ISQED03_interop_grebinski

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					                        Interoperability Beyond Design


                         Sharing Knowledge between Design and
                                    Manufacturing

                                               Don Cottrell
                                        VP Emerging Technologies
                                             Si2 Corporation


                                          Thomas J. Grebinski
                                     SEMI Data Path Task Force Chair
                              SEMI Universal Data Model Working Group Chair




ISQED- International Symposium on Quality Electronic                          March 25, 2003
Design
                                Data-centric IC Designs


                 •   The IC design community is becoming more data
                     centric.
                      – Overcoming the issues of interoperational efficiencies.
                           • Common data structures for the entire IC design data
                             flow.
                      – Open data structure standards
                           •   OpenAccess and Si2
                           •   Open-source applications program interface.
                           •   Open-source reference data base for all IC design data.
                           •   Free license for anyone to use and redistribute..
                 •   The realization of common expectations
                      – within an increasingly complex, more intimately
                        connected and data-intensive design data flow.




ISQED- International Symposium on Quality Electronic                        March 25, 2003
Design
                 Open-source Reference Data Base and
                                 API

                 • OpenAccess Coalition and Si2
                      – Click-thru internal use license
                           • Free access to API specification
                           • Free access to reference database binaries

                      – Signed internal use and distribution license
                           • Free access to reference database source
                           • Royalty-free redistribution rights (binaries only)
                           • Rights to distribute modifications to the reference
                             database (binaries only) that do not alter the API




ISQED- International Symposium on Quality Electronic                   March 25, 2003
Design
                   OpenAcess Design Data Base and API

                  Commercial EDA Tools                 University Research




                                                                              The realization of common expectations
                                   Internal Proprietary Tools
                                   External Design Partners



                           .
                                    Standard API


                               Reference Database
                                        Cores/Cells
                                            Gates
                                         Transistors
                                      Physical Layout
                                    OASIS (planned)/GDSII



ISQED- International Symposium on Quality Electronic                   March 25, 2003
Design
                             Wide range of Functionality

                 •   Design Database               •   Translators
                      –   Chips / Blocks / Cells        –   GDS2
                      –   RTL to Silicon                –   OASIS (planned)
                      –   Digital / Analog              –   LEF
                      –   Automated / Custom            –   DEF
                      –   Logical / Physical            –   Verilog (planned)
                      –   Batch / Interactive           –   SPEF (planned)
                                                        –   SPICE (planned)
                 •   Library Database
                      –   Design organization
                      –   Design management
                      –   Access control

                 •   Technology Database
                      –   Foundry Rules
                      –   Design Constraints



ISQED- International Symposium on Quality Electronic                      March 25, 2003
Design
                        Opaque View Beyond IC Design


                 •   The data view beyond IC design is opaque after
                     GDSII and OASIS.
                      – Design intent is not conserved beyond GDSII and
                        OASIS.
                           • GDSII and OASIS are a geometric encapsulation of the
                             design.
                           • SEMI P10 and text files fed downstream are another
                             encapsulation (interpretation) of the design intent.
                           • The basic design data structure has changed
                             substantially and thus, the design and mask engineering
                             view up and downstream is not immediately accessible
                             and also not clear (unambiguous).
                 •   Different data structures between design and
                     mask manufacturing centers.
                      – Obscures the up and downstream view further.
                      – Need to convert to standard record structures for mask
                        manufacturing.


ISQED- International Symposium on Quality Electronic                       March 25, 2003
Design
Design
                                                                Design Data Base

                                                          Cells, Cores, Gates, Transistors

                                                       Geometric Shapes      Physical Layout


                                                            OASIS               SEMI P10
                                                            GDSII               Text Files

                                                                Internet File Transfers




ISQED- International Symposium on Quality Electronic
                                                                                                          Manufacturing




                                                        Mask Technical Planning Data Base

                                                       OASIS/GDSII


                                                                             Conversion to
                                                                            standard record
                                                                                               IC Design Data Encapsulation for Mask




                                                                                 types
                  March 25, 2003
Design
                                                                          Mask Technical planning Data Base

                                                           OASIS/GDSII     MIC, MEBES, Toshiba
                                                         Mask Layout Data Hitachi, JEOL, KLA, etc.




                                                                                                        Data Fracture




ISQED- International Symposium on Quality Electronic
                                                                                                       Tonality, Mirroring


                                                                                                     Data Finishing

                                                                                                      Sizing, Biasing,
                                                       Data Preparation




                                                                                           Mask Layout

                                                                               Layer Extractions, Scaling, Shrinking
                                                                                                                             Mask Data Preparation and Storage




                                                                             Frame generation, bar coding, test structures
                  March 25, 2003
                                                                             Machine-specific Data Flow




                                                       Mask Layout Data Hitachi, JEOL, KLA, etc.
                                                                         MIC, MEBES, Toshiba
                                                                                                   Pattern Generation


                   Mask Technical planning Data Base




                                                                                                    Job Queue Data base
                                                         OASIS/GDSII




                                                                                                    Mask Inspection



                                                                                                   Mask Critical Dimensions

ISQED- International Symposium on Quality Electronic                                                            March 25, 2003
Design
                     Data Flow and Transformation in a
                                Mask Writer




                                                     Rendering




                                                                              Rendering
                     Writer Job Queue Data Base




                                                                                                                Mask Pattern Generation
                                                                                          Extraction
                                                                                                       CFRAC
                                                                 Extraction
                                                                   CFRAC
                                                  FRAC




                   Viewers- Integrity Test


ISQED- International Symposium on Quality Electronic                                                           March 25, 2003
Design
Design
                                                         Design Data Base

                                                         Encapsulation Filter




                                                       Technical Planning Data Base




ISQED- International Symposium on Quality Electronic
                                                         Record Types Filter

                                                       Technical Planning Data Base
                                                                                                and Manufacturing Data




                                                        Data preparation Filter

                                                       Technical Planning Data Base
                                                                                      Changes in Structure and Hierarchy of Design




                  March 25, 2003
Design
                                                          Technical Planning Data Base


                                                                             FRAC




                                                       CFRAC, Extraction and Rendering Filter




ISQED- International Symposium on Quality Electronic
                                                           Writer Job Queue Data Base
                                                              FRAC
                                                                              Rendering
                                                             CFRAC
                                                           Extraction
                                                                                                The Fracturing of Fractured Mask Layout Data




                                                           Mask Pattern Generation
                  March 25, 2003
                     Design and Manufacturing Interoperability


                 •   IC and mask design intent are lost downstream
                      –   Numerous filters and translations of data drop design and
                          manufacturing hierarchy.
                            •   There is no real time direct data link to what is written on a mask.
                            •   Which gives the IC designer an opaque view of how the design is
                                spatially transformed onto a mask.
                                   –   Such a view is a compelling need when non-parasitic biasing and
                                       proximity corrections push a design outside acceptable IC design rules.
                                   –   Such constraints will increase as the spatial density budget for circuit
                                       elements increases.
                      –   Such losses extends “time to market” and increase design
                          and manufacturing costs.
                      –   It will become increasingly important to design at a higher
                          level of abstraction with a real-time view of what is actually
                          writable on a mask or wafer.
                      –   It will also become increasingly important to ensure that any
                          movement of data is as efficient, portable and extensible
                          as possible.


ISQED- International Symposium on Quality Electronic                                             March 25, 2003
Design
                     Finer Data Granularity Expected at the Mask
                              Pattern Generation Level


                 •    Design and manufacturing data granularity continues
                      to increase.
                       –   100 to 300 Gb files with the expectation that the cost of
                           ownership to write or manufacture a mask does not increase.
                       –   Job Queue and sorting data rates are reaching several
                           hundreds of Mb/second with needed storage capacity in the
                           Terabytes region.
                       –   These types of demands run orthogonal to the necessary
                           reduction of COO and a shorter time to market.
                 •    Greater access to design data
                       –   Interconnectivity data will help improve mask layout and
                           engineering data processing time.
                 •    Massive parallel processing
                       –   Sorting is fundamental for efficient massive parallel processing
                       –   Access efficiency features, such cell reference tables and
                           bounding boxes, accelerates transformations, such as sorting




ISQED- International Symposium on Quality Electronic                            March 25, 2003
Design
                    The SEMI and OpenAccess Universal Data
                                 Model (UDM)

                          IC Design         Mask Manufacturing
                          DRC               CD measurement
                          Simulation        Pattern generation
                          Verification      Inspection
                          Synthesis         Encapsulation/Simulation
                          Encapsulation     Data preparation/Assembly
                                            Fracturing/Verification
                           .

                                      Standard API




                                                                               Hierarchical Data Base
                       IC Design and Mask Technical Planning Data Base

                               Cells, Cores, Gates, Transistors
                                  Physical Design Layout
                     Geometric shapes                   Mask layout
                   Write-, inspection- and CD measurement-ready data files

ISQED- International Symposium on Quality Electronic                     March 25, 2003
Design
                        The SEMI and OpenAcess UDM


                 •   One standard data base and applications
                     program interface (API).
                      – For design and mask manufacturing.
                      – Access to all design and mask manufacturing data
                        through one common data language.
                 •   Standard semantics for all model objects,
                     attributes and relationships
                      – No ambiguity between or within design and
                        manufacturing tasks.
                 •   Hierarchy preserved through to mask pattern
                     generation, CD measurements and inspection.
                      – Unified design to manufacturing data flow and effort.




ISQED- International Symposium on Quality Electronic                  March 25, 2003
Design
                          The SEMI and OpenAcess UDM

                 •   Full access to design and manufacturing intent up and
                     down the design and manufacturing flow.

                 •   Opens the door to more efficient massive parallel
                     processing at the mask pattern generation level.
                      –   Thread safe and data preparation
                            •   multiple threads within an application can operate on data in
                                parallel without the risk of one thread contaminating the data on
                                another.
                            •   request objects that are within a specified spatial area (e.g. a
                                stripe)
                      –   Query by Region for pattern generation and inspection
                            •   multiple stripes in parallel; multiple executions.
                            •   Direct access to mask layout and DRC extraction data by region of
                                interest during mask inspection and CD measurement operations.
                 •   Unlimited scalability
                      –   The model is limited only by the ability to store and manage
                          the data within the data base.



ISQED- International Symposium on Quality Electronic                                    March 25, 2003
Design
                        Extending the reach of the UDM
                    IC Design                   Device manufacturing
                                                Process characterization
                    Mask Manufacturing
                                                Parasitics development
                                                  CMP
                                                  Etch
                                                  CVD, PECVD, Implant
                                                  PSM, Lithography, etc.
                                                Mask Quality Assessment
                           .
                                      Standard API




                                                                                 Hierarchical Data Base
                                   Universal Data Model


                                    Wafer process data
                                     Process Parasitics


ISQED- International Symposium on Quality Electronic                       March 25, 2003
Design
                                        UDM Status


                 •   The technology exists today for full
                     implementation
                      – The reference data base and API are already available
                        and being used today.
                      – Mask and wafer implementations underway through
                        SEMI, OpenAccess Coalition and Si2.
                 •   It is a community resource
                      – Change-order team in place.
                      – Applicable to design, mask and wafer data flows.
                      – Applicable to high-speed and volume data rendering
                        and measurement applications.
                 •   Free-use license
                      – Free-use after release from the OpenAccess coalition.



ISQED- International Symposium on Quality Electronic                March 25, 2003
Design
                               Organizations Involved


                 •   SEMI Data Path Task Force
                      – Tom Grebinski (tgrebinski@sbcglobal.net)
                           • Task Force Chair
                      – Applicable site
                           • www.semi.org
                           • www.si2.org/eda-mask
                 •   SEMI UDM Working Group
                      – Tom Grebinski and Don Cottrell
                      – Working Group Co-chairs
                 •   OpenAccess Coalition and Si2
                      – Scott Peterson, LSI Logic (OAC Chairman)
                      – Steve Schulz- President and CEO, Si2
                        (schulz@si2.org)
                      – Applicable sites
                           • www.openeda.org
                           • www.si2.org /openaccess

ISQED- International Symposium on Quality Electronic               March 25, 2003
Design
                              Companies Participating

                 •   Cadence Design             •      International Sematech
                 •   Mentor Graphics            •      IBM
                 •   Synopsys                   •      Infineon
                 •   Micronic Laser Systems     •      Texas Instruments
                 •   JEOL                       •      Motorola
                 •   KLA-Tencor                 •      Philips Semiconductor
                 •   Applied Materials          •      JEOL
                 •   Dai Nippon Printing        •      Alcatel
                 •   Toppan Printing            •      Intel
                 •   Photronics                 •      AMD
                 •   Dupont Photomasks          •      SELETE/JEITA
                 •   STMicroelectronics         •      National Semiconductor
                 •   TSMC USA                   •      LSI Logic
                 •   Toshiba (NuFlare)
                 •   Hitachi
                 •   Hewlett-Packard



ISQED- International Symposium on Quality Electronic                   March 25, 2003
Design
                                     Moving Forward


                 •   Critical Path Items
                      – New members to SEMI Data Path Task Force and
                        Working Groups
                      – New members to the OpenAcess Coalition
                           • Implementation of the mask and wafer extensions to the
                             OpenAccess Data base and API.
                           • Extending and then bridging the responsibilities between
                             design, mask and wafer manufacturing.
                      – Data-intensive flow integration with OpenAccess
                        and the UDM.
                           • Pattern generation
                           • Data Preparation
                           • Mask inspection and CD measurement
                      – Formalize relationship between SEMI, SI2 and
                        OpenAccess Coalition


ISQED- International Symposium on Quality Electronic                       March 25, 2003
Design
                              Successful Track Record


                 •   Si2 and the OpenAccess Coalition
                      – Open-Source Reference Data Base and API
                      – Source and Binary code made available for the model
                        and API.
                           • Unprecedented effort and availability
                      – Released to the public January 1, 2003


                 •   SEMI Data Path Task Force
                      – The development of a replacement for GDSII called
                        OASISTM.




ISQED- International Symposium on Quality Electronic                 March 25, 2003
Design
                              Successful Track Record


                 • OASISTM
                      – 64-bit Open Artwork System Interchange Standard.
                           • vs. 16-32 bit
                      – direct access to cell pointers
                           • GDSII has only sequential access to cell data.
                      – 10-50 times more compact
                      – Makes use of modality
                      – Can mimic data organization of virtually any writing
                        or inspection pattern file.
                      – Flexible property mechanism which can be used to
                        tag figures, arrays, and cells with as much textual and
                        numeric information as needed by downstream
                        processors.



ISQED- International Symposium on Quality Electronic                          March 25, 2003
Design
                              Successful Track Record


                 •   The creation of the Universal Data Model (UDM)

                      – Embrace of the technology worldwide and across
                        several industry platforms.
                           • A recognition of the importance of the link between
                             design and manufacturing by the industry and the media.


                      – Adoption of the OpenAccess reference data model
                        and API as the basis for the ongoing development of
                        the UDM.




ISQED- International Symposium on Quality Electronic                      March 25, 2003
Design
                            Adoption of the Technology


                 •   The compelling need
                      – Data granularity of an IC design and the manufacturing
                        of an IC continues to increase.
                           • Closer integration of the data flow; greater opportunity to
                             lose design intent at a number of levels.
                                 – Greater inability with the tracking and credible use of design
                                   and manufacturing data.
                           • Greater need for speed with fewer errors.
                                 – Massive parallel processes into the tera-pixels per second.
                           • Greater need for deign intent at the mask data
                             preparation, pattern generation and inspection levels.
                           • Greater need for manufacturing intent in the design
                             space; cross talk is there ad getting louder.
                                 – Proximity corrections at the manufacturing level render DRC
                                   at the design level less effective. The need for a view by
                                   design at the mask production level.

                 •   There is no choice

ISQED- International Symposium on Quality Electronic                                 March 25, 2003
Design

				
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