Process Monitor/TID Characterization by WG7zpP5


									Process Monitor/TID Characterization

          Valencia M. Joyner

 Current MOSIS Process Monitor
 Process Monitor Coupon Objectives
 Review of Impact Ionization and TID Correlation
 IBM 130nm Coupon Chip
 Expected Results
 Proposed Migration to 90nm
 Proposed Task on 130nm Library Distribution
 Schedule Status
                Current MOSIS Process Monitor

                                 BSIM Array

IBM 8RF Wafer                                          Ring Oscillator
                Sheet Res.    Capacitor Array
                              Test Inverters
                              Contact Kelvin Bridge
                              Metal Step Coverage
                              RO Functional Tests

                        MOSIS PM consists of an array of DC and AC
                    parametric test structures and functional test devices
                      for monitoring fabrication of wafers by foundries
 Process Monitor Coupon Objectives

 Enclosed Layout Transistor (ELT) Device Characterization
      To simulate and design an IC using RHBD geometries such as
       ELTs, the characteristics of this device must be well defined
      Coupon includes an array of 24 ELT devices similar to the
       standard 2-edge transistor array used for BSIM parameter
      Characterization will enhance the understanding of:
           The direction of current flow through the device
           How device parameters (, VT, , 1/f noise params, etc.)
            compare to the standard two-edge device
           An accurate model for the aspect ratio of the device
           How does drain/source placement affect parameters
Process Monitor Coupon Objectives

 Characterize the TID Radiation Induced Charge Build-up
  in the Process Oxide Layers (Gate and Field)
     Gate Oxide Structures: Coupon includes standard two-edge
      PMOS and NMOS devices for measurement of TID induced
      parametric shifts
     Field Oxide (FOX) Test Structures are included to
      characterize the isolation oxide
          TID induced leakage paths in the isolation field oxide between
           neighboring devices can cause severe signal degradation
          Highly process dependent

                                   VG            VSS

                   N+          ++    +           N+
                                  + ++
 Process Monitor Coupon Objectives

 Investigate rapid, low-cost methods of tracking the TID
  radiation tolerance of the process
      The Field Impact Ionization Technique: Used in the past,
       but is it useful for current deep-submicron technologies?
           Experiment:
                High voltage pulses are applied across the device,
               injecting electrons from the substrate into the oxide via
               Fowler-Nordheim tunneling.
                Injected electrons produce electron-hole pairs in the
               oxide through impact ionization. These e-h pairs behave
               similarly to e-h pairs generated by TID radiation.
      Previous reports of correlation between pre-rad 1/f noise
       and post-rad oxide-trapped charge are promising
     Ionizing Radiation Review


                             +       +
                N+       +        + + +     N+
                                 + + +
                     -                       Channel
           Trapped positive charge
                                         TID Radiation

Area density of holes created by ionizing radiation

       QATID  K  tOX  f ( E )  Drad
             Field Induced Injection and
             Impact Ionization (F4I) Technique

                        Conductor                Fowler-Nordheim
                                            Electron Current Density
         -   +           -                                       B
N+   +
                          -    N+          J FN    A  E  exp(
                     -                                           E
                 -            F-N

                              Area density of holes created by
                                     impact ionization
                              QA FN  J   tOX  t
               TID Radiation and
               F-N Impact Ionization Correlation

                Equivalent Dose delivered by F4I Technique

                                QATID  QA FN

                         0  A  E  t2
                                                 ( H  B)
               DEQ                       exp(            )
                            K  f (E)                E

This technique will attempt to show that damaged introduced by electrical
  stress does indeed “track” the damage produced by Co60 radiation.
          Previous Results on TID and
          Electrical Stress Correlation

                       Co60 Test

                   F4I Technique

Tests reported in [1] on MOS capacitors show relative shift in
    flatband voltage for irradiated and stressed devices
         [1] Boesch and McGarrity, IEEE Trans. on Nuc Sci, Vol. NS-26, No. 6, Dec. 1979.
ISI’s IBM 130nm Process Monitor
Custom Coupon Chip

                     Process: IBM 8RF-LM
                     Submitted to MOSIS for fab
                    on 31 Jan 2005
                     Pads included for both
                    wafer probe measurments and
                    for wire bonding to packages
                     Includes a total of 42
     3.22 mm        devices and test structures
               TID Characterization Test Plan

Co60 Radiation Chamber

                                                     GSFC (HP)
                      Circuit Board Adaptor      Parametric Analyzer

    TID Radiation Testing to 2Mrad at GSFC
    Wafer probe measurements and electrical stress tests will be
   performed at MOSIS
Proposed Migration to 90nm

 A 90nm Process Monitor Coupon will be developed to
  characterize the TID hardness of the process
      RHBD Coupon Gen. 1 will be expanded to include test
       structures for monitoring the charge collection efficiency
       of the substrate for SEU Characterization
      Test Structures for SEL characterization, gate
       delay/timing characterization
 ISI proposes to collaborate with existing DTRA Digital
  SET (DSET) program
      Provide test structures to measure SET signal propogation
       for different levels of logic complexity
Proposed Task on 130nm Library
Maintenance and Distribution

 ISI proposes to
      Maintain and distribute a 130nm RHBD library through the
       MOSIS foundry service
      Provide complete library view support and ensure
       compatibility with commercial EDA tools
      Distribute the library to the RHBD community with
       appropriate export control (ITAR)
Schedule Status

 IBM 130nm Process Monitor Chip Submitted to Fab on
  31 Jan 2005
 Packaged chips expected in early May
 TID Radiation Tests scheduled at GSFC for mid-May
 TID Test Plan in progress
 Development of test plan for electrical stress test
  correlation (mid-April)
 Further investigation of rapid, low-cost radiation
  tolerance tracking techniques

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