Latch-Up and its Prevention

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					                   Latch-Up and its Prevention

•   Latch is the generation of a low-
    impedance path in CMOS chips
    between the power supply and the
    ground rails due to interaction of
    parasitic pnp and npn bipolar
    transistors. These BJTs for a
    silicon-controlled rectifier with
    positive feedback and virtually
    short circuit the power and the
    ground rail.
•   This causes excessive current flows
    and potential permanent damage to
    the devices.
•   Analysis of the a CMOS Inverter
    CMOS depicting the parasitics.
                         Latch-Up Continued

•   The equivalent circuit shown has      •   Assume the Rwell and Rsub are
    Q1 being a vertical double                significantly large so that they
    emmitter pnp transistor whose             cause open circuit connections, this
    base is formed by the n-well with a       results in low current gains and the
    high base to collector current gain
    (b1).                                     currents would be reverse leakage
                                              currents for both the npn and pnp
•   Q2 is a lateral double emitter npn
    transistor whose base is formed by        transistors.
    the p-type substrate.                 •   If some external disturbance
•   Rwell represents the parasitic            occurs, causing the collector
    resistance in the n-well structure        current of one of the parasitic
    whose value ranges from 1KW to            transistors to increase, the resulting
    20kW.                                     feedback loop causes the current
•   The substrate resistance Rsub             perturbation to be multiplied by
    depends on the substrate structure.       b1.b2
                          Latch-up Continued

•   This event triggers the silicon-       •   Some causes for latch-up are:
    controlled rectifier and each               –   Slewing of VDD during start-up causing
                                                    enough displacement currents due to
    transistor drives the other with                well junction capacitance in the substrate
    positive feedback eventually                    and well.
                                                –   Large currents in the parasitic silicon-
    creating and sustaining a low                   controlled rectifier in CMOS chips can
    impedance path between power and                occur when the input or output signal
    the ground rails resulting in latch-            swings either far beyond the VDD level
                                                    or far below VSS level, injecting a
    up.                                             triggering current. Impedance
•   For this condition if b1 *b1 is                 mismatches in transmission lines can
                                                    cause such disturbances in high speed
    greater than or equal to 1 both                 circuits.
    transistors will continue to conduct        –   Electrostatic Discharge stress can cause
                                                    latch-up by injecting minority carriers
    saturation currents even after the              from the clamping device in the
    triggering perturbation is no longer            protection circuit into either the substrate
    available.                                      or the well.
                                                –   Sudden transient in power or ground
                                                    buses may cause latch-up.
               Guidelines For Avoiding Latch-Up

•   Reduce the BJT gains by lowering the        •   Place source diffusion regions for
    minority carrier lifetime through Gold          the pMOS transistors so that they
    doping of the substrate (solution might         lie along equipotentials lines when
    cause excessive leakage currents).
                                                    currents flow between VDD and p-
•   Use p+ guardband rings connected to             wells.
    ground around nMOS transistors and n+
    guard rings connected to VDD around         •   Avoid forward biasing of the
    pMOS transistors to reduce Rw and Rsub          source/drain junctions so as not to
    and to capture injected minority carriers       inject high currents , this solution
    before they reach the base of the               calls for the use of slightly doped
    parasitic BJT.                                  epitaxial layer on top of the heanily
•   Place substrate and well contacts as            doped substrate and has the effect
    close as possible to the source                 of shunting the lateral currents
    connections of the MOS transistors to
                                                    from the vertical transistor through
    reduce the values of Rw and Rsub.
    (solution to be used in your designs)
                                                    the low resistance substrate.

				
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posted:12/2/2011
language:English
pages:4