      Provides immediate feedback to the FAB process
      An increasing proportion of bare die have higher
       complexity and speed which cannot be tested at
       package level burn-in
 Cost Savings
      WLBT performed using DFT structures can
       dramatically reduce the need for expensive ATE
      WLBT catches early life failures (ELF) in marginal
       and defective devices before wafers reach final
       packaging and test
May 21, 2012        "The advanced platform for WLBT"    27
Customer Considerations (Slide 2)

 The need for Known Good Die (KGD)
     KGD is required for multi-chip modules and system-
      on-chip (SOC) packages
     WLBT will eliminate the need for special chip carriers
      to heat and test bare die
 What type of WLBT interface makes sense?
     Simplicity of alignment between the production wafer
      and the test electronics is critical to the test process
     The interface design should take into account I/O fan
      out, small die pitch, signal & power routing

May 21, 2012        "The advanced platform for WLBT"      28
Customer Considerations (Slide 3)

 Electrical requirements
     Die isolation is essential to perform effective testing
      (must limit effect of bad die pulling high current)
     Power dissipation per wafer can be high
 Thermal management
     Hot/Cold testing (-55ºC to +180ºC)




May 21, 2012        "The advanced platform for WLBT"       29
“The Advanced Platform for Wafer Level Burn-in”




            Applied Wafer Test
   would like to thank you for your time
            and consideration.



May 21, 2012   "The advanced platform for WLBT"   30

						
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